(11n)-Oriented BiSrCaCuO Thin Film Formed on SrTiO_3(110) Substrate by RF Magnetron Sputtering
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1990-10-20
著者
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Wada Osamu
Materials & Electronic Device Laboratory Mitsubishi Electric Corporation
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Wada O
The Department Of Electrical And Electronics Engineering Kobe University
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Wada Osamu
Materials And Structures Laboratory Tokyo Institute Of Technology
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KOJIMA Kazuyoshi
Central Research Laboratory, Mitsubishi Electric Corporation
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HAMANAKA Koichi
Central Research Laboratory, Mitsubishi Electric Corporation
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Yokoyama Kazuo
Materials and Electronic Devices Laboratory, Mitsubishi Electric Corporation
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Wada O
The Femtosecond Technology Research Association:the Kobe University.
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Yokoyama Koji
School Of Science And Engineering Waseda University
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TANIOKU Masami
Central Research Laboratory, Mitsubishi Electric Corporation
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Tanioku Masami
Central Research Laboratory Mitsubishi Electric Corporation
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Kojima Kazuyoshi
Central Research Laboratory Mitsubishi Electric Corporation
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Yokoyama K
Waseda Univ. Tokyo Jpn
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Kuroda Ken'ichi
Advanced Technology R&d Center Mitsubishi Electric Corporation
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HAMANAKA Kenjiro
Tsukuba Research Laboratory, Nippon Sheet Glass Co., Ltd.
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Hamanaka K
Tsukuba Research Laboratory Nippon Sheet Glass Co. Ltd.
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Hamanaka Koichi
Central Research Laboratory Mitsubishi Electric Corporation
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Yokoyama Kazuo
Material Research Laboratory, Mitsubishi Electric Corporation, Tsukaguchi, Amagasaki, Hyogo 661
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