KANDA Takahiro | Institute of Applied Physics, University of Tsukuba
スポンサーリンク
概要
関連著者
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YAMABE Kikuo
Institute of Applied Physics, University of Tsukuba
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KANDA Takahiro
Institute of Applied Physics, University of Tsukuba
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Yamabe Kikuo
Institute Of Applied Physics University Of Tsukuba
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Kanda Takahiro
Institute Of Applied Physics University Of Tsukuba
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Takata M
Nagaoka Univ. Technology Niigata
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Maeda T
Semiconductor Leading Edge Technol. Inc. Ibaraki Jpn
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Maeda T
Electrotechnical Lab. Tskuba Jpn
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Tokuda Norio
Institute Of Applied Physics University Of Tsukuba
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YAMASAKI Satoshi
Research Center for Advanced Carbon Materials and Nanotechnology Research Institute National Institu
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MIKI Kazushi
Research Center for Advanced Carbon Materials and Nanotechnology Research Institute National Institu
著作論文
- Leakage Current Distribution of Cu-Contaminated Thin SiO_2
- Flattening Phenomenon Observed during Epitaxial Growth of BaTiO_3 by Alternating Deposition Method