Takata M | Nagaoka Univ. Technology Niigata
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概要
関連著者
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Takata M
Nagaoka Univ. Technology Niigata
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TAKATA Masasuke
Department of Electrical Engineering, Nagaoka University of Technology
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Takata Masasuke
Department Of Electrical Engineering Nagaoka University Of Technology
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Maeda T
Electrotechnical Lab. Tskuba Jpn
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Maeda Toru
Department Of Material Science Graduate School Of Engineering Tohoku Uniiversity
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Maeda T
Storage Technology Research Center Research & Development Group Hitachi Ltd.
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Yamashita Tsutomu
Recearch Institute Of Electrical Communication Tohoku University
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Yamashita T
The Graduate School Of Engineering Science And The Liquid Crystal Institute Science University Of To
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Maeda T
Electrotechnical Lab. Ibaraki Jpn
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Maeda Tatsuro
Electrotechnical Laboratory
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Yamashita Tsutomu
Department of Sensory Science, Faculty of Health Science and Technology, Kawasaki University of Medi
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ISHII Makoto
Optoelectronics Joint Research Laboratory
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Ishii M
Electrotechnical Laboratory
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Ishii M
Optoelectronics Joint Research Laboratory
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Maeda T
Semiconductor Leading Edge Technol. Inc. Ibaraki Jpn
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Ishii M
Liquid Crystal Lab. Sharp Corp.
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Ishii M
Central Research Laboratory Nihon Cement Co. Lid.
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Ishii M
Shonan Inst. Technol. Kanagawa Jpn
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Ishii Mamoru
Nihon Cement Co. Ltd.
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Matsuda M
Muroran Institute Of Technology
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Matsuda M
Tohoku Univ. Sendai Jpn
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Matsuda Motohide
Department Of Electrical Engineering Nagaoka University Of Technology
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Nagata H
Sci. Univ. Tokyo Chiba‐ken Jpn
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Kawakami A
Kansai Advanced Research Center National Institute Of Information And Communications Technology
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Kawakami Akira
Technol. Res. Assoc. Advanced Display Materials Tokyo Jpn
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Kawakami A
Tokyo Univ. Agriculture And Technol. Tokyo Jpn
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Kawakami Akira
Kansai Advanced Research Center National Institute Of Information And Communications Technology
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Kan Akinori
Department Of Orthopaedic Surgery The University Of Tokyo
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Kawakami A
National Agricultural Res. Center For Hokkaido Region Sapporo Jpn
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Koinuma Hideomi
Research Laboratory Of Engineering Materials Tokyo Institute Of Technology
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Matsuda M
Electrotechnical Laboratory:(present Address) Muroran Institute Of Technology
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KIKUCHI Akira
Department of Hematology/Oncology, Saitama Children's Medical Center
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Kikuchi A
Department Of Electrical And Electronic Engineering Sophia University
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MAEDA Takeshi
Central Research Laboratory, Hitachi, Ltd.
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KAWAI Akira
LSI Laboratory, Mitsubishi Electric Corporation
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Iwai Y
Nagaoka Univ. Technology Niigata
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Iwai Y
Nagaoka College Of Technology
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弘津 禎彦
大阪大学産業科学研究所高次制御材料科学研究部門材料機能物性研究分野
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室田 淳一
東北大学 電気通信研究所
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Ishii M
Toyota Central Res. And Dev. Lab. Inc. Aichi Jpn
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Nagata Hitoshi
Ulsi Laboratory Mitsubishi Electric Corporation
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KAWAI Akira
ULSI Laboratory, Mitsubishi Electric Corporation
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NAGATA Hitoshi
LSI Laboratory, Mitsubishi Electric Corporation
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Kawai Akira
Ulsi Laboratory Mitsubishi Electric Corporation:(present Address)department Of Electrical Engineerig
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Shigematsu Koji
Central Research Laboratory Mitsui Mining & Smelting Co. Ltd.
