In Situ RHEED Observation of CeO_2 Film Growth on Si by Laser Ablation Deposition in Ultrahigh-Vacuum

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1990-07-20

著者

• Nagata Hirotoshi

  The Research Laboratory of Engineering Materials, Tokyo Institute of Technology

• Tsukahara Tadashi

  The Research Laboratory of Engineering Materials, Tokyo Institute of Technology

• Yoshimoto Mamoru

  The Research Laboratory of Engineering Materials, Tokyo Institute of Technology

• Koinuma Hideomi

  The Research Laboratory of Engineering Materials, Tokyo Institute of Technology

• Yoshimoto Masahiro

  Department Of Electronic Science And Engineering Faculty Of Engineering Kyoto University

• Nagata H

  Sci. Univ. Tokyo Chiba‐ken Jpn

• Yoshimoto M

  Materials And Structures Laboratory Tokyo Institute Of Technology

• Yoshimoto M

  Kyoto Inst. Technol. Kyoto Jpn

• Nagata H

  Osaka Prefecture Univ. Osaka Jpn

• Tsukahara T

  The Research Laboratory Of Engineering Materials Tokyo Institute Of Technology

関連論文

• Ferroelectric Property of a- /b-Axis- Oriented Epitaxial Sr_Bi_Ta_2O_9 Thin Films Grown by Metalorganic Chemical Vapor Deposition : Electrical Properties of Condensed Matter
• Fabrication of Micropatterns on Sapphire Substrates via Room-Temperature Selective Homoepitaxial Growth Induced by Electron Beam Irradiation
• Shrinkage Effect of Local Area of Polymer Film on Adhesion Behavior
• Blister Formation at Photoresist-Substrate Interface
• Local Peeling of Photoresist Film during Ultraviolet Light Exposure
• Adhesion of Photoresist Pattern Baked at 80 to 325℃ to Inorganic Solid Surface
• Adhesion of Photoresist Pattern Baked at 80 to 325℃ in Tetramethyl-ammonium-hydroxide Aqueous Solution
• Characterization of Surface Energetic Behavior by Atomic Force Microscopy
• Adhesion of Photoresist Micropattern to Aluminum Substrate in Alkaline Aqueous Solution
• Dependence of Offset Error on Overlay Mark Structures in Overlay Measurement
• Adhesion between Photoresist and Inorganic Substrate : Resist Material and Process
• Adhesion between Photoresist and Inorganic Substrate
• Proposal of a Next-Generation Super Resolution Technique
• Photolithography System Using Modified Illumination
• Photolithography System Using a Combination of Modified Illumination and Phase Shift Mask
• Photolithography System Using Annular Illumination : Photolithography
• Photolithography System Using Annular Illumination
• Structural Modulation in Oxygen Deficient Epitaxial Bi_2Sr_2Ca_1Cu_2O_X Observed by X-ray Reciprocal Space Mapping
• Sub-0.1 μm Resist Patterning in Soft X-Ray (13 nm) Projection Lithography
• Twin-Free Epitaxial Films Lateral Relation between YSZ(111) and Si(111)
• Photoluminescence Properties from β-FeSi_2 Film Epitaxially Grown on Si, YSZ and Si//YSZ
• X-Ray Photoelectron Spectroscopy Study of Hetero-Interface between Manganese Pnictide and Mn-Zn Ferrite
• Epitaxial Growth of InAs on Single-Crystalline Mn-Zn Ferrite Substrates
• Preparation of Y-Cu-O/Ba-Co-O Multilayered Thin Films and Thermal Diffusion Behavior of the Interface
• Heteroepitaxial Growth of CeO_2 (001) Films on Si(001) Substrates by Pulsed Laser Depostion in Ultrahigh Vacuum
• Fluorine Doping and Superconductivity of Nd_2CuO_4 Thin Films
• In Situ RHEED Observation of CeO_2 Film Growth on Si by Laser Ablation Deposition in Ultrahigh-Vacuum
• Chemical Interaction between High-T_c Superconducting Oxides and Alkaline Earth Fluorides
• Superconductivity in a New Oxide System of Eu-La-Ce-Cu-O
• Preparation of a Bi-Sr-Ca-Cu-O High-T_c Superconductor by the Reaction of a Cu-Free Precursor with Cu Plate
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• Preparation and Nanoscale Characterization of Highly Stable YBa_2Cu_3O_ Thin Films
