Suppression of Precipitate Formation in Heteroepitaxial Growth of YBa_2Cu_3O_<7-δ> Film on Misoriented SrTiO_3 Substrates
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概要
- 論文の詳細を見る
We have investigated the effect of misoriented substrates on precipitate formation in c-axis-oriented YBa_2Cu_3O_<7-δ> films grown by the pulsed laser deposition technique. The films grown on exact SrTiO_3(100) substrates had precipitate densities as high as 10^7-10^8/cm^2, whereas the films on substrates with surfaces misoriented from (100) by 0.5°-1° had fewer precipitates by two to three orders of magnitude. A film surface of 10^5/cm^2 precipitates can give 90% probability of a precipitate-free practical device size area (10 μm×10 μm), providing a high possibility of successful fabrication of a Josephson tunnel junction
- 社団法人応用物理学会の論文
- 1994-01-01
著者
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Koinuma Hideomi
Research Laboratory Of Engineering Materials Tokyo Institute Of Technology
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Koinuma Hideomi
Department Of Industrial Chemistry Faculty Of Engineering University Of Tokyo
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Koinuma Hideomi
Department Of Industrial Chemistry University Of Tokyo
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GONG Jianping
Research Laboratory of Engineering Materials, Tokyo Institute of Technology
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Gong J
Hokkaido Univ. Sapporo Jpn
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Yoshimoto Masahiro
Department Of Electronic Science And Engineering Faculty Of Engineering Kyoto University
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Yoshimoto Masahiro
Department Of Electronic Science And Engineering Kyoto University
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Kikuchi Hiromi
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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Kawasaki Masashi
Research Laboratory Of Engineering Materials Tokyo Institute Of Technology
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Yoshimoto M
Materials And Structures Laboratory Tokyo Institute Of Technology
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Fujito Kenji
Optoelectronics Laboratory Mitsubishi Chemical Corporation
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Tsuchiya Ryuta
Ceramics Materials And Structures Laboratory Tokyo Institute Of Technology
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Yoshimoto M
Kyoto Inst. Technol. Kyoto Jpn
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Yoshimoto Mamoru
Research Laboratory Of Engineering Materials Tokyo Institute Of Technology
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Fujito Kenji
Materials Department And Erato/jst Ucsb Group University Of California
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FUJITO Kenji
Research Laboratory of Engineering Materials, Tokyo Institute of Technology
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TSUCHIYA Ryuta
Research Laboratory of Engineering Materials, Tokyo Institute of Technology
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Yoshimoto Masahiro
Department of Innovative and Engineered Materials, Tokyo Institute of Technology
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Fujino Kenji
Optoelectronic Laboratory, Mitsubishi Chemical Corporation
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Koinuma Hideomi
National Institute for Materials Science (NIMS)
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