Tanaka M | Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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概要
関連著者
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Tanaka M
Production Engineering Research Laboratory Hitachi Ltd.
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Tanaka M
Mitsubishi Electric Co. Ltd. Hyogo Jpn
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Tanaka Michiko
Tokyo University Of Agiculture And Technology Department Of Biotechnology
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Tanaka M
New Materials Research Center Sanyo Electric Co. Ltd.
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Nakano Shoichi
Department Of Physiology Tokai University School Of Medicine
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Tsuda Shinya
Sanyo Electric Co. Ltd.
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Kamon K
Assoc. Super‐advsnced Electronics Technol. Kanagawa Jpn
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Kamon K
Kwansei Gakuin Univ. Nishinomiya
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Kamon Kazuya
Yokohama Research Center Association Of Super-advanced Electronics Technologies:(present Address) Ul
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Kamon Kazuya
School Of Science Kwansei Gakuin University
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Nagata H
Sumitomo Osaka Cement Co. Ltd. Chiba Jpn
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MIYAMOTO Teruo
Manufacturing Development Center, Mitsubishi Electric Corporation
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MYOI Yasuhito
Manufacturing Development Center, Mitsubishi Electric Corporation
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TANAKA Masaaki
Manufacturing Development Center, Mitsubishi Electric Corporation
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TANAKA Michiyoshi
Department of Physics, Faculty of Science, Tohoku University
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TSUDA Shinya
Functional Materials Research Center, Sanyo Electric Co., Ltd.
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NAKANO Shoichi
Functional Materials Research Center, Sanyo Electric Co., Ltd.
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Tsuda Shinya
New Materials Research Center Sanyo Electric Co . Ltd.
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KAMON Kazuya
LSI Laboratory, Mitsubishi Electric Corporation
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津田 健治
東北大多元研
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田中 通義
東北大多元研
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田中 通義
東北大 科研
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AKAOGI Takayuki
Asahi-Kasei Co. Ltd
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TSUDA Kenji
Institute of Multidisciplinary Research for Advanced Materials, Tohoku University
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TERAUCHI Masami
Institute of Multidisciplinary Research for Advanced Materials, Tohoku University
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TANAKA Michiyoshi
Institute of Multidisciplinary Research for Advanced Materials, Tohoku University
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澤田 嗣郎
東京大学
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TSUDA Shinya
New Materials Research Center, Sanyo Electric Co., Ltd.
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MARUYAMA Eiji
New Materials Research Center, Sanyo Electric Co., Ltd.
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KIMURA Kozo
Joint Research Center for Atom Technology (JRCAT)
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Shimada Toshikazu
Electronics Research Laboratory Nissan Motor Co. Ltd.
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Suzuki S
Nikon Corp. Tokyo Jpn
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Suzuki Setsuo
Energy And Mechanical Research Laboratories Research And Development Center Toshiba Corporation
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Maruyama E
New Materials Research Center Sanyo Electric Co. Ltd.
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Maruyama Eiji
New Materials Research Center Sanyo Electric Co. Ltd.
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Suzuki Suguru
Department Of Materials Science And Engineering Nagoya Institute Of Technology
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Morita M
Department Of Electronics Tohoku University
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Watanabe Teruo
Futaba Corporation
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Nakamura N
Tokyo Inst. Technol. Yokohama Jpn
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Watanabe T
Components Development Group Sony Corporation
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Watanabe T
Ritsumeikan Univ. Shiga Jpn
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Tsuda Kenji
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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Tsuda Kenji
Fujitsu Ltd.
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KIMURA Keiichi
Advanced Research Laboratory, Nippon Steel Co. Ltd.
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NAGATA Hitoshi
LSI Laboratory, Mitsubishi Electric Corporation
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Kimura K
Advanced Research Laboratory Nippon Steel Co. Ltd.
