Hamanaka K | Tsukuba Research Laboratory Nippon Sheet Glass Co. Ltd.
スポンサーリンク
概要
関連著者
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HAMANAKA Kenjiro
Tsukuba Research Laboratory, Nippon Sheet Glass Co., Ltd.
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Hamanaka K
Tsukuba Research Laboratory Nippon Sheet Glass Co. Ltd.
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Kojima Kazuyoshi
Central Research Laboratory Mitsubishi Electric Corporation
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Hamanaka Koichi
Central Research Laboratory Mitsubishi Electric Corporation
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KOJIMA Kazuyoshi
Central Research Laboratory, Mitsubishi Electric Corporation
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HAMANAKA Koichi
Central Research Laboratory, Mitsubishi Electric Corporation
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Kojima Kenzo
Department Of Electronic Engineering Faculty Of Engineering Aichi Institute Of Technology
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Kuroda Kenji
Faculty Of Engineering The University Of Tokushima
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Kojima Kenichi
Graduate School Of Integrated Science Yokohama City University
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Kojima K
Department Of Electronic Engineering Faculty Of Engineering Aichi Institute Of Technology
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Kojima Kazuyoshi
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Kuroda Ken'ichi
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Wada Osamu
Materials & Electronic Device Laboratory Mitsubishi Electric Corporation
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Wada O
The Department Of Electrical And Electronics Engineering Kobe University
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Wada Osamu
Materials And Structures Laboratory Tokyo Institute Of Technology
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Yokoyama Kazuo
Materials and Electronic Devices Laboratory, Mitsubishi Electric Corporation
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Wada O
The Femtosecond Technology Research Association:the Kobe University.
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Yokoyama Koji
School Of Science And Engineering Waseda University
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Kojima Kenichi
Department Of Physics Yokohama City University
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TANIOKU Masami
Central Research Laboratory, Mitsubishi Electric Corporation
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Tanioku Masami
Central Research Laboratory Mitsubishi Electric Corporation
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Yokoyama K
Waseda Univ. Tokyo Jpn
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Yokoyama Kazuo
Material Research Laboratory, Mitsubishi Electric Corporation, Tsukaguchi, Amagasaki, Hyogo 661
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Kojima Kenzo
Department Of Electrical Engineering Aichi Institute Of Technology
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TANIMURA Junji
Materials and Electronic Devices Laboratory, Mitsubishi Electric Corporation
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KATAOKA Masayuki
Materials & Electronic Devices Laboratory, Mitsubishi Electric Corporation
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Kataoka M
Hokkaido Univ. Sapporo Jpn
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OGAMA Tetsuo
Materials and Electronic Devices Laboratory, Mitsubishi Electric Corporation
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Tanimura J
Mitsubishi Electric Corp. Hyogo Jpn
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Kuroda K
Central Research Laboratory Hitachi Ltd.
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Tanimura Junji
Materials And Electronic Devices Laboratory Mitsubishi Electric Corporation
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Ogama T
Mitsubishi Electric Corp. Hyogo Jpn
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KURODA Keigo
Department of Materials Science, Faculty of Science, Hiroshima University
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Tanimura Junji
Materials and Electronic Device Laboratory, Mitsubishi Electric Corporation
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Ogama Tetsuo
Materials and Electronic Device Laboratory, Mitsubishi Electric Corporation
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TAKAMI Tetsuya
Central Research Laboratory, Mitsubishi Electric Corporation
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Takami T
Mitsubishi Electric Corp. Hyogo Jpn
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Kuroki H
Department Of Orthopaedic Surgery Miyazaki Medical College
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Kuroki Hiroshi
Department Of Orthopaedic Surgery Miyazaki Medical College
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Kuroki Hiroshi
Materials & Electronic Devices Laboratory Mitsubishi Electric Corporation
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Eckstein James
Varian Research Center
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Harris James
Department Of Electrical Engineering Stanford University
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SCHLOM Darrell
Department of Electrical Engineering, Stanford University
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Schlom Darrell
Department Of Electrical Engineering Stanford University
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Hamanaka Kenjiro
Tsukuba Research Center Nippon Sheet Glass Co. Ltd.
著作論文
- Artificial Grain Boundary Junctions in BiSrCaCuO Thin Films with (11n) and (001) Orientation
- Dependence of Crystal Orientation of BiSrCaCuO Thin Films on Off-Angles of Vicinal SrTiO_3 (110) Surfaces
- Crystal Orientation of BiSrCaCuO (11n) Thin Films Determined by X-ray Asymmetric Reflection
- Microscopic Study on (11n)-Oriented BiSrCaCuO Films by Cross-Sectional Transmission Electron Microscopy
- Bi_2(Sr, Ca)_3Cu_2O_x and Bi_2(Sr, Ca)_4Cu_3O_x Thin Films with (11n) Orientation
- (11n)-Oriented BiSrCaCuO Thin Film Formed on SrTiO_3(110) Substrate by RF Magnetron Sputtering
- Effect of Growth Temperature on Superconducting Phases of As-Grown BiSrCaCuO Thin Film Formed by RF Magnetron Sputtering
- Preparation of Ca-Doped YBaCuO Thin Films Containing 248 Phase by RF Magnetron Sputtering
- Formation of As-Grown BiSrCaCuO Thin Films by Sputtering Three Targets Heavily Doped with Pb in Atmospheres of O_2 and N_2O/O_2 Mixtures
- Superconductivity of Bi System Thin Films Formed by Consecutively Sputtering Three Pb-Doped Targets of Slightly Different Compositions
- Superstructure in Thin Films of Bi-Based Compounds on MgO
- As-Grown Superconductivity of BiSrCaCuO Thin Films Prepared by Magnetron Sputtering with Three Targets: Bi_(SrCa)_2Cu_3O_x, Bi_2(SrCa)_Cu_3O_x and Bi_2(SrCa)_2Cu_O_x (a = b = 1, c = 1.5)
- Integration of Free-Space Interconnects Using Selfoc Lenses : Image Transmission Properties