Yamabe K | Institute Of Applied Physics University Of Tsukuba
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概要
関連著者
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Yamabe K
Institute Of Applied Physics University Of Tsukuba
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YAMABE Kikuo
Institute of Applied Physics, University of Tsukuba
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Yamabe Kikuo
Institute Of Applied Physics University Of Tsukuba
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Takata M
Nagaoka Univ. Technology Niigata
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Maeda T
Semiconductor Leading Edge Technol. Inc. Ibaraki Jpn
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Maeda T
Electrotechnical Lab. Tskuba Jpn
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Tokuda Norio
Nanotechnology Research Institute National Institute Of Advanced Industrial Science And Technology (
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Tokuda N
Univ. Tsukuba Ibaraki Jpn
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Tokuda Norio
Institute Of Applied Physics University Of Tsukuba
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HOJO Daisuke
Institute of Applied Physics, University of Tsukuba
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MURATA Masahide
Institute of Applied Physics, University of Tsukuba
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Maeda Toru
Department Of Material Science Graduate School Of Engineering Tohoku Uniiversity
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Maeda T
Storage Technology Research Center Research & Development Group Hitachi Ltd.
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Maeda T
Electrotechnical Lab. Ibaraki Jpn
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Maeda Tatsuro
Electrotechnical Laboratory
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Tokuda Norio
Diamond Research Center National Institute Of Advanced Industrial Science And Technology (aist)
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Hojo Daisuke
Institute Of Applied Physics University Of Tsukuba
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Tokuda Norio
Institute Of Science And Engineering Kanazawa University
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Tokuda N
Institute Of Science And Engineering Kanazawa University
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SHIMOYAMA Kazuo
Institute of Applied Physics, University of Tsukuba
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Murata Masahide
Institute Of Applied Physics University Of Tsukuba
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Shimoyama K
Univ. Tsukuba Ibaraki Jpn
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Shimoyama Kazuo
Institute Of Applied Physics University Of Tsukuba:center For Tara University Of Tsukuba
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KANDA Takahiro
Institute of Applied Physics, University of Tsukuba
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MAEDA Tatsuro
Electron Devices Division, Electrotechnical Laboratory
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KIYOTOSHI Masahiro
Microelectronics Engineering Laboratory, Semiconductor Company, Toshiba Corporation
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Yamabe Kikuo
Ulsi Research Center Toshiba Corporation
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Kanda T
Institute Of Applied Physics University Of Tsukuba:center For Tsukuba Advanced Research Alliance Uni
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Murata M
Sumitomo Electric Ind. Ltd. Yokohama Jpn
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Kanda Takahiro
Institute Of Applied Physics University Of Tsukuba
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KUBO Kousuke
Institute of Applied Physics, University of Tsukuba
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IIDA Manabu
Institute of Applied Physics, University of Tsukuba
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MAEDA Tatsuro
Center for Tsukuba Advanced Research Alliance, University of Tsukuba
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KAI Liao
Institute of Applied Physics, University of Tsukuba
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Iida Manabu
Institute Of Applied Physics University Of Tsukuba:center For Tsukuba Advanced Research Alliance Uni
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Kubo Kousuke
Institute Of Applied Physics University Of Tsukuba:center For Tara University Of Tsukuba
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Kai Liao
Institute Of Applied Physics University Of Tsukuba
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Hojo D
Univ. Tsukuba Tsukuba Jpn
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KIYOTOSHI Masahiro
ULSI Process Engineering Laboratory, Microelectronics Engineering Laboratory, Toshiba Corporation
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Kiyotoshi Masahiro
Microelectronics Engineering Laboratory Semiconductor Company Toshiba Corporation
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TSUNASIMA Yoshitaka
ULSI Research Laboratories, Research and Development Center, Toshiba Corporation
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Tsunasima Yoshitaka
Ulsi Research Laboratories Research And Development Center Toshiba Corporation
著作論文
- Atomic Topography Change of SiO_2/Si Interfaces during Thermal Oxidation : Semiconductors
- SiO_2 Surface and SiO_2/Si Interface Topography Change by Thermal Oxidation : Semiconductors
- Epitaxial Growth of BaTiO_3 Thin Film on SrTiO_3 Substrate in Ultra High Vacuum without Introducing Oxidant : Surfaces, Interfaces, and Films
- Flattening Phenomenon Observed during Epitaxial Growth of BaTiO_3 by Alternating Deposition Method
- Surface Microroughness Observed during Wet Etching of Silicon Dioxide with High Electric Field Stress
- Re-Oxidation of Thermally Nitrided Silicon Dioxide Thin Films