NIU Hirohiko | Department of Electrical Engineering and Computer Sciences, Graduate School of Engineering, Universi
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概要
- 同名の論文著者
- Department of Electrical Engineering and Computer Sciences, Graduate School of Engineering, Universiの論文著者
関連著者
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NIU Hirohiko
Department of Electrical Engineering and Computer Sciences, Graduate School of Engineering, Universi
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Niu Hirohiko
Department Of Electrical Electronic And Computer Engineering Graduate School Of Engineering Himeji I
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FUJISAWA Hironori
Department of Electrical Engineering and Computer Sciences, Graduate School of Engineering, Universi
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SHIMIZU Masaru
Department of Electrical Engineering and Computer Sciences, Graduate School of Engineering, Universi
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Niu Hirohiko
Department Of Electrical Engineering And Computer Sciences Graduate School Of Engineering University
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TAKAI Munezo
Department of Electronics, Himeji Institute of Technology
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MATSUDA TETSURO
Department of Surgery, Soseikai General Hospital
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Matsuda Tetsuro
Department Of Electronics Himeji Institute Of Technology
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Takai Munezo
Department Of Electronics Himeji Institute Of Technology
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Shimizu M
Advanced Industrial Science And Technology (aist) Power Electronics Research Center
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Shimizu Mitsuaki
Power Electronics Research Center National Institute Of Advanced Industrial Science And Technology
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Fujisawa Hironori
Department Of Electrical Electronic And Computer Engineering Graduate School Of Engineering Hitneji
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Shimizu Masaru
Department Of Chemical Engineering Faculty Of Engineering Tokyo University Of Agriculture And Techno
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Shimizu Masahiro
Ulsi Development Center Mitsubishi Electric Corporation
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Shimizu Masaru
Department Of Chemical Engineering Tokyo University Of Agriculture And Technology
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SHIKAMA Tomokazu
Department of Electronics, Himeji Institute of Technology
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Shikama Tomokazu
Department Of Electronics Himeji Institute Of Technology
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Honda K
Fujitsu Laboratories Ltd.
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Mitsugi Satoshi
Precision And Intelligence Laboratory Tokyo Institute Of Technology
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Shimizu M
Tokyo Inst. Technology Yokohama
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Shimizu M
Tokyo Univ. Agriculture & Technol. Koganei
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HONDA Koichiro
Fujitsu Laboratories Ltd.
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NONOMURA Hajime
Department of Electrical Engineering and Computer Sciences, Graduate School of Engineering, Universi
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Nonomura Hajime
Department Of Electrical Engineering And Computer Sciences Graduate School Of Engineering University
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MAEDA Muneo
Department of Electronics, Himeji Institute of Technology
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Matsuura Osamu
Department Of Urology Shakai Hoken Chukyo Hospital
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Matsuura Osamu
Department Of Applied Chemistry Faculty Of Engineering Himeji Institute Of Technology
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YOSHIDA Hidetsugu
Institute of Laser Engineering, Osaka University
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HONDA Kazutaka
Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University
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MATSUDA Tadahito
NTT System Electronics Laboratories
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Tanaka M
Mitsubishi Electric Co. Ltd. Hyogo Jpn
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Niu Hirohiko
Department Of Electronics Himeji Institute Of Technology
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Honda Koichiro
Fujitsu Lab. Ltd. Kanagawa Jpn
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YOSHIDA HARUHIKO
Department of Gastroenterology, Faculty of Medicine, University of Tokyo
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Yoshida Hidemi
Thin Films Laboratory Research Center Mitsubishi Kasei Corporation
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KOBUNE Masafumi
Department of Material Science Chemistry, Graduate School of Engineering, University of Hyogo
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MATSUZAKI Tomoaki
Department of Applied Chemistry Faculty of Engineering, Himeji Institute of Technology
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Tanaka M
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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Matsuda T
Ntt Telecommunications Energy Laboratories
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Matsuda T
Tokyo Inst. Technol. Tokyo Jpn
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藤沢 浩訓
Dep. Of Innovative And Engineered Materials Tokyo Inst. Of Technol.