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Kimura Keiichi
R&d Labs-i Nippon Steel Corporation
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秋光 純
青学大理工
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寺内 正己
東北大多元研
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佐々木 聡
東京工業大学 応用セラミックス研究所
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西浦 宏幸
大阪工大情報
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TAGUCHI Munetaka
RIKEN/SPring-8
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TSUDA Kenji
Department of Physics, Faculty of Science, Tohoku University
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AKIMITSU Jun
Department of Physics, Aoyama Gakuin University
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AKAOGI Takayuki
Institute of Multidisciplinary Research for Advanced Materials, Tohoku University
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樋口 透
東理大理
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Shimizu Masahiro
Ulsi Development Center Mitsubishi Electric Corporation
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KAWAI Yoshinobu
Interdisciplinary Graduate School of Engineering Sciences, Kyushu University
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寺内 正巳
東北大学
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Matsuura Osamu
Department Of Urology Shakai Hoken Chukyo Hospital
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Matsuura Osamu
Department Of Applied Chemistry Faculty Of Engineering Himeji Institute Of Technology
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TANAKA Masashi
Department of Cardiovascular Surgery, Saitama Medical Center, Jichi Medical University
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Tarui Hisaki
New Materials Research Center, Sanyo Electric Co., Ltd.
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FUJISAWA Hironori
Department of Electrical Engineering and Computer Sciences, Graduate School of Engineering, Universi
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SHIMIZU Masaru
Department of Electrical Engineering and Computer Sciences, Graduate School of Engineering, Universi
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NIU Hirohiko
Department of Electrical Engineering and Computer Sciences, Graduate School of Engineering, Universi
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Ebe Hiroji
Nanoelectronics Collaborative Research Center (ncrc) Institute Of Industrial Science (iis) The Unive
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Ebe Hiroji
Fujitsu Laboratories Ltd.
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TANIGAWA Shoichiro
Institute of Materials Science, The University of Tsukuba
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UEDONO Akira
Institute of Materials Science, University of Tsukuba
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Kawai Yoshinobu
Welding Research Institute Osaka University
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Kawai Yoshinobu
Interdiciplinary Gradate School Of Engineering Sciences Kyushu University
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NAKAMURA Naoto
Department of Information Processing, Tokyo Institute of Technology
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Taniguchi Masaki
Grad. Sch. Sci. Hiroshima Univ.:hsrc Hiroshima Univ.
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TSUKAMOTO Takeyo
Department of Applied Physics, Tokyo University of Science
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西浦 宏幸
阪大・教養
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SASAKI Satoshi
Materials and Structures Laboratory, Tokyo Institute of Technology
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Kobayashi K
Dep. Of Electronic Sci. And Engineering Kyoto Univ. Katsura Nishikyo Kyoto 615-8510 Japaninnovative
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Uedono A
Univ. Tsukuba Tsukuba Jpn
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Uedono Akira
Institute Of Applied Physics University Of Tsukuba
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HORIE Kazuo
Kitaitami Works, Mitsubishi Electric Corporation
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澤田 嗣郎
Univ. Tokyo Tokyo Jpn
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Ebe H
Univ. Tokyo Tokyo Jpn
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TANAKA Masayoshi
Interdisciplinary Graduate School of Engineering Sciences, Kyushu University
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SHEN Meng-yan
Department of Physics, Faculty of Science Tohoku University
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ISHIGAME Mareo
Research Institute for Scientific Measurements,Tohoku University
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Ota Kazuya
Aset Euvl Laboratory
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Ota Kazuya
System Designing Section Designing Department Industrial Supplies & Equipment Division Nikon Cor
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Fujii Toru
General R&d Lab. Taiyo Yuden Co. Ltd.
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Horie K
Univ. Tokyo Tokyo Jpn
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Horie Kazuo
Kitaitami Works Mitsubishi Electric Corporation
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Sakai H
Meijo Univ. Nagoya Jpn
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Takasugi E
Osaka Univ.
