Sensitization distance and acid generation efficiency in a model system of chemically amplified electron beam resist with methacrylate backbone polymer
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概要
著者
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田川 精一
阪大産研
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関 修平
大阪大学産業科学研究所
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Tagawa S
The Inst. Of Scientific And Industrial Res. Osaka Univ.
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Tagawa S
Osaka Univ. Osaka Jpn
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Kai Toshiyuki
Jsr Corp. Mie Jpn
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古沢 孝弘
Osaka University
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