Reactive Ion Etching of BiSrCaCuO Superconducting Thin Films using Ethane and Oxygen
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-03-01
著者
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Wada Osamu
Materials & Electronic Device Laboratory Mitsubishi Electric Corporation
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Wada Osamu
FESTA Laboratories
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Nunoshita M
Graduate School Of Materials Science Nara Institute Of Science And Technology
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Nunoshita M
Mitsubishi Electric Corp. Hyogo Jpn
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Nunoshita Masahiro
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Nunoshita Masahiro
Semiconductor Research Laboratory Mitsubishi Electric Corporation
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TAKAMI Tetsuya
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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KOJIMA Kazuyoshi
Semiconductor Research Laboratory, Mitsubishi Electric Corporation
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Wada O
The Department Of Electrical And Electronics Engineering Kobe University
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Wada Osamu
Fujitsu Laboratories
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Wada Osamu
Materials And Structures Laboratory Tokyo Institute Of Technology
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OISHI Toshiyuki
Semiconductor Research Laboratory, Mitsubishi Electric Coporarion
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Wada O
The Femtosecond Technology Research Association:the Kobe University.
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Kojima Kenichi
Graduate School Of Integrated Science Yokohama City University
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Kojima Kenichi
Department Of Physics Yokohama City University
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Takami T
Mitsubishi Electric Corp. Hyogo Jpn
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Kojima K
Department Of Electronic Engineering Faculty Of Engineering Aichi Institute Of Technology
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Wada Osamu
The Femtosecond Technology Research Association:the Kobe University.
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Kuroda Ken'ichi
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Oishi Toshiyuki
Information Technology R&d Center Mitsubishi Electric Corporation
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