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Sato Futami
Research Institute For Scientific Measurements Tohoku University
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Niu Hirohiko
Department Of Electrical Engineering And Computer Sciences Graduate School Of Engineering University
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Tarui Hisaki
New Materials Research Center Sanyo Electric Co. Ltd.
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Tsuda Shinya
National Agricultural Research Center
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Yoshino Junji
Institute Of Industrial Science University Of Tokyo
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Shen Meng-yan
Department Of Physics Faculty Of Science Tohoku University
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Nakamura Nobuo
Central Research Laboratory Hitachi Ltd.
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Toyoda Takashi
Department Of Electrical Engineering Kyoto University
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Toyoda Takashi
Semiconductor Research Laboratory Mitsubishi Electric Corporations
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Sakai H
Hiroshima‐denki Inst. Technol Hiroshima Jpn
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Watanabe Tetsu
Components Development Group Sony Corporation
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Sakai Hiroto
Department Of Quantum Engineering Nagoya University
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Sasaki S
Institute Of Materials Science University Of Tsukuba
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Akimitsu Jun
Department Of Physics And Mathematics Aoyama Gakuin University
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Tanaka M
Institute Of Materials Structure Science High-energy Accelerator Research Organization
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Tsuda K
Univ. Tokyo Tokyo
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HIGUCHI Tohru
Department of Applied Physics, Tokyo University of Science
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TOYODA Takeshi
Materials and Structure Laboratory, Tokyo Institute of Technology
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Tsuda Kenji
Department Of Physics Faculty Of Science Tohoku University
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Sasaki Takahiko
Institute For Materials Research(imr) Tohoku University
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KOBUNE Masafumi
Department of Material Science Chemistry, Graduate School of Engineering, University of Hyogo
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FUJII Takashi
Central Research Institute of Electric Power Industry
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Kobayashi K
Kobe Steel Ltd. Kobe Jpn
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Shimizu M
Advanced Industrial Science And Technology (aist) Power Electronics Research Center
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Shimizu Mitsuaki
Power Electronics Research Center National Institute Of Advanced Industrial Science And Technology
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水谷 照吉
愛知工業大学電気工学科
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Mizutani Teruyoshi
Depertment Of Electrical Engineering Nagoya University
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Mizutani Teruyoshi
Department Of Electrical Engineering School Of Engineering Nagoya University
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原田 慈久
東大院工:東大放射光機構:理研:spring-8
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HARADA Yoshihisa
RIKEN/SPring-8
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Sakanoue Jun
Department of Physics, Faculty of Science, Tohoku University
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Suzuki Seiichiro
Department of Physics, Aoyama-Gakuin University
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Sawa Hiroshi
Department Of Physics Aoyama-gakuin University
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Saito Makoto
Department of Obstetrics and Gynecology, Nihon University School of Medicine
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平野 克己
群馬大学工学部
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河合 良信
九大総理工
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平野 克己
群馬大工
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兵藤 一行
高エネルギー加速器研究機構物質構造科学研究所
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兵藤 一行
高エネルギー加速器研究機構 物質構造科学研究所 放射光科学研究施設
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兵藤 一行
筑波大学 放射線
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TARUI Hisaki
Functional Materials Research Center, Sanyo Electric Co., Ltd.
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吉田 起國
京大院エネルギー科学
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吉田 起國
京大原子エネルギー研
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吉田 起國
京大原研
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Matsuzaka Takashi
Central Research Laboratory Hitachi Ltd.
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HONDA Koichiro
Fujitsu Laboratories Ltd.
