Ab initio Molecular Orbital Study on Hydrogen Radical Addition Reactions to Graphite Surface and Subsequent Initial Surface Process in Silane Plasma Chemical Vapor Deposition

スポンサーリンク

概要

• 論文の詳細を見る

• Hydrogen plasma treatment of a highly oriented pyrolytic graphite (HOPG) surface induces a marked change in the growth of a-Si:H film by glow-discharged decomposition of SiH4. Scanning tunneling microscope (STM) observation verified that the inhomogeneous islandlike growth on as-cleaved HOPG became homogenous after the surface was treated with hydrogen plasma. This drastic change in the surface chemical process could be reasonably interpreted by the ab initio molecular orbital calculations performed on the following reaction models: (1) C24H12 + H $\rightarrow$ HC24H12 and (2) HC24H12 + SiH3 $\rightarrow$ HC24H12SiH3. A stable energy minimum was obtained for H addition. H addition to the HOPG surface causes radical formation on the neighboring sp2 carbons, which were in turn spontaneously attacked by SiH3 radicals in the plasma to initiate homogeneous a-Si:H film growth. Without hydrogen plasma treatment, SiH3 radicals would attack the highly conjugated sp2 carbon surface. Therefore, a-Si:H film growth is presumed to be initiated at sparsely distributed defect sites that induce island growth.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2003-12-15

著者

• Koinuma Hideomi

  Ceramic Materials And Structures Laboratory:crest Japan Science And Technology Corporation

• MIYAZAKI Kaori

  Ceramic Materials and Structures Laboratory

• NAKAJIMA Kenji

  Ceramics Materials and Structures Laboratory, Tokyo Institute of Technology

• Shinagawa Eiji

  Department Of Materials Science Faculty Of Engineering Yokohama National University

• Sato Kota

  Department Of Advanced Materials Chemistry Yokohama National University

• Miyazaki Kaori

  Ceramics Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8503, Japan

• Shinagawa Eiji

  Department of Materials Science, Faculty of Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya-ku, Yokohama 240-8501, Japan

• Koinuma Hideomi

  Ceramics Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8503, Japan

関連論文

• Magneto-Optical Spectroscopy of Anatase TiO_2 Doped with Co
• Ferromagnetism in Co-Doped TiO_2 Rutile Thin Films Grown by Laser Molecular Beam Epitaxy
• High Mobility Thin Film Transistors with Trasparent ZnO Channels
• In Situ Optical Diagnosis of Pulsed Laser Deposition and Oxidation of YBa_2Cu_3O_ Thin Films
• Combinatorial Laser Molecular Beam Epitaxy (MBE) Growth of Mg-Zn-O Alloy for Band Gap Engineering
• Substrate Temperature Dependence of the Surface Reaction Mechanism of Methane Plasma Chemical Vapor Depositon : Experimental and Ab Initio Molecular Orbital Study
• Epitaxial Growth of GaN Film on (La,Sr)(Al,Ta)_O3 (111) Substrate by Metalorganic Chemical Vapor Deposition
• Crack-free and c-Axis In-plane Aligned Superconducting Y_Ca_Ba_2Cu_3O_ Films for Terahertz Radiating Josephson Plasma Devices : Superconductors
• Stabilization Ba_2YCu_3O_ by Surface Coating with Plasma Polymerized Fluorocarbon Film : Electrical Properties of Condensed Matter
• Combinatorial Fabrication Process for a-Si:H Thin Film Transistors : Instrumentation, Measurement, and Fabrication Technology
• Ab initio Molecular Orbital Study on Hydrogen Radical Addition Reactions to Graphite Surface and Subsequent Initial Surface Process in Silane Plasma Chemical Vapor Deposition
• Molecular Pathobiological Studies on Glutamate/Aspartate Transporter (GLAST) in Canine Red Cells : Molecular Basis for Hereditary Deficiency of GLAST in Dogs
• RECONSTITUTION AND PARTIAL PURIFICATION OF Na^+-DEPENDENT GLUTAMATE TRANSPORTER FROM CANINE BRAIN AND ANALYSIS OF MOLECULAR POLYMORPHISM
• SiH_3CH_3+F : A Potential Reaction System for Preparing Uniform SiC Film Predicted by Using an Ab Initio Molecular Orbital Method
• Oxygen Plasma Treatment of Rubber Surface by the Atmospheric Pressure Cold Plasma Torch
• Fabrication of Highly Stable and Low Defect Density Amorphous Silicon Films at Low Substrate Temperature by Plasma Chemical Vapor Deposition Assisted with Piezoelectric Vibration
• Transport Properties of SrCuO_2 Thin Films with Artificially Modulated Structures
• Production of Fullerenes by Low Temperature Plasma Chemical Vaper Deposition under Atmospheric Pressure
• Preparation of New Poly (phenylene vinylene) Type Polymers by Ni-promoted Polycondensation and Their Photoluminescent Properties
• In Situ Preparation of Superconducting Thick Films from Rapidly Quenched Bi-Sr-Ca-Oxide Films and Surface-Oxidized Cu Plate
• Construction and Superfunction of Metal-oxide Nanostructures and Interfaces(Interfaces by various techniques)
• Recognition of the Atomic Terminating Layer in Perovskite Oxide Substrates by Reflection High Energy Electron Diffraction
• Ruptured Anterior Communicationg Artery Aneurysm Associated With Anterior Cranial Fossa Dural Arteriovenous Fistula : Case Report
• Ab Initio Molecular Orbital Study on Acceleration Mechanism of Silane Plasma Chemical Vapor Deposition by Diborane
• HyperCKemia Related to the Initial and Recurrent Attacks of Neuromyelitis Optica
• Ab initio Molecular Orbital Study on Hydrogen Radical Addition Reactions to Graphite Surface and Subsequent Initial Surface Process in Silane Plasma Chemical Vapor Deposition
• Theoretical Study on a Stable Structure and Hydrogen Adsorption of Hexagonal Boron Phosphide based on Density Functional Theory
• Changes in Extracellular Neurotransmitters in the Cerebrum of Familial Idiopathic Epileptic Shetland Sheepdogs Using an Intracerebral Microdialysis Technique and Immunohistochemical Study for Glutamate Metabolism
• Connective Tissue-Type Mast Cell Leukemia in a Dog.

もっと見る 閉じる

スポンサーリンク