LEESON Michael | Intel Corporation
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概要
関連著者
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LEESON Michael
Intel Corporation
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CAO Heidi
Intel Corporation
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DENG Hai
Intel Corporation
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Yan Pei-yang
Intel Corporation
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Biafore John
KLA-Tencor---Finle Division, Austin, TX 78759, U.S.A.
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Pret Alessandro
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
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Gronheid Roel
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
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Engelen Jan
Katholieke Universiteit Leuven (K.U.Leuven), Department of Electrical Engineering, 3000 Leuven, Belgium
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Younkin Todd
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
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Garidis Konstantinos
Kungliga Tekniska Högskolan (KTH), Stockholm 10044, Sweden
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TAGAWA Seiichi
The Institute of Scientific and Industrial Research, Osaka University
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research, Osaka University
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Tagawa Seiichi
The Institute Of Scientific And Industrial Research
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YAMAMOTO Hiroki
The Institute of Scientific and Industrial Research, Osaka University
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Cao Heidi
Intel Corporation, 5200 N.E. Elam Young Parkway, Hillsboro, Oregon 97124, U.S.A.
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Yamamoto Hiroki
The Institute of Scientific and Industrial Research (ISIR), Osaka University, Ibaraki, Osaka 567-0047, Japan
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KOZAWA Takahiro
The Institute of Scientific and Industrial Research (ISIR), Osaka University
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Garidis Konstantinos
Kungliga Tekniska Högskolan (KTH), Stockholm 10044, Sweden
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Yan Pei-Yang
Intel Corporation, 3065 Bowers Ave, Santa Clara, CA 95054, U.S.A.
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Leeson Michael
Intel Corporation, 5200 N.E. Elam Young Parkway, Hillsboro, Oregon 97124, U.S.A.
著作論文
- Polymer-Structure Dependence of Acid Generation in Chemically Amplified Extreme Ultraviolet Resists
- Polymer-Structure Dependence of Acid Generation in Chemically Amplified Extreme Ultraviolet Resists
- Mask Effects on Resist Variability in Extreme Ultraviolet Lithography
- Mask Effects on Resist Variability in Extreme Ultraviolet Lithography (Special Issue : Microprocesses and Nanotechnology)