Photolithography System Using a Combination of Modified Illumination and Phase Shift Mask

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1992-12-30

著者

• Tanaka M

  Production Engineering Research Laboratory Hitachi Ltd.

• Kamon K

  Assoc. Super‐advsnced Electronics Technol. Kanagawa Jpn

• Kamon K

  Kwansei Gakuin Univ. Nishinomiya

• Kamon Kazuya

  Yokohama Research Center Association Of Super-advanced Electronics Technologies:(present Address) Ul

• Kamon Kazuya

  School Of Science Kwansei Gakuin University

• Nagata H

  Sumitomo Osaka Cement Co. Ltd. Chiba Jpn

• NAGATA Hitoshi

  LSI Laboratory, Mitsubishi Electric Corporation

• MIYAMOTO Teruo

  Manufacturing Development Center, Mitsubishi Electric Corporation

• MYOI Yasuhito

  Manufacturing Development Center, Mitsubishi Electric Corporation

• TANAKA Masaaki

  Manufacturing Development Center, Mitsubishi Electric Corporation

• KAMON Kazuya

  LSI Laboratory, Mitsubishi Electric Corporation

• KOTANI Norihiko

  LSI Laboratory, Mitsubishi Electric Corporation

• Tanaka M

  Manufacturing Development Center Mitsubishi Electric Corporation

• Tanaka M

  Toshiba Corp. Kawasaki Jpn

• Tanaka M

  Institute Of Multidisciplinary Research For Advanced Materials Tohoku University

• Myoi Yasuhito

  Manufacturing Development Center Mitsubishi Electric Corporation

• Miyamoto Teruo

  Manufacturing Development Center Mitsubishi Electric Corporation

• Nagata H

  Osaka Prefecture Univ. Osaka Jpn

• Kotani Norihiko

  Lsi Laboratory Mitsubishi Electric Corporation

関連論文

• Local lattice parameter determination of a silicon (001) layer grown on a sapphire (1102) substrate using convergent-beam electron diffraction
• Lattice parameter determination of a composition controlled Si_Ge_x layer on a Si (001) substrate using convergent-beam electron diffraction
• Space-Group Determination of a New Superconductor (Nd_Ce_x)_2(Ba_Nd_y)_2Cu_3O_ using Convergent-Beam Electron Diffraction
• Space-Group Determination of a New Superconductor (Nd_Sr_Ce_)_2CuO_ Using Convergent-Beam Electron Diffraction
• EXAFS Study on Premartensitic Phase in Nb_3Sn
• Edge and EXAFS Studies of Bi_2O_3-Y_2O_3 Oxygen Conductor
• EXAFS Studies on Fluorites of β-PbF_2 and SrF_2
• 高輝度放射光のX線CTイメージングを用いた高強度鋼中の介在物の定量的評価(高精度な新非破壊検査技術)
• Lattice parameter determination of a strained area of an InAs layer on a GaAs substrate using CBED
• 1101 光造形法によるマイクロ材料の創製と評価(GS-3 強度評価)
• Site-Specific Studies on X-Ray Magnetic Circular Dichroism at Fe K Edge for Transition-Metal Ferrites
• X-Ray Diffuse Scattering Study of Magnetite by the Valence-Difference Contrast Method
• OS0602 リアルサイズのモデルコンポジットを用いたモードII繊維/樹脂界面はく離靱性の評価(先進複合材料の強度・特性評価,オーガナイズドセッション)
• 723 マイクロモデルを用いた繊維/樹脂界面微視はく離靭性の抽出(GS-3 結晶・破壊)
• 繊維2本および繊維4本のモデル複合材料を用いた繊維/樹脂界面はく離じん性の実験的評価とFRPじん性への寄与の検討 (特集 破壊力学)
• 406 マイクロモデルによる繊維/樹脂界面微視はく離靭性の評価と複合材靭性に関する検討(界面および微視構造の影響II,オーガナイズドセッション8.破壊の発生・進展とその解析・評価・計測)
