Formation of As-Grown YBaCuO Thin Films by RF Magnetron Sputtering from Three Targets
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概要
- 論文の詳細を見る
As-grown YBaCuO thin films with 500 Å thickness have been formed at 620°C on MgO(100) substrates by RF magnetron sputtering from three targets: Y1.5Ba2Cu3Ox, Y1Ba3Cu3Ox and Y1Ba2Cu4.5Ox. The chemical composition can be precisely controlled by this method. A smooth surface was obtained by adjusting the chemical composition. Zero resistivity was observed at 81 K for the best superconducting film. The films with a slightly Cu excessive composition showed somewhat higher $T_{\text{c}}$(zero) than the stoichiometric film. X-ray diffraction spectra of sputtered films did not change distinguishably upon varying of the chemical composition when the value of Ba/Y ranged from 1.5 to 2.3 and the value of Cu/Y ranged from 1.8 to 3.3. The $c$-axis of the film was highly oriented normal to the substrate surface, and the $c$-axis lattice constant was equal to that of a bulk sample.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 1989-10-20
著者
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Yokoyama Kazuo
Materials and Electronic Devices Laboratory, Mitsubishi Electric Corporation
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Tanioku Masami
Central Research Laboratory Mitsubishi Electric Corporation
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Kojima Kazuyoshi
Central Research Laboratory Mitsubishi Electric Corporation
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Hamanaka Koichi
Central Research Laboratory Mitsubishi Electric Corporation
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Kuroda Ken'ichi
Central Research Laboratory, Mitsubishi Electric Corp., Tsukaguchi, Amagasaki, Hyogo 661
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Hamanaka Koichi
Central Research Laboratory, Mitsubishi Electric Corp., Tsukaguchi, Amagasaki, Hyogo 661
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Yokoyama Kazuo
Material Research Laboratory, Mitsubishi Electric Corporation, Tsukaguchi, Amagasaki, Hyogo 661
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Yokoyama Kazuo
Materials and Electronic Device Laboratory, Mitsubishi Electric Corp., Tsukaguchi, Amagasaki, Hyogo 661
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