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Shigematsu K
Faculty Of Education Iwate University
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Toda T
Japan Advanced Inst. Sci. And Technol. Ishikawa Jpn
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HIROTSU Yoshihiko
Department of Mechanical Engineering, Nagaoka University of Technology
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MATSUSHITA Koichi
Department of Electrical and Information Engineering, Faculty of Engineering, Yamagata University
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KAWAKAMI Akira
Department of Orthopedics Surgery, Tokyo Teishin Hospital
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KOMATSU Takayuki
Department of Materials Science and Technology, Nagaoka University of Technology
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KOINUMA Hideomi
Tokyo Institute of Technology
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MORIMOTO Hiroaki
ULSI Laboratory, Mitsubishi Electric Corporation
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Tsukamoto K
Univ. Tokyo Tokyo Jpn
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Koinuma Hideomi
Department Of Industrial Chemistry Faculty Of Engineering University Of Tokyo
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Koinuma Hideomi
Department Of Industrial Chemistry University Of Tokyo
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IWAI Yutaka
Department of Electrical Engineering, Nagaoka University of Technology
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OJIMA Masahiro
Central Research Laboratory, Hitachi Ltd.
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Ojima Masahiro
The Institute For Solid State Physics The University Of Tokyo:presently At Central Research Laborato
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Matsushita Koichi
Department Of Electrical And Information Engineering Faculty Of Engineering Yamagata University
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Yoshimoto Masahiro
Department Of Electronic Science And Engineering Faculty Of Engineering Kyoto University
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Yoshimoto Masahiro
Department Of Electronic Science And Engineering Kyoto University
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Kikuchi Hiromi
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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Kawakami Akira
Department Of Electrical Engineering Technological University Of Nagaoka
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Koinuma Hideomi
Materials And Structures Laboratory Tokyo Institute Of Technology
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Yoshimoto M
Materials And Structures Laboratory Tokyo Institute Of Technology
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NAGAKURA Sigemaro
Faculty of Engineering, Nagaoka University of Technology
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MAEDA Takao
Department of Mechanical Engineering, Mie University
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ARAI Shigehisa
Research Center for Quantum Effect Electronics, Tokyo Institute of Technology
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Arai S
Research Center For Quantum Effect Electronics Tokyo Institute Of Technology
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Arai Shigehisa
Faculty Of Engineering Tokyo Institute Of Technology
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Nishida T
Ntt Basic Res. Lab. Kanagawa Jpn
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NAKAMURA Yoshio
Department of Chemistry, Faculty of Sciece, Konan University
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KOINUMA Hideomi
Materials and Structures Laboratory, Tokyo Institute of Technology
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Gotoh A
Tohoku Univ. Sendai Jpn
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Gotoh Akira
The 2nd Department Of Internal Medicine Shinshu University School Of Medicine
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Gotoh Akira
Tsukuba Research Laboratory Hitachi Maxell Ltd.
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Arai Shigehisa
Department Of Electrical And Electronics Engineering Tokyo Institute Of Technology
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Miyamoto H
Hitachi Ltd. Tokyo Jpn
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MUROTA Junichi
Research Institute of Electrical Communication, Tohoku University
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Nishida T
Nara Inst. Sci. And Technol. Nara Jpn
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Mizutani Goro
School of Materials Science, Japan Advanced Institute of Science and Technology
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YAMABE Kikuo
Institute of Applied Physics, University of Tsukuba
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YOSHIMOTO Mamoru
Materials and Structures Laboratory Tokyo Institute of Technology
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KAWAI Akira
LSI-R&D Laboratory, Mitsubisi Electric Corporation
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NAGATA Hitoshi
LSI-R&D Laboratory, Mitsubisi Electric Corporation
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ABE Haruhiko
LSI-R&D Laboratory, Mitsubisi Electric Corporation
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Kawasaki Masashi
Department Of Applied Biological Science Tokyo Noko University
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Abe Haruhiko
Lsi-r&d Laboratory Mitsubishi Electric Corporation
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Watanabe Hirohito
Institute Of Material Science University Of Tsukuba
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Nishida Tetsuya
Central Research Laboratory Hitachi Ltd.
