Takata M | Osaka Univ. Osaka Jpn
スポンサーリンク
概要
関連著者
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TAKATA Masasuke
Department of Electrical Engineering, Nagaoka University of Technology
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Takata M
Osaka Univ. Osaka Jpn
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Takata Masasuke
Department Of Electrical Engineering Nagaoka University Of Technology
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Takata M
Nagaoka Univ. Technology Niigata
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Nagata H
Sci. Univ. Tokyo Chiba‐ken Jpn
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Nagata H
Osaka Prefecture Univ. Osaka Jpn
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Yamashita Tsutomu
Department of Sensory Science, Faculty of Health Science and Technology, Kawasaki University of Medi
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Yamashita Tsutomu
Recearch Institute Of Electrical Communication Tohoku University
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Nishihara T
Av Core Technology Development Center Matsushita Electric Industrial Co. Ltd.
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NISHIHARA Takaharu
Department Surface Analysis and Semiconductor Equipment, Shimadzu Corporation
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Yamashita Tsutomu
Department Of Electrical Engineering Technological University Of Nagaoka
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Nishihara Takashi
Optical Disk Systems Development Center Matsushita Electric Industrial Co. Ltd.
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弘津 禎彦
大阪大学産業科学研究所高次制御材料科学研究部門材料機能物性研究分野
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KAWAI Akira
LSI Laboratory, Mitsubishi Electric Corporation
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Kawai Akira
Lsi Laboratory Mitsubishi Electric Corporation
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HIROTSU Yoshihiko
Department of Mechanical Engineering, Nagaoka University of Technology
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Nagata Hitoshi
Ulsi Laboratory Mitsubishi Electric Corporation
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KAWAI Akira
ULSI Laboratory, Mitsubishi Electric Corporation
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NAGATA Hitoshi
LSI Laboratory, Mitsubishi Electric Corporation
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Kawai Akira
Ulsi Laboratory Mitsubishi Electric Corporation:(present Address)department Of Electrical Engineerig
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Yamashita T
The Graduate School Of Engineering Science And The Liquid Crystal Institute Science University Of To
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NAGAKURA Sigemaro
Faculty of Engineering, Nagaoka University of Technology
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Hirotsu Yoshihiko
Department Of Mechanical Engineering Nagaoka University Of Technology
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Nagakura S
Waseda Univ. Tokyo Jpn
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Kawai Akira
Ulsi Laboratory Mitsubishi Electric Corporation:(present Address) Department Of Electrical Engineeri
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KAWAKAMI Akira
Department of Orthopedics Surgery, Tokyo Teishin Hospital
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Kawakami A
Kansai Advanced Research Center National Institute Of Information And Communications Technology
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Kawakami Akira
Technol. Res. Assoc. Advanced Display Materials Tokyo Jpn
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Kawakami A
Tokyo Univ. Agriculture And Technol. Tokyo Jpn
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MORIMOTO Hiroaki
ULSI Laboratory, Mitsubishi Electric Corporation
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Kawakami Akira
Department Of Electrical Engineering Technological University Of Nagaoka
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Kawakami Akira
Kansai Advanced Research Center National Institute Of Information And Communications Technology
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Kan Akinori
Department Of Orthopaedic Surgery The University Of Tokyo
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Murata Y
Osaka Prefectural College Of Technology
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Kawakami A
National Agricultural Res. Center For Hokkaido Region Sapporo Jpn
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MURATA Yuzo
Department of Mechanical Engineering, The Technological University of Nagaoka
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NAGAKURA Sigemaro
Department of Mechanical Engineering, The Technological University of Nagaoka
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Morimoto H
Semiconductor Leading Edge Technologies Inc.