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KAWAI Tomoji
The Institute of Scientific and Industrial Research, Osaka University
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HONDA Kazutaka
Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University
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兵藤 一行
高エネルギー加速器研究機構
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Hyodo K
High Energy Accelerator Res. Organization
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Suzuki Seiichiro
Department Of Physics Aoyama-gakuin University
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Kashiwaya S
Nanoelectronics Research Institute (neri) National Institute Of Advanced Industrial Science And Tech
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澤田 嗣郎
東大院工
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SUZUKI Ryoichi
Electrotechnical Laboratory
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MIKADO Tomohisa
Electrotechnical Laboratory
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FUJII Satoshi
Department of Neurosurgery, Yokohama City University School of Medicine
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中山 喜萬
阪大工
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TAKEUCHI Tomoyuki
Department of Applied Physics, Tokyo University of Science
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Ohdaira Toshiyuki
National Institute Of Advanced Industrial Science And Technology
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Ohdaira Toshiyuki
Department Of Nuclear Engineering Kyoto University
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Mori Takeharu
Institute Of Materials Structure Science High-energy Accelerator Research Organization
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Kawai Y
Welding Research Institute Osaka University
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佐々木 茂男
九州大学院理
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TANAKA MINORU
Department of Thoracic Surgery, Nagoya University School of Medicine
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HIRANO Keiichi
Institute of Material Structure Science, KEK-PF, High Energy Accelerator Research Organization
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Hyodo Kazuyuki
Institute Of Material Structure Sciences High Energy Accelerator Research Organization
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TANAKA Michiyoshi
Research Institute for Scientific Measurements, Tohoku University
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OHSHIMA Takeshi
Japan Atomic Energy Research Institute
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Okamoto S
Tottori Univ. Tottori Jpn
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NAKAYAMA Kan
National Research Laboratory of Metrology
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MORITA Mitsuru
Advanced Materials & Technology Research Laboratories, Nippon Steel Corporation
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平野 克己
High Energy Accelerator Res.organization Ibaraki Jpn
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Sawada Toru
Functional Materials Research Center Sanyo Electric Co. Ltd.
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Kamon Kazuya
Ulsi Laboratory Mitsubishi Electric Corporation
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Kamon Kazuya
Ulsi Laboratory Mitsubishi Electric Corp.
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Tarui Hisaki
New Materials R. C. Sanyo Electric Co. Ltd.
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Okamoto Shinji
Nhk Science And Technical Research Laboratories
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Honda Koichiro
Fujitsu Lab. Ltd. Kanagawa Jpn
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Honda K
Fujitsu Laboratories Ltd.
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Suzuki R
National Institute Of Advanced Industrial Science And Technology
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Nakano Shoichi
New Materials Research Center Sanyo Electric Co. Ltd.
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Nakano S
Functional Materials Research Center Sanyo Electric Co. Ltd.
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Nakano S
東海大学医学部生理科学教室
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Kumagai Y
Department Of Electrical And Information Engineering Faculty Of Engineering Yamagata University
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森 竜雄
Nagoya Univ. Aichi Jpn
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Mori T
Department Of Electrical Engineering School Of Engineering Nagoya University
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Mori Tatsuo
Department Of Electrical Engineering School Of Engineering Nagoya University
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SAITOU Norio
Central Research Laboratory, Hitachi, Ltd.
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KOYANAGI Masao
Electrotechnical Laboratory
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Tanaka M
Sony Corp. Atsugi Jpn
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OHKUBO Koichi
Materials and Structures Laboratory, Tokyo Institute of Technology
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TANAKA Masahiko
Institute of Materials Structure Science, High Energy Accelerator Research Organization
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MATSUMOTO Kenji
Materials and Structure Laboratory, Tokyo Institute of Technology
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SAITO Fumikazu
Materials and Structure Laboratory, Tokyo Institute of Technology
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YAMAWAKI Koji
Materials and Structure Laboratory, Tokyo Institute of Technology
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TANAKA Masahiko
National Laboratory for High Energy Physics
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GONDA Satoshi
National Metrology Institute of Japan, AIST
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Ni Baorong
Department Of Electronic Materials Engineering Fukuoka Institute Of Technology
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MATSUSHITA Teruo
Department of Computer Science and Electronics, Kyushu Institute of Technology
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KAWAHARA Toshio
Department of Materials Science and Engineering, National Defense Academy
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Nagata Hitoshi
Ulsi Laboratory Mitsubishi Electric Corporation
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WAKAMIYA Wataru
ULSI Laboratory, Mitsubishi Electric Corporation
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KOTANI Norihiko
LSI Laboratory, Mitsubishi Electric Corporation
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MYOI Yasuhito
LSI Laboratory, Mitsubishi Electric Corporation
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NAKAYAMA Yoshinori
Central Research Laboratory, Hitachi Ltd.
