Electron Beam Lithography Using Highly Sensitive Negative Type of Plant-Based Resist Material Derived from Biomass on Hardmask Layer
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概要
- 論文の詳細を見る
- 2011-10-25
著者
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関 修平
大阪大学産業科学研究所
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Oshima Akihiro
Osaka Univ. Osaka Jpn
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Tagawa S
The Inst. Of Scientific And Industrial Res. Osaka Univ.
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Takei Satoshi
Nissan Chemical Inst. Ltd. Chiba Jpn
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Tagawa S
Osaka Univ. Osaka Jpn
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古沢 孝弘
Osaka University
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Takei Satoshi
Toyama Prefectural University
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SEKIGUCHI Atsushi
Toyama Prefectural University
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YANAMORI Naomi
Osaka University
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KASHIWAKURA Miki
Osaka University
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KOZAWA Takahiro
Osaka University
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TAGAWA Seiichi
Osaka University
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Kozawa Takahiro
Osaka Univ. Osaka Jpn
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