SiH_3CH_3+F : A Potential Reaction System for Preparing Uniform SiC Film Predicted by Using an Ab Initio Molecular Orbital Method

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1994-09-15

著者

• Sato Kota

  Department Of Veterinary Internal Medicine Faculty Of Agriculture Tottori University

• Koinuma Hideomi

  Research Laboratory Of Engineering Materials Tokyo Institute Of Technology

• HIRANO Tsuneo

  Department of Nuclear Medicine, Gunma University School of Medicine

• Sato Kota

  Department Of Materials Science Division Of Mathematics And Physical Science Graduate School Of Scie

• YANO Daisuke

  Department of Materials Science, Division of Mathematics and Physical Science, Graduate School of Sc

• IWABUCHI Susumu

  Department of Materials Science, Division of Mathematics and Physical Science, Graduate School of Sc

• Yano Daisuke

  Department Of Life Science And Biotechnology Faculty Of Life And Environmental Science Shimane Unive

• Hirano Tsuneo

  Department Of Chemistry Faculty Of Science Ochanomizu University

• Iwabuchi Susumu

  Department Of Applied Chemistry Faculty Of Engineering Chiba University

• Sato Kota

  Department Of Advanced Materials Chemistry Yokohama National University

• YANO Daisuke

  Department of Materials Science, Division of Mathematics and Physical Science, Graduate School of Science and Technology, Chiba University

• KOINUMA Hideomi

  Research Laboratory of Engineering Materials, Tokyo Institute of Technology

• SATO Kota

  Department of Materials Science, Division of Mathematics and Physical Science, Graduate School of Science and Technology, Chiba University

• IWABUCHI Susumu

  Department of Materials Science, Division of Mathematics and Physical Science, Graduate School of Science and Technology, Chiba University

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