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Mitsugi Satoshi
Precision And Intelligence Laboratory Tokyo Institute Of Technology
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Shimizu M
Tokyo Inst. Technology Yokohama
著作論文
- Local lattice parameter determination of a silicon (001) layer grown on a sapphire (1102) substrate using convergent-beam electron diffraction
- Lattice parameter determination of a composition controlled Si_Ge_x layer on a Si (001) substrate using convergent-beam electron diffraction
- Space-Group Determination of a New Superconductor (Nd_Ce_x)_2(Ba_Nd_y)_2Cu_3O_ using Convergent-Beam Electron Diffraction
- Space-Group Determination of a New Superconductor (Nd_Sr_Ce_)_2CuO_ Using Convergent-Beam Electron Diffraction
- Lattice parameter determination of a strained area of an InAs layer on a GaAs substrate using CBED
- Site-Specific Studies on X-Ray Magnetic Circular Dichroism at Fe K Edge for Transition-Metal Ferrites
- X-Ray Diffuse Scattering Study of Magnetite by the Valence-Difference Contrast Method
- Proposal of a Next-Generation Super Resolution Technique
- Photolithography System Using Modified Illumination
- Photolithography System Using a Combination of Modified Illumination and Phase Shift Mask
- Photolithography System Using Annular Illumination : Photolithography
- Photolithography System Using Annular Illumination
- Microstructure and Electrical Properties of (Pb, La)(Zr. Ti)O_3 Films Crystallized from Amorphous State by TWO-Step Postdeposition Annealing
- Effects of Pt/SrRuO_3 Top Electrodes on Ferroelectric Properties of Epitaxial(Pb, La)(Zr, Ti)O_3 Thin Films
- Improvement of n-Type Poly-Si Film Properties by Solid Phase Crystallization Method
- Development of New a-Si/c-Si Heterojunction Solar Cells: ACJ-HIT (Artificially Constructed Junction-Heterojunction with Intrinsic Thin-Layer)
- Absolute Measurement of Lattice Spacing d(220)in Floating Zone Silicon Crystal
- Absolute Measurement of Lattice Spacing d(220) Silicon Crystal in Floating Zone
- Sub-Nanometer Scale Measurements of Silicon Oxide Thickness by Spectroscopic Ellipsometry
- Sub-Nanometer Scale Measurements of Silicon Oxide Thickness by Spectroscopic Ellipsometry
- Development of Stable a-Si Solar Cells with Wide-Gap a-Si:H i-layers Deposited by an Inert Gas Plasma Treatment Method
- Improvement in a-Si:H Properties by Inert Gas Plasma Treatment
- Practical Simulation of the I-V Curve for Amorphous-Silicon-Based Multijunction Solar Cells after Light Soaking
- Aggregation of Monocrystalline β-FeSi_2 by Annealing and by Si Overlayer Growth
- Defects in Ion Implanted Hg_Cd_Te Probed by Monoenergetic Positron Beams
- Defects and Their Annealing Properties in B^+-Implanted Hg_Cd_Te Studied by Positron Annihilation
- Magnetic Shielding by Superconducting Y-Ba-Cu-O Prepared by the Modified Quench and Melt Growth (QMG) Process
- High Magnetic Flux Trapping by Melt-Grown YBaCuO Superconductors
- Electronic Structure of Bi_4Ti_3O_ Thin Film by Soft-X-Ray Emission Spectroscopy
- Effect of Pt Addition on Melt-Processed YBaCuO Superconductors
