Ultra Thin Film Growth of Pd by Radical Enhanced Vapor Deposition
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概要
- 論文の詳細を見る
The vapor deposition of Pd on graphite was carried out in an oxygen radical atmosphere, and resulting surfaces were analyzed by an Auger electron microprobe and a scanning tunneling microscope. In contrast with deposition under oxygen atmosphere or under vacuum, coexistence of the oxygen radical during deposition enabled the Pd to form an ultra thin film whose thickness was 0.6 nm.
- 社団法人応用物理学会の論文
- 1995-05-15
著者
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FUJIMOTO Toshiyuki
Department of Chemical Engineering, Faculty of Engineering, Hiroshima University
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FUJIMOTO Toshiyuki
National Institute of Advanced Industrial Science and Technology (AIST)
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KOJIMA Isao
National Institute of Materials and Chemical Research
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Kojima I
National Metrology Institute Of Japan National Institute Of Advanced Industrial Science And Technolo
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Kojima Isao
National Chemical Laboratory For Industry
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Fujimoto T
Okayama Univ. Sci. Okayama Jpn
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