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Nishida Tetsuya
Central Resarch Laboratory Hitachi Ltd.
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Koinuma Hideomi
Materials And Structures Labolatory Tokyo Institute Of Technology
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Nishida T
Nara Inst. Sci. And Technol. (naist) Nara Jpn
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Watanabe H
Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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IWAI Yutaka
Technological Development Center, Nagaoka University of Technology
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Nishida T
Ntt Basic Research Laboratories
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Nishida Toshio
Ntt Basic Research Laboratories Physical Science Laboratory
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OHNISHI Tsuyoshi
Materials and Structures Laboratory, Tokyo Institute of Technology
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MAEDA Tatsuro
Materials and Structures Laboratory, Tokyo Institute of Technology
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Sugiyama Hisataka
Central Research Laboratory, Hitachi Ltd.
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Horigome Shinkichi
Central Research Laboratory, Hitachi Ltd.
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ARAI Shinichi
Odawara Works, Hitachi Ltd
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SHIGEMATSU Kazuo
Odawara Works, Hitachi Ltd
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WATANABE Hitoshi
Tsukuba research Laboratory, Hitachi Maxell Ltd.
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Niihara Toshio
Central Research Laboratory Hitachi Ltd.
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Ojima Masahiro
Central Research Laboratory Hitachi Ltd.
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MATSUMOTO Hitoshi
Wireless Research Laboratory, Matsushita Electric Industrial Co., Ltd.
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Yamagishi Chitake
Central Research Laboratory Nihon Cement Co. Lid.
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Matsumoto Hiroshige
Institute On Industrial Science University Of Tokyo
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Imai Keitaro
Ulsi Process Engineering Laboratory Microelectronics Engineering Laboratory Toshiba Corporation
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Nakamura Y
The Authors Are With Fujitsu Laboratories Limited
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Arai I
Research Center For Quantum Effect Electronics Tokyo Institute Of Technology
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Saitoo Atsushi
Central Research Laboratory Hitachi Ltd.
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Sugiyama H
Data Storage Amp Retrieval Systems Division Hitachi Ltd.
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Horigome Shinkichi
Central Research Laboratory Hitachi Ltd.
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GOTO Kenya
Department of Information and Communication Technology Tokai University
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KUGIYA Fumio
Central Research Laboratory, Hitachi Ltd.
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Ide H
Department Of Mathematical And Life Sciences Graduate School Of Science Hiroshima University
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Ide H
Central Research Laboratory Hitachi Ltd.
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Goto K
Department Of Information And Communication Technology Tokai University
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Kugiya F
Data Storage Amp Retrieval Systems Div. Hitachi Ltd.
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Kugiya Fumio
Central Research Laboratory Hitachi Ltd.
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Imai K
Toyota Physical And Chemical Research Institute
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Murata Y
Osaka Prefectural College Of Technology
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Yamabe K
Institute Of Applied Physics University Of Tsukuba
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Yamabe Kikuo
Institute Of Applied Physics University Of Tsukuba
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Mita S
Data Storage & Retrieval Systems Division Hitachi Ltd.
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Mita S
Toyota Technological Institute
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Nakao T
Central Research Laboratory Hitachi Ltd.
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Toda Tsuyoshi
Central Research Laboratory Hitachi Ltd.
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Mizutani Goro
School Of Materials Science Jaist
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Murota Junichi
Laboratory For Microelectronics Research Institute Of Electrical Communication Tohoku University
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Murota Junichi
Laboratory For Electronic Intelligent Systems Research Institute Of Electrical Communication Tohoku
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Murota Junichi
Research Institute For Electrical Communications Tohoku University
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YAMASHITA Tsutomu
Research Institute of Electrical Communication Tohoku University
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KISHIO Kohji
Department of Superconductivity, Graduate School of Engineering, University of Tokyo
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TANAKA Osamu
Department of Biology, Faculty of Science and Engineering, Konan University
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Kawasaki M
Institute For Materials Research (imr) Tohoku University
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Lee M
National Inst. Advanced Interdisciplinary Res.(nair) Tsukuba Jpn
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CHIKYOW Toyohiro
National Institute for Mateirals Science
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室田 淳一
東北大学
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Saito J
Extreme Ultraviolet Lithography System Dev. Assoc. (euva) Kanagawa Jpn
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Saito Junji
Fujitsu Laboratories Limited
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USHIODA Sukekatsu
Research Institute of Electrical Communication, Tohoku University
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Yamamoto N
Sharp Corp. Nara Jpn
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KOSHIHARA Shin-Ya
Department of Material Science, Tokyo Institute of Technology
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Saito Junji
Fujitsu Laboratories Ltd.
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Ono S
Tohoku Univ. Sendai
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Ono Shoichi
Laboratory For Microelectronics Research Institute Of Electrical Communication Tohoku University
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Kishio Kohji
Department Of Industrial Chemistry University Of Tokyo
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Kishio Kohji
Department Of Applied Chemistry Faculty Of Engineering University Of Tokyo
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Koinuma H
National Institute For Materials Science (nims)
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Maeda Tatsuro
Research Center for Basic Science, Nisshin Seifun Group, Inc.
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ITO Atsushi
Department of Radiation Oncology, Hiroshima General Hospital
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YAMAMOTO Naoki
Faculty of Pharmaceutical Sciences, Kyoto University, Kyoto
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MIYAMOTO Harukazu
Central Research Laboratory, Hitachi, Ltd.
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ANDOO Keikichi
Central Research Laboratory, Hitachi, Ltd.
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KANDA Takahiro
Institute of Applied Physics, University of Tsukuba
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WATANABE Jinzou
Kita-Itami Works, Mitsubishi Electric Corporation
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MAEDA Tatsuro
Electron Devices Division, Electrotechnical Laboratory
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Saito J
New Business Development Department Nikon Corporation In Hitachi Maxell
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Saito Jun
Nikon Corp. New Business Development Department
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Maeda Tatsuro
Research Center For Basic Science Nisshin Seifun Group Inc.
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Ito Atsushi
Department Of Cardiovascular Surgery Okayama University Graduate School Of Medicine And Dentistry
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KUMAGAI Masao
Kanagawa Industrial Technology Research Institute
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YOSHIMOTO Mamoru
Research Laboratory of Engineering Materials, Tokyo Institute of Technology
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YAMANAKA Hiroshi
Department of Electrical Engineering, Nagaoka University of Technology
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TANAKA Masasuke
Department of Electrical Engineering, Nagaoka University of Technology
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NIIHARA Toshio
Central Research Laboratory, Hitachi Ltd.
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LEE Myung
Materials and Structures Laboratory, Tokyo Institute of Technology
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KAWASAKI Masashi
Materials and Structures Laboratory, Tokyo Institute of Technology
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Iwai Yutaka
Faculty Of Engineering Nagaoka University Of Technology
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SATOO Atsushi
Central Research Laboratory, Hitachi Ltd.
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SAITOO Atsushi
Central Research Laboratory, Hitachi Ltd.