- Critical Current Characteristics in Superconducting Y-Ba-Cu-O Prepared by the Melt Process
- Intensity Variation of Transition Radiation Induced by Adsorption of Nitrogen on W(100) Surface
- Emission of Radiation Induced by Bombardment of Slow Electrons from a Clean (100) Surface of Tungsten
- Nonlinear Optical Properties of CdTe Microcrystallites in CaF_2 Thin Film
- Optical Properties of CdTe Microcrystallites in CaF_2
- Influence of Deposition Conditions on Properties of a-SiGe:H Prepared by Microwave-Excited Plasma CVD : Condensed Matter
- Microwave-Excited Plasma CVD of a-Si:H Films Utilizing a Hydrogen Plasma Stream or by Direct Excitation of Silane
- Chemical Vapor Deposition of a-SiGe:H Films Utilizing a Microwave-Excited Plasma
- Production Mechanism of a Large-Diameter Uniform Electron Cyclotron Resonance Plasma Generated by a Circular TE_ Mode Microwave
- 8" Uniform Electron Cyclotron Resonance Plasma Source Using a Circular TE_ Mode Microwave
- Magnetotransport Properties of a Single-Crystalline β-FeSi_2 Layer Grown on Si(001) Substrate by Reactive Deposition Epitaxy
- Study of YBa_2Cu_3 O_7 Superconductor by Low-Temperature Scanning Tunneling Microscopy and Spectroscopy
- Transient Light-Induced ESR Investigations of the Role of Hydrogen in the Stability of a-Si:H
- High-Quality p-Type μc-Si Films Prepared by the Solid Phase Crystallization Method
- Preparation and Properties of a-Si Films Deposited at a High Deposition Rate under a Magnetic Field
- Large CP Violation in B_s Decays and Light W_R : Particles and Fields
- Light W_R and the Spontaneous CP Violation : Particles and Fields
- High-Rate Deposition of a-Si:H Film with a Separated Plasma Triode Method
- Effect of Carbonic Anhydrase II in Molten Globule State on Physical Properties of Dimyristoylphosphatidylcholine Liposme
- Ultrasonic Properties of a Binary System of a Soluble Protein, α-Lactalbumin and Dimyristoyl Phosphatidylcholine Membrane
- Atomic-Scale Structures of Top and Bottom Heterointerfaces in GaAs-Al_xGa_As (x=0.2-1) Quantum Wells Prepared by Molecular Beam Epitaxy with Growth Interruption
- One Atomic Layer Heterointerface Fluctuations in GaAs-AlAs Quantum Well Structures and Their Suppression by Insertion of Smoothing Period in Molecular Beam Epitaxy
- Structural Studies on the ZrO_2-Y_2O_3 System by Electron Diffraction and Electron Microscopy III
- Structural Studies on ZrO_2-Y_2O_3 System by Electron Diffraction and Electron Microscopy I
- Improved Alignment Accuracy Using Lens-Distortion Correction for Electron-Beam Lithography in Mix-and-Match with an Optical Stepper
- Statistics of Voronoi Polyhedra in Rapidly Quenched Monatomic Liquids.I.Changes during Rapid-Quenching Process
- Growth of Bi_4Ti_3O_ Thin Film by Two-Dimensional RF Magnetron Sputtering with Bi_2O_3 and TiO_2 Targets (Short Note)
- High Pressure Oxygen Treatment and the Substitution of Sr for Ba on (Nd_Ba_)_2(Ce_Nd_)_2Cu_3O_y Superconductor
- Formation of Bi-Pb-Sr-Ca-Cu Oxide Superconducting Layer from Alkoxide Solutions
- Formation of As-Deposited Y-Ba-Cu-O Superconducting Film by a High Temperature Spray Phrolysis Method