• 405 モデルコンポジットを用いた繊維/樹脂界面の破壊靭性評価(疲労・摩耗・界面,破壊の発生・進展とその解析・評価・計測,オーガナイスドセッション9)
• Proposal of a Next-Generation Super Resolution Technique
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• 301 CNT/紫外線硬化樹脂複合材料マイクロエレメントの機械的特性評価とCNT添加量向上の検討(GS-3 ナノ)
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• Improvement of the Uniformity of Tungsten / Carborn Multilayers by Thermal Processing
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• 1114 金属材料の疲労初期損傷に関する結晶塑性解析(GS-1 計算力学)
• Development of Stable a-Si Solar Cells with Wide-Gap a-Si:H i-layers Deposited by an Inert Gas Plasma Treatment Method
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• Practical Simulation of the I-V Curve for Amorphous-Silicon-Based Multijunction Solar Cells after Light Soaking
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• 長繊維強化プラスチックスにおける巨視的モードI負荷を受ける層間き裂の進展経路
• 529 異方性材で挟まれた等方性材中のき裂進展経路の予測
• ピロータイトFe1-xS構造中の2および3価のFeの分布
• Magnetic Shielding by Superconducting Y-Ba-Cu-O Prepared by the Modified Quench and Melt Growth (QMG) Process
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• 316 SMA複合材料アクチュエータによる層間はく離き裂進展阻止機能の実験的検討(力学特性,複合材料の開発・応用・評価における新技術,オーガナイスドセッション6,第53期学術講演会)
• 313 界面はく離き裂を有する長繊維強化複合材料のメゾメカニックス解析(損傷・破壊力学,複合材料の開発・応用・評価における新技術,オーガナイスドセッション6,第53期学術講演会)
• 401 長繊維強化複合材料の微視的き裂前縁形状に及ぼす繊維/母材界面効果(破壊の進展とその抑制,破壊の発生・進展とその評価および抑制,オーガナイスドセッション・8,第53期学術講演会)
• 301 鉛フリーはんだにおける金属微粒子によるクリープ強度の向上(GS-4 疲労・クリープ)
• Influence of Deposition Conditions on Properties of a-SiGe:H Prepared by Microwave-Excited Plasma CVD : Condensed Matter
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• Study of YBa_2Cu_3 O_7 Superconductor by Low-Temperature Scanning Tunneling Microscopy and Spectroscopy
• Transient Light-Induced ESR Investigations of the Role of Hydrogen in the Stability of a-Si:H
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• EXAFS Study on the Dehydration Process in Mg (OH)_2
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• Temperature and Concentration Dependence of Lattice Constants in Rondom Mixture of Ferroelectric and Antiferroelectric; Rb_(NH_4)_xH_2PO_4
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• 133 積層複合材料のはく離進展抑制のためのアクチュエータ利用の有効性の検討
• 346 アクチュエータを用いた積層複合材料のはく離進展抑制効果
• Structural Studies on the ZrO_2-Y_2O_3 System by Electron Diffraction and Electron Microscopy III
• Structural Studies on ZrO_2-Y_2O_3 System by Electron Diffraction and Electron Microscopy I
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• High Pressure Oxygen Treatment and the Substitution of Sr for Ba on (Nd_Ba_)_2(Ce_Nd_)_2Cu_3O_y Superconductor
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• 609 モードI荷重下での長繊維強化複合材料中に発生したマトリックスき裂の進展経路予測(破壊と破壊力学-II)(複合材料の産業応用)(オーガナイスドセッション6)
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• 849 FRP 中の層間き裂のエネルギー解放率分布に及ぼす繊維/母材界面の影響
• 1133 SMA 複合材料アクチュエータによるき裂伝ぱ阻止
• Electron Energy-Loss Spectra of Carbon Nanotubes

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