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Yokoo Kuniyoshi
Laboratory For Microelectronics Research Institute Of Electrical Communication Tohoku University
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KANEKO Yasuhisa
Department of Molecular Biology, Faculty of Engineering, Kagoshima University
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EBIHARA Kenzo
Department of Applied Physics, Tokyo Institute of Technology
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Lee Myung
Materials And Structures Laboratory Tokyo Institute Of Technology:(present) National Institute For A
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Ebihara Kenzo
Department Of Applied Physics Tokyo Institute Of Technology
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Ushioda Sukekatsu
School Of Materials Science Japan Advanced Institute Of Science And Technology
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Ushioda Sukekatsu
Research Institute Of Electrical Communication Tohokn University
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NAGATA Hitosi
LSI Laboratory, Mitsubishi Electric Corporation
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FUJIKI Michiya
NTT Basic Research Laboratories
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SHIMOZONO Kazuki
Research Laboratory of Engineering Materials, Tokyo Institute of Technology
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OHNISHI Tsuyoshi
Research Laboratory of Engineering Materials, Tokyo Institute of Technology
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ISHIYAMA Osamu
Keihanna Research Laboratory, Shimadzu Corporation
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SHINOHARA Makoto
Keihanna Research Laboratory, Shimadzu Corporation
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Schutz Reiner
Laboratory For Microelectronics Research Institute Of Electrical Communication Tohoku University : O
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Sawada Yasuji
Laboratory For Microelectronics Research Institute Of Electrical Communication Tohoku University
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Tomioka Osamu
Faculty Of Engineering Nagaoka University Of Technology
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Kanda T
Institute Of Applied Physics University Of Tsukuba:center For Tsukuba Advanced Research Alliance Uni
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Nakamura Y
Nec Fundamental Research Laboratories
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HIROTSU Yoshihiko
Faculty of Engineering, Nagaoka University of Technology
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TAKATA Masasuke
Faculty of Engineering, Nagaoka University of Technology
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Akasaka H
Information Storage Products Department Nikon Corporation
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Kircher Roland
Laboratory For Microelectronics Research Institute Of Electrical Communication Tohoku University : (
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Fujiki M
Ntt Basic Res. Lab. Kanagawa
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Kanda Takahiro
Institute Of Applied Physics University Of Tsukuba
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OKAMOTO Shoichi
Department of Electrical Engineering, Nagaoka University of Technology
著作論文
- Shrinkage Effect of Local Area of Polymer Film on Adhesion Behavior
- Blister Formation at Photoresist-Substrate Interface
- Local Peeling of Photoresist Film during Ultraviolet Light Exposure
- Adhesion of Photoresist Pattern Baked at 80 to 325℃ to Inorganic Solid Surface
- Adhesion of Photoresist Pattern Baked at 80 to 325℃ in Tetramethyl-ammonium-hydroxide Aqueous Solution
- Characterization of Surface Energetic Behavior by Atomic Force Microscopy
- Adhesion of Photoresist Micropattern to Aluminum Substrate in Alkaline Aqueous Solution
- Dependence of Offset Error on Overlay Mark Structures in Overlay Measurement
- Adhesion between Photoresist and Inorganic Substrate : Resist Material and Process
- Adhesion between Photoresist and Inorganic Substrate