• Chemical Interaction between Ba_2YCu_3O_ and Substrate Materials in the Solid State : Electrical Properties of Condensed Matter
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• Fabrication of High-Quality Perovskite Oxide Films by Lateral Epitaxy Verified with RHEED Oscillation
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• Tunneling Current in a-Si:H/a-Si_C_x:H Multilayer Structures
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• Pulsed Laser Deposition of Epitaxial Ferroelectric Pb(Zr, Ti)O_3 Films on Si(100) Substrate
• Formation and Characterization of Epitaxial TiO_2 and BaTiO_3/TiO_2 Films on Si Substrate
• Epitaxial Growth of Highly Crystalline and Conductive Nitride Films by Pulsed Laser Deposition
• Effects of Deposition Conditions on Properties of a-Si_C_x:H Diagnosed Using Optical Emission Spectroscopy
• Fabrication of Optically Active Er^-Doped Bi_2O_3-SiO_2 Glass Thin Films by Pulsed Laser Deposition
• Periodic Boundary Quantum Chemical Study on ZnO Ultra-Violet Laser Emitting Materials
• Periodic Boundary Quantum Chemical Study on ZnO Ultra-Violet Laser Emitting Materials
• Growth of Epitaxial β-FeSi_2 Thin Film on Si(001) by Metal-Organic Chemical Vapor Deposition
• Dependency of Adhesion Behavior on Thermtal Stress Distribution in Photoresist Micropatterns
• Effect of Anion in Developer on Dissolution Characteristics of Photoresist : Resist Material and Process
• Effect of Anion in Developer on Dissolution Characteristics of Photoresist
• Preparation of Compositionally Modulated Bi-Sr-Ca-Cu-O Multilayered Films by Plasma Controlled Sputtering : Electrical Properties of Condensed Matter
• Structure Analysis of A-Si_C_x:H with Dominant Tetrahedral Si-C Bonds Deposited by Hybrid-Plasma Chemical Vapor Deposition
• Atomistic Crystal Growth Process of Metal Oxide Electronics Materials : Theoretical Simulation Studies
• Nanoscale Smoothing in Crystallization of Amorphous Indium Tin Oxide Thin Films Induced by Glass Ultrathin Overlayer
• High-Contrast Imaging of Nano-Channels Using Reflection Near-Field Scanning Optical Microscope Enhanced by Optical Interference
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• Interface Electronic Properties between Silicon and Silicon Nitride Deposited by Direct Photochemical Vapor Deposition
• Room-Temperature Epitaxial Growth of CeO_2 Thin Films on Si(111) Substrates for Fabrication of Sharp Oxide/Silicon Interface
• Impurity Doping and Electrical Properties of GaAsP Heteroepitaxially Grown on GaP and Si by Metalorganic Molecular Beam Epitaxy
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• Yield Prediction Method Considering the Effect of Particles on Sub-Micron Patterning (Special Issue on Scientific ULSI Manufacturing Technology)
• Increase of Leakage Current and Trap Density Caused by Bias Stress in Silicon Nitride Prepared by Photo-Chemical Vapor Deposition
• Discharging Current Transient Spectroscopy for Evaluating Traps in Insulators
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• Crystallinity of NiO Nanowires Grown at Step Edges of Sapphire Substrate
• Oxygen Control in Bi_2Sr_2Ca_1Cu_2O_x Superconducting Thin Films by Activated Oxygens
• Pulsed Laser Deposition of C_ Thin Films with Atomically Smooth Surface
• Low Density of Gap States in a-Si:H Deposited by Vacuum UV Direct Photochemical Vapor Deposition Method
• Heteroepitaxial Growth of c-Axis-Oriented BaTiO_3 Thin Films with an Atomically Smooth Surface
• Suppression of Precipitate Formation in Heteroepitaxial Growth of YBa_2Cu_3O_ Film on Misoriented SrTiO_3 Substrates
• Synthesis of Mica Thin Film by Pulsed Laser Deposition
• Electron Spin Resonance and Photoluminescence in a-Si_C_x:H Deposited at Low Substrate Temperature
• Hot Electron Conduction in a-Si:H/a-Si_C_:H Super Structure

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