Structure and Properties of Silicon Thin Films Deposited at Low Substrate Temperatures
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概要
- 論文の詳細を見る
- Japan Society of Applied Physicsの論文
- 2003-08-15
著者
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Uyama Haruo
Technical Research Institute Toppan Printing Co. Ltd.
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Uyama Haruo
Technical Research Institute Toppan Printing Co
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ITO Manabu
Technical Research Institute, Toppan Printing Co., Ltd.
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Ito M
Wakayama Univ. Wakayama Jpn
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Ito Manabu
Technical Research Institute Toppan Printing Co. Ltd.
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Ro Kazuyoshi
Technical Research Institute Toppan Printing Co
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KOCKA Jan
Institute of Physics, Czech Academy of Science
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Kocka Jan
Institute Of Physics Academy Of Sciences Of The Czech Republic
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FEJFAR Antonln
Institute of Physics, Academy of Sciences of the Czech Republic
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MATES Tomas
Institute of Physics, Academy of Sciences of the Czech Republic
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FOJTIK Petr
Institute of Physics, Academy of Sciences of the Czech Republic
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LEDINSKY Martin
Institute of Physics, Academy of Sciences of the Czech Republic
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LUTEROVA Katerina
Institute of Physics, Academy of Sciences of the Czech Republic
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STUCHLIKOVA Ha
Institute of Physics, Academy of Sciences of the Czech Republic
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PELANT Ivan
Institute of Physics, Academy of Sciences of the Czech Republic
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BAUMRUK Vladimlr
Institute of Physics, Charles University
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MACKOVA Anna
Nuclear Physics Institute, Academy of Sciences of the Czech Republic
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Mackova Anna
Nuclear Physics Institute Academy Of Sciences Of The Czech Republic
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Fojtik Petr
Institute Of Physics Academy Of Sciences Of The Czech Republic
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Pelant Ivan
Institute Of Physics Academy Of Sciences Of The Czech Republic
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Mates Tomas
Institute Of Physics Academy Of Sciences Of The Czech Republic
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Stuchlikova Ha
Institute Of Physics Academy Of Sciences Of The Czech Republic
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Fejfar Antonin
Institute of Physics, Academy of Sciences of the Czech Republic, Cukrovarnická 10, 162 53 Prague, Czech Republic
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Baumruk Vladimír
Institute of Physics, Charles University, Ke Karlovu 5, 121 16 Prague 2, Czech Republic
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