- Preparation of Superconducting Bi-Pb-Sr-Ca-Cu-O Glass Ceramics with T_=106 K
- Formation of the High-T_c Phase of Bi_Pb_xSr_Ca_Cu_O_y (0 ≦ x ≦ 0.05)
- Effect of Annealing on Superconductivity in Bi-Pb-Sr-Ca-Cu-O System
- Influence of Intermediate Pressing on Superconducting Characteristics in Bi-Pb-Sr-Ca-Cu-O System
- Influence of Cooling Rate on Superconducting Characteristics of Bi-Pb-Sr-Ca-Cu-O Ceramics
- Superconducting Characteristics and Microstructure of Bi-Pb-Sr-Ca-Cu-O Ceramics : Electrical Properties of Condensed Matter
- Critical Current Density of Bi-Pb-Sr-Ca-Cu-O Superconducting Ceramics : Electrical Properties of Condensed Matter
- Growth and Characterization of Ferroelectric Pb(Zr, Ti)O_3 Films on Interface-Controlled CeO_2(111)/Si(111) Structures
- Analysis of Leading Edge/Trailing Edge Independent Detection Method in Optical Disk : High Density Recording
- Analysis of Leading Edge/Trailing Edge Independent Detection Method in Optical Disk
- Dependency of Adhesion Behavior on Thermtal Stress Distribution in Photoresist Micropatterns
- Direct Observation of Helical Polysilane Nanostructures by Atomic Force Microscopy
- Room-Temperature Epitaxial Growth of CeO_2 Thin Films on Si(111) Substrates for Fabrication of Sharp Oxide/Silicon Interface
- Modulated Structure of the High-T_c Superconductor Bi-Pb-Ca-Sr-Cu-O Studied by High-Resolution Electron Microscopy and Electron Diffraction
- Processing and Superconducting Properties of GdBa_2Cu_3O_ Ceramics : Electrical Properties Condensed Matter
- Influence of Preparative Conditions on the Superconducting Characteristics in GdBa_2Cu_3O_ Ceramics : Electrical Properties of Condensed Matter
- Observation of GdBa_2Cu_3O_ Ceramic Microstructure : Electrical Properties of Condensed Matter
- Precise Mark Shape Control in Mark Length Recording on Magnetooptical Disk
- Read Channel and Format for High-Density Magneto-Optical Disk System
- Dependence of Magnetic Shielding Property on Critical Current Density
- Magnetic Shielding Propertiy of Bi(Pb)-Sr-Ca-Cu-O Superconducting Tube
- High Resolution Electron Microscopy of Crystal and Defect Structures of the High-T_c Superconductor Ba_2YCu_3O_
- Electron Diffraction and Microscopy of the Structures of La-Ba(Sr)-Cu Oxides at Liquid Helium Temperature
- Rf Power Dependence of AC Josephson Current in Point-Contacts of BaY(Tm)CuO Ceramics
- AC Josephson Effect in Point-Contacts of Ba-Y-Cu-0 Ceramics
- Critical Current Density and Microstructure of Superconducting YBa_2Cu_3O Films Prepared by a Tape Casting Method : Electrical Properties Condensed Matter
- Fabrication of Superconducting YBa_2Cu_3O_ Films by a Tape Casting Method
- Ultrashallow Junction Formation Using Low-Temperature Selective Si_Ge_x Chemical Vapor Deposition
- Fabrication of a Si_Ge_x Channel Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) Containing High Ge Fraction Layer by Low-Pressure Chemical Vapor Deposition
- 2 GB/130 mm Capacity Direct-Overwrite Magneto-Optical Disk
- Epitaxial Growth of BaTiO_3 Thin Film on SrTiO_3 Substrate in Ultra High Vacuum without Introducing Oxidant : Surfaces, Interfaces, and Films
- Flattening Phenomenon Observed during Epitaxial Growth of BaTiO_3 by Alternating Deposition Method
- Reciprocation Characteristics of a Magnet Levitated above a YBa_2Cu_3O_x Superconductor
- Damping Characteristics of a Magnet Oscillating above a YBCO Superconductor
- Application of Domain Transfer to Magneto-optical Recording: Domain Stabilization during Readout
- Second Harmonic Generation from Si_Ge_x Epitaxial Films with a Vicinal Face:Film Thickness Dependence
- Optical Second Harmonic Generation in Si_Ge_x Film Epitaxially Grown on Si(100)
- On the Reactions of Quenched BaYCuO Powders with Various Materials : Electrical Properties of Condensed Matter
- Crystalline Phases in Superconductor Ba-Y-Cu-O with High T_c Prepared by Melting Method
- Liquid Quenched Superconductor Ba-Y-Cu-O with T_=88 K and AC Josephson Effect at 77 K
- Superficial Aggravation of Sputter-deposited Bi-Sr-Ca-Cu-O Films by Annealing : Electrical Properties of Condensed Matter