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NAKAMURA Yoshio
Department of Chemistry, Faculty of Sciece, Konan University
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KAWAI Akira
LSI-R&D Laboratory, Mitsubisi Electric Corporation
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NAGATA Hitoshi
LSI-R&D Laboratory, Mitsubisi Electric Corporation
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ABE Haruhiko
LSI-R&D Laboratory, Mitsubisi Electric Corporation
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Abe Haruhiko
Lsi-r&d Laboratory Mitsubishi Electric Corporation
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Nakamura Y
The Authors Are With Fujitsu Laboratories Limited
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Nakamura Yoshio
Department Od Metallurgical Engineering Tokyo Institute Of Technology
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KISHIO Kohji
Department of Superconductivity, Graduate School of Engineering, University of Tokyo
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MATSUSHITA Koichi
Department of Electrical and Information Engineering, Faculty of Engineering, Yamagata University
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KOMATSU Takayuki
Department of Materials Science and Technology, Nagaoka University of Technology
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Yamamoto N
Sharp Corp. Nara Jpn
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Kishio Kohji
Department Of Industrial Chemistry University Of Tokyo
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Kishio Kohji
Department Of Applied Chemistry Faculty Of Engineering University Of Tokyo
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YAMAMOTO Naoki
Faculty of Pharmaceutical Sciences, Kyoto University, Kyoto
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WATANABE Jinzou
Kita-Itami Works, Mitsubishi Electric Corporation
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IWAI Yutaka
Technological Development Center, Nagaoka University of Technology
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Iwai Y
Nagaoka Univ. Technology Niigata
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Iwai Y
Nagaoka College Of Technology
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Iwai Yutaka
Faculty Of Engineering Nagaoka University Of Technology
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KANEKO Yasuhisa
Department of Molecular Biology, Faculty of Engineering, Kagoshima University
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Matsushita Koichi
Department Of Electrical And Information Engineering Faculty Of Engineering Yamagata University
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Imai Keitaro
Ulsi Process Engineering Laboratory Microelectronics Engineering Laboratory Toshiba Corporation
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NAGATA Hitosi
LSI Laboratory, Mitsubishi Electric Corporation
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Imai K
Toyota Physical And Chemical Research Institute
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Tomioka Osamu
Faculty Of Engineering Nagaoka University Of Technology
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Nakamura Y
Nec Fundamental Research Laboratories
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HIROTSU Yoshihiko
Faculty of Engineering, Nagaoka University of Technology
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TAKATA Masasuke
Faculty of Engineering, Nagaoka University of Technology
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Matusita Kazumasa
Department of Chemistry, Nagaoka University of Technology
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IWATSUKI Masashi
LEOL Ltd.
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HARADA Yoshiyasu
LEOL Ltd.
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Komatsu T
Department Of Materials Science And Technology Nagaoka University Of Technology
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Komatsu Takayuki
Department Of Chemistry Nagaoka University Of Technology
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Kaneko Yasuhisa
Department Of Electrical Engineering Technological University Of Nagaoka
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IMAI Kouji
Department of Chemistry, Nagaoka University of Technology
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Nagata Hitosi
Lsi Laboratory Mitsubishi Electric Corporation
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Nagakura Sigemaro
Faculty Of Engineering Department Of Metallurgy Tokyo Institute Of Technology
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Takata Masasuke
Faculty Of Engineering Nagaoka University Of Technology
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Watanabe Jinzou
Kita-itami Works Mitsubishi Electric Corporation
著作論文
- Shrinkage Effect of Local Area of Polymer Film on Adhesion Behavior
- Blister Formation at Photoresist-Substrate Interface
- Local Peeling of Photoresist Film during Ultraviolet Light Exposure
- Adhesion of Photoresist Pattern Baked at 80 to 325℃ to Inorganic Solid Surface
- Adhesion of Photoresist Pattern Baked at 80 to 325℃ in Tetramethyl-ammonium-hydroxide Aqueous Solution
- Characterization of Surface Energetic Behavior by Atomic Force Microscopy
- Adhesion of Photoresist Micropattern to Aluminum Substrate in Alkaline Aqueous Solution
- Dependence of Offset Error on Overlay Mark Structures in Overlay Measurement
- Adhesion between Photoresist and Inorganic Substrate : Resist Material and Process
- Adhesion between Photoresist and Inorganic Substrate
- Dependency of Adhesion Behavior on Thermtal Stress Distribution in Photoresist Micropatterns
- Modulated Structure of the High-T_c Superconductor Bi-Pb-Ca-Sr-Cu-O Studied by High-Resolution Electron Microscopy and Electron Diffraction
- High Resolution Electron Microscopy of Crystal and Defect Structures of the High-T_c Superconductor Ba_2YCu_3O_
- Electron Diffraction and Microscopy of the Structures of La-Ba(Sr)-Cu Oxides at Liquid Helium Temperature
- Rf Power Dependence of AC Josephson Current in Point-Contacts of BaY(Tm)CuO Ceramics
- AC Josephson Effect in Point-Contacts of Ba-Y-Cu-0 Ceramics
- Preparation of High T_c Superconducting (La_Sr_x)_2CuO_4
- Electron Diffraction and Microscopy of the Structure of La-Ba(Sr)-Cu Oxides at Room Temperature
- Liquid Quenched Superconductor Ba-Y-Cu-O with T_=88 K and AC Josephson Effect at 77 K