In Situ RHEED Observation of CeO_2 Film Growth on Si by Laser Ablation Deposition in Ultrahigh-Vacuum
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1990-07-20
著者
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Nagata Hirotoshi
The Research Laboratory of Engineering Materials, Tokyo Institute of Technology
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Tsukahara Tadashi
The Research Laboratory of Engineering Materials, Tokyo Institute of Technology
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Yoshimoto Mamoru
The Research Laboratory of Engineering Materials, Tokyo Institute of Technology
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Koinuma Hideomi
The Research Laboratory of Engineering Materials, Tokyo Institute of Technology
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Yoshimoto Masahiro
Department Of Electronic Science And Engineering Faculty Of Engineering Kyoto University
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Nagata H
Sci. Univ. Tokyo Chiba‐ken Jpn
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Yoshimoto M
Materials And Structures Laboratory Tokyo Institute Of Technology
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Yoshimoto M
Kyoto Inst. Technol. Kyoto Jpn
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Nagata H
Osaka Prefecture Univ. Osaka Jpn
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Tsukahara T
The Research Laboratory Of Engineering Materials Tokyo Institute Of Technology
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