Characterization of Surface Energetic Behavior by Atomic Force Microscopy
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1992-07-15
著者
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Takata M
Nagaoka Univ. Technology Niigata
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TAKATA Masasuke
Department of Electrical Engineering, Nagaoka University of Technology
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KAWAI Akira
LSI Laboratory, Mitsubishi Electric Corporation
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NAGATA Hitoshi
LSI Laboratory, Mitsubishi Electric Corporation
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Takata Masasuke
Department Of Electrical Engineering Nagaoka University Of Technology
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Nagata H
Sci. Univ. Tokyo Chiba‐ken Jpn
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Nagata H
Osaka Prefecture Univ. Osaka Jpn
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Takata M
Osaka Univ. Osaka Jpn
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Kawai Akira
Lsi Laboratory Mitsubishi Electric Corporation
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- Characterization of Surface Energetic Behavior by Atomic Force Microscopy
- Adhesion of Photoresist Micropattern to Aluminum Substrate in Alkaline Aqueous Solution
- Dependence of Offset Error on Overlay Mark Structures in Overlay Measurement
- Adhesion between Photoresist and Inorganic Substrate : Resist Material and Process
- Adhesion between Photoresist and Inorganic Substrate
- Proposal of a Next-Generation Super Resolution Technique
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- Photolithography System Using Annular Illumination : Photolithography
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- Superconductivity in a New Oxide System of Eu-La-Ce-Cu-O
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- Evaluation of the Correspondence between Carbon Incorporation and the Development of c(4×4) Domains
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