Younkin Todd | IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
スポンサーリンク
概要
関連著者
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LEESON Michael
Intel Corporation
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Yan Pei-yang
Intel Corporation
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Biafore John
KLA-Tencor---Finle Division, Austin, TX 78759, U.S.A.
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Pret Alessandro
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
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Gronheid Roel
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
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Engelen Jan
Katholieke Universiteit Leuven (K.U.Leuven), Department of Electrical Engineering, 3000 Leuven, Belgium
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Younkin Todd
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
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Garidis Konstantinos
Kungliga Tekniska Högskolan (KTH), Stockholm 10044, Sweden
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Garidis Konstantinos
Kungliga Tekniska Högskolan (KTH), Stockholm 10044, Sweden
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Yan Pei-Yang
Intel Corporation, 3065 Bowers Ave, Santa Clara, CA 95054, U.S.A.
著作論文
- Mask Effects on Resist Variability in Extreme Ultraviolet Lithography
- Mask Effects on Resist Variability in Extreme Ultraviolet Lithography (Special Issue : Microprocesses and Nanotechnology)