Secondary Ion Mass Spectrometry of Organic Thin Films Using Metal-Cluster-Complex Ion Source

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概要

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• Tetrairidium dodecacarbonyl, Ir4(CO)12, is a metal cluster complex that has a molecular weight of 1104.9. Using a metal-cluster-complex ion source, secondary ion mass spectrometry (SIMS) of poly(methyl methacrylate) (PMMA) thin films on silicon substrates was performed with a quadrupole mass spectrometer. The secondary ion intensity of PMMA bombarded with Ir4(CO)7+ ions was investigated in the beam energy ranging from 3 to 10 keV at an incident angle of 45°. For comparison, bombardment with oxygen ions, O2+, was also tested. It was confirmed that the use of Ir4(CO)7+ ions enhanced secondary ion intensity by at least one order of magnitude compared with that of O2+ ions. Experimental results also showed that secondary ion intensity increased with beam energy; particularly, high-mass secondary ion intensity markedly increased.

• Japan Society of Applied Physicsの論文
• 2006-09-25

著者

• Itoh Hiroshi

  National Inst. Of Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn

• FUJIWARA Yukio

  National Institute of Advanced Industrial Science and Technology (AIST)

• KONDOU Kouji

  National Institute of Advanced Industrial Science and Technology (AIST)

• NONAKA Hidehiko

  National Institute of Advanced Industrial Science and Technology (AIST)

• FUJIMOTO Toshiyuki

  National Institute of Advanced Industrial Science and Technology (AIST)

• KUROKAWA Akira

  National Institute of Advanced Industrial Science and Technology (AIST)

• Ichimura Shingo

  National Inst. Of Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn

• Tomita Mitsuhiro

  Corporate Research And Development Center Toshiba Corporation

• Saito Naoaki

  National Institute Of Advanced Industrial Science And Technology

• Kurokawa Akira

  National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan

• Kondou Kouji

  National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan

• Itoh Hiroshi

  National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan

関連論文

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• Relationship between Ozone Oxidation and Stress Evolution on an H-Terminated Si Surface
• Nanoscale-order Homogeneous Structure of SiO_2 Film on Poly-silicon Grown at Room Temperature using UV Light Excited Ozone
• Hyperthermal Beam for Oxidation and Nitridation Produced by Laser Evaporation of MiXed O_3/N_2O Cryogenic Film : Surfaces, Interfaces, and Films
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• Mass Markers for Time-of-Flight Secondary Ion Mass Spectrometry Spectrum in a Large Mass Region Using Ir4(CO)12 Metal Cluster Complex Sample
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• Photochemical Reaction of Ozone and 1,1,1,3,3,3-Hexamethyldisilazane: Analysis of the Gas Reaction between Precursors in a Photochemical Vapor Deposition Process
• Evaluation of Errors in the Measurement of Surface Roughness at High Spatial Frequency by Atomic Force Microscopy on a Thin Film
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• Development of a Compact Time-of-Flight Mass Spectrometer with a Length of 1 m for Processing Plasma Diagnostics
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• Relationship between Ozone Oxidation and Stress Evolution on an H-Terminated Si Surface
• Secondary-Ion-Mass-Spectrometry Depth Profiling of Ultra-shallow Boron Delta Layers in Silicon with Massive Molecular Ion Beam of Ir4(CO)7+
• Beam-induced Nanoscale Ripple Formation on Silicon with the Metal-Cluster-Complex Ion of Ir4(CO)7+

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