Radical Concentrations and Prompt NO Formation in Hydrocarbon-Air Premixed Flames
スポンサーリンク
概要
- 論文の詳細を見る
Hydroxyl radical concentrations in Iaminar, premixed CH_4-air flat-flames were measured by a conventional absorption method in the flame temperature range T=2200-1700 K. The OH mole fractions in the reaction zone P_<OH> were found to be insensitive to the flame temperature and the maximum P_<OH> to be about 6×10^<-3> at T=2000K in a stoichiometric flame. The rate constant for the prompt NO formation, CH+-N_2=HCN-l-N- - - +2N0 (4), is modifiedas k_4=1.2×10^12 exp (-13600/RT) by the relation between the amount of prompt NO and the saturation ion current I,.It is also shown from the measurements of NO_x, unburnt hydrocarbons H.C., and I_x that the chemical kinetics are not significantly influenced by the flame temperature, and NO emission is reduced by reactions among NO, H.C., and N-containing intermediate species in low-temperature flames, even in stoichiometric and fuel-lean mixtures.
- 社団法人応用物理学会の論文
- 1985-05-20
著者
-
Yuuki A
Semiconductor Research Laboratory Mitsubishi Electric Corporation
-
Yuuki Akimasa
Product Development Laboratory Mitsubishi Electric Corporation
-
MATUSI Yasuji
Product Development Laboratory, Mitsubishi Electric Corporation
-
Matusi Yasuji
Product Development Laboratory Mitsubishi Electric Corporation
関連論文
- Very Thin Single-Walled Carbon Nanotubes Self-Assembled on 6H-SiC(0001) Substrate by Surface Decomposition Method
- Critical-Dimension Controllability of Chemically Amplified Resists for X-Ray Membrane Mask Fabrication
- Ferromagnetic Domain Structure in La_Sr_xMnO_3 (x=0.125)
- Observation of magnetic domain structure in phaseseparated manganites by Lorentz electron microscopy
- Thermal Desorption Spectroscopy of (Ba, Sr)TiO_3 Thin Films Prepared by Chemical Vapor Deposition
- Preparation of (Ba, Sr)TiO_3 Thin Films by Chemical Vapor Deposition Using Liquid Sources
- Step Coverage and Electrical Properties of (Ba, Sr)TiO_3 Films Prepared by Liquid Source Chemical Vapor Deposition Using TiO(DPM)_2 ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
- Sub-100-nm Device Fabrication using Proximity X-Ray Lithography at Five Levels
- Mask Error Factor in Proximity X-Ray Lithography
- Spectroscopic Measurements of the Production and the Transport of CH Radicals in a Methane Plasma Used for the CVD of a-C:H
- On the Reaction Kinetics in a Mercury Photosensitized CVD of a-Si:H Films
- A Numerical Study on Gaseous Reactions in Silane Pyrolysis
- Development of temperature-control system for liquid droplet using surface Acoustic wave devices
- Use of a low refractive index prism in surface plasmon resonance biosensing
- Dependence of SPR sensor performance on prism material and its importance in biosensor
- I-3 Deposition of thin film based on SAW streaming(Device application (English session))
- P1-27 A study on SAW streaming phenomenon based on temperature measurement and observation of streaming in liquids(Poster session 1)
- High-Performance X-Ray Mask Fabrication Using TaGeN Absorber and Dummy Pattern Method for Sub-100nm Proximity X-Ray Lithography : Instrumentation, Measurement, and Fabrication Technology
- Suppression of Pattern Edge Roughness by Low Ion Strength Developer
- Properties of Ruthenium Films Prepared by Liquid Source Metalorganic Chemical Vapor Deposition Using Ru(EtCp)_2 with Tetrahydrofuran Solvent
- Development of dedicated STEM with high stability
- The study of AI-L_23 ELNES with resolution-enhancement software and first-principles calculation
- Spatially-resolved EELS analysis of multilayer using EFTEM and STEM
- A 500℃ fabrication process for MIM capacitors-based on a Ta_2O_5/Nb_2O_5 bilayer with high permittivity-for DRAM and SoC applications
- (Ba, Sr)TiO_3 Films Prepared by Liquid Source Chemical Vapor Deposition on Ru Electrodes
- Reaction Mechanism and Electrical Properties of (Ba, Sr)TiO_3 Films Prepared by Liquid Source Chemical Vapor Deposition
- Surface Morphologies and Electrical Properties of (Ba, Sr)TiO_3 Films Prepared by Two-Step Deposition of Liquid Source Chemical Vapor Deposition
- Reaction Mechanism of Chemical Vapor Deposition Using Tetraethylorthosilicate and Ozone at Atmospheric Pressure
- Fourier images feature of lattice fringes formed by low-loss electrons as observed using spatially-resolved EELS technique
- Nonlinear Vibration of Liquid Droplet by Surface Acoustic Wave Excitation
- Radical Concentrations and Prompt NO Formation in Hydrocarbon-Air Premixed Flames