Effects of Low Energy Electrons on Pattern Formation in Chemically Amplified Resist

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概要

• 論文の詳細を見る
• Technical Association of Photopolymers, Japanの論文

著者

• Yamamoto Hiroki

  Osaka Univ. Osaka Jpn

• Kozawa Takahiro

  Osaka Univ. Osaka Jpn

関連論文

• Effects of Low Energy Electrons on Pattern Formation in Chemically Amplified Resist
• Electron Beam Lithography Using Highly Sensitive Negative Type of Plant-Based Resist Material Derived from Biomass on Hardmask Layer

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