Fabrication of Highly Stable and Low Defect Density Amorphous Silicon Films at Low Substrate Temperature by Plasma Chemical Vapor Deposition Assisted with Piezoelectric Vibration
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-01-15
著者
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Koinuma Hideomi
Research Laboratory Of Engineering Materials Tokyo Institute Of Technology
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Koinuma Hideomi
Materials And Structures Labolatory Tokyo Institute Of Technology
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KAWASAKI Masashi
Research Laboratory of Engineering Materials, Tokyo Institute of Technology
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Kawasaki Masashi
Research Laboratory Of Engineering Materials Tokyo Institute Of Technology
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Koinuma Hideomi
Frontier Collaborative Research Center And Ceramics Materials And Structures Laboratory
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Koinuma Hideomi
Ceramic Materials And Structures Laboratory:crest Japan Science And Technology Corporation
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Koinuma Hideomi
Frontier Collaborative Research Center Tokyo Institute Of Technology:crest-japan Science And Tecimol
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SUMIYA Masatomo
Research Laboratory of Engineering Materials, Tokyo Institute of Technology
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KOCKA Jan
Institute of Physics, Czech Academy of Science
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Kocka Jan
Institute Of Physics Czech Academy Of Science
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Kocka Jan
Institute Of Physics Academy Of Sciences Of The Czech Republic
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Sumiya Masatomo
Research Laboratory Of Engineering Materials Tokyo Institute Of Technology
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