Heteroepitaxial Growth of c-Axis-Oriented BaTiO_3 Thin Films with an Atomically Smooth Surface
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概要
- 論文の詳細を見る
C-axis-oriented barium titanate (BaTiO_3) epitaxial films with an atomically smooth surface have been fabricated on SrTiO_3 {100} substrates using the pulsed laser deposition technique. The crystal structure and epitaxial orientation of the films have been analyzed by means of 2θ/θ X-ray diffractometry and 4-circle X-ray diffractometry. The highly oriented and epitaxial crystallinity is also shown by means of Rutherford backscattering spectrometry which gave a χ_<min> of 1.7%. The atomically smooth surface comparable to that of the SrTiO_3 substrate is revealed by means of atomic force microscopy. The breakdown electric field of the BaTiO_3 film is as high as 10^6 V/am.
- 社団法人応用物理学会の論文
- 1993-05-01
著者
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Ishizawa Nobuo
Research Laboratory Of Engineering Materials Tokyo Institute Of Technology
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Koinuma Hideomi
Research Laboratory Of Engineering Materials Tokyo Institute Of Technology
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Koinuma Hideomi
Department Of Industrial Chemistry Faculty Of Engineering University Of Tokyo
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Koinuma Hideomi
Department Of Industrial Chemistry University Of Tokyo
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GONG Jianping
Research Laboratory of Engineering Materials, Tokyo Institute of Technology
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KUMAGAI Masao
Material Characterization Laboratory, Kanagawa High-Technology Foundation, Kanagawa Science Park
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HIRAI Kiyoto
Material Characterization Laboratory, Kanagawa High-Technology Foundation, Kanagawa Science Park
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HORIGUCHI Kenichi
Material Characterization Laboratory, Kanagawa High-Technology Foundation, Kanagawa Science Park
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Gong J
Hokkaido Univ. Sapporo Jpn
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Yoshimoto Masahiro
Department Of Electronic Science And Engineering Faculty Of Engineering Kyoto University
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Kikuchi Hiromi
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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Kawasaki Masashi
Research Laboratory Of Engineering Materials Tokyo Institute Of Technology
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Yoshimoto M
Materials And Structures Laboratory Tokyo Institute Of Technology
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Fujito Kenji
Optoelectronics Laboratory Mitsubishi Chemical Corporation
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Hirai K
Kanagawa High-technology Foundation
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Yoshimoto M
Kyoto Inst. Technol. Kyoto Jpn
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Yoshimoto Mamoru
Research Laboratory Of Engineering Materials Tokyo Institute Of Technology
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Fujito Kenji
Materials Department And Erato/jst Ucsb Group University Of California
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FUJITO Kenji
Research Laboratory of Engineering Materials, Tokyo Institute of Technology
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TANAKA Udai
Research Laboratory of Engineering Materials, Tokyo Institute of Technology
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Tanaka U
Univ. Tsukuba Ibaraki Jpn
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Fujino Kenji
Optoelectronic Laboratory, Mitsubishi Chemical Corporation
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Koinuma Hideomi
National Institute for Materials Science (NIMS)
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