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Kobune M
Dep. Of Materials Sci. And Chemistry Univ. Of Hyogo
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Kishino S
Department Of Electronics Faculty Of Engineering Himeji Institute Of Technology
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Kishino Seigo
Department of Electronics, Faculty of Engineering, Himeji Institute of Technology
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Matsuzaki T
Department Of Applied Chemistry Faculty Of Engineering Himeji Institute Of Technology
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Yoshida Haruhiko
Department Of Gastroenterology Faculty Of Medicine University Of Tokyo
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Niu Hirohiko
Department of Electronics, Faculty of Engineering, Himeji Institute of Technology
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Yoshida Haruhiko
Department of Electronics, Himeji Institute of Technology, Shosha, Himeji 671-22
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塩嵜 忠
奈良先端科学技術大学院大学物質創成科学研究科
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OKADA Satoshi
Department of Molecular and Pharmacological Neuroscience, Graduate School of Biomedical Sciences, Hi
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HONDA Koichiro
Tujitsu Laboratory Ltd.
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OKADA Yoshihiro
Department of Translational Research for Healthcare and Clinical Science
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FUJII Satoshi
Department of Neurosurgery, Yokohama City University School of Medicine
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Doi Hideki
Department Of Electronics Kyushu University
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Doi Hideki
Department Of Electronics Himeji Institute Of Technology
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MORIMOTO Koji
Department of Breast and Endocrine Surgery, Osaka University Graduate School of Medicine
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Morimoto Koji
Department Of Electronics Faculty Of Engineering Himeji Institute Of Technology
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Shiosaki Tadashi
Department of Electronic, Faculty of Engineering, Kyoto University
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Okada S
Department Of Electronics Himeji Institute Of Technology
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SAWADA Tatsuya
Department of Applied Chemistry Faculty of Engineering. Himeji Institute of Technology
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NINESHIGE Atsushi
Department of Applied Chemistry, Faculty of Engineering, Himeji Institute of Technology
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HAYASHI Keiji
Department of Perinatology, Kagawa Medical University
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Hamana Takashi
Department Of Electronics Himeji Institute Of Technology
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Shiosaki Tadashi
Research Development Division Sakai Chemical Industry Co. Ltd.
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Fujii Satoshi
Department Of Applied Chemistry Faculty Of Engineering Himeji Institute Of Technology
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OHTANI Seigen
Fujitsu Laboratory Ltd.
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Shiosaki Tadashi
Department Of Electrical Engineering Ii Faculty Of Engineering Kyoto University
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OKANIWA Mamoru
Department of Electrical, Electronic and Computer Engineering, Graduate School of Engineering, Himej
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KITA Kentaro
Department of Electronics, Faculty of Engineering, HimeJi Institute of Technology
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HYODO Satoshi
Department of Electronics, Faculty of Engineering, Himeji Institute of Technology
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Kita Kentaro
Department Of Electronics Faculty Of Engineering Himeji Institute Of Technology
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Hyodo Satoshi
Department Of Electronics Faculty Of Engineering Himeji Institute Of Technology
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Shiraishi Takehisa
Department of Electronics, Faculty of Engineering, Himeji Institute of Technology
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NARA Naoki
Department of Electronics, Faculty of Engineering, Himeji Institute of Technology
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Nineshige Atsushi
Department Of Applied Chemistry Faculty Of Engineering Himeji Institute Of Technology
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AOKI Chihiro
Department of Electronics, Himeji Institute of Technology
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YOSHIZAWA Izuru
Department of Electronics, Himeji Institute of Technology
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SADAMATSU Hideaki
Department of Electronics, Himeji Institute of Technology
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Aoki Chihiro
Department Of Electronics Himeji Institute Of Technology
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Okaniwa Mamoru
Department Of Electrical Electronic And Computer Engineering Graduate School Of Engineering Himeji I
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Nara Naoki
Department Of Electronics Faculty Of Engineering Himeji Institute Of Technology
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Morimoto Koji
Department Of Breast And Endocrine Surgery Graduate School Of Medicine Osaka University
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Sadamatsu Hideaki
Department Of Electronics Himeji Institute Of Technology:(present Address) Central Research Laborato
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Shiraishi Takehisa
Department Of Electronics Faculty Of Engineering Himeji Institute Of Technology
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Hayashi Keiji
Department Of Electronics Himeji Institute Of Technology
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Okada Yoshihiro
Department Of Electronics Himeji Institute Of Technology
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Yoshizawa Izuru
Department Of Electronics Himeji Institute Of Technology
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Okada Satoshi
Department Of Electronics Himeji Institute Of Technology:(present Address) Department Of Electronics
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Okada Satoshi
Department Of Applied Chemistry And Biotechnology University Of Fukui
著作論文
- Piezoresponse Force Microscopy Observations of Switching Behavior in Pb(Zr, Ti)O_3 Capacitors
- Microstructures of Self-Assembled PbTiO_3 Nanoislands Prepared by Metalorganic Chemical Vapor Deposition
- Self-Assembled PbTiO_3 Nano-Islands Prepared on SMO_3 by Metalorganic Chemical Vapor Deposition
- Microstructure and Electrical Properties of (Pb, La)(Zr. Ti)O_3 Films Crystallized from Amorphous State by TWO-Step Postdeposition Annealing
- Effects of Pt/SrRuO_3 Top Electrodes on Ferroelectric Properties of Epitaxial(Pb, La)(Zr, Ti)O_3 Thin Films
- Measurement of MOS Leakage Conductance by Means of the Lateral Photovoltaic Effect
- Lateral Photovoltaic Effect in the Weakly Inverted and in the Depleted MOS Interface Layers
- Experimental Verification of the Small-Signal Theory of the Lateral Photovoltaic Effect in MOS Structures
- Observations of Island Structures at the Initial Growth Stage of PbZr_xTi_O_3 Thin Films Prepared by Metalorganic Chemical Vapor Deposition
- Lateral Photovoltaic Measurements of Electrical Properties of SiAl:H/n-Type Si Structures
- Fill-Factor Calculation of Solar Cells Affected by Sheet Resistance of Surface Layer
- Crystalline and Ferroelectric Properties of Pb(Zr, Ti)O_3 Thin Films Grown by Low-Temperature Metalorganic Chemical Vapor Deposition
- Epitaxial Growth and Ferroelectric Properties of the 20-nm-Thick Pb(Zr, Ti)O_3 Film on SrTiO_3(100) with an Atomically Flat Surface by Metalorganic Chemical Vapor Deposition
- Low-Temperature Fabrication of Ir/Pb(Zr,Ti)O_3/Ir Capacitors Solely by Metalorganic Chemical Vapor Deposition
- Step Coverage Characteristics of Pb(Zr, Ti)O_3 Thin Films on Various Electrode Materials by Metalorganic Chemical Vapor Deposition
- Precise Angle and Position Detection Utilizing Optical Interference on Metal-Oxide-Semiconductor-Type Position-Sensitive Detectors
- Chemical Composition of Al_2O_3/InP Metal-Insulator-Semiconductor Interfaces Improved by Plasma and Ultraviolet Oxidation
- A Position-Sensitive MOS Device Using Lateral Photovoltaic Effect
- Oxidation of Si by Microwave-Excited Oxygen-Plasma through Protective Al Coating
- High Conductive P-Type Films of Si_Al_x:H Fabricated by Co-Sputtering and Subsequent Annealing
- Dynamic Characteristics of the Lateral Photovoltaic Effect and Their Application to the Measurement of Junction Capacitance
- Application of Lateral Photovoltaic Effect to the Measurement of the Physical Quantities of P-N Junctions : Sheet Resistivity and Junction Conductance of N^+_2 Implanted Si