Numerical Simulations of Films Formed by Cluster/Particle Co-Deposition in Atmospheric-Pressure Chemical Vapor Deposition Process Using Organic SIlicon Vapors and Ozones Gas
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-06-15
著者
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OKUYAMA KIKUO
Department of Chemical Engineering, Graduate School of Engineering, Hiroshima University
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Adachi M
Toyama Prefectural Univ. Toyama Jpn
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Adachi Motoaki
Research Institute For Advanced Science And Technology Osaka Prefecture University
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Adachi Motoaki
Research Institute For Advanced Science And Techncology University Of Osaka Prefecture
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Itoh Yoshifumi
Department Of Chemical Engineering Graduate School Of Engineering Hiroshima University
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Itoh Yoshifumi
Department Of Chemical Engineering Faculty Of Engineering Hiroshima University
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Okuyama K
Hiroshima Univ. Hiroshima Jpn
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Okuyama Kikuo
Department Of Chemical Engineering Faculty Of Engineering Hiroshima University
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FUJIMOTO Toshiyuki
Department of Chemical Engineering, Faculty of Engineering, Hiroshima University
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Adachi Motoaki
Research Institute For Advanced Science And Technology Universiry Of Osaka Prefecture
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ADACHI Masatoshi
Department of Electronics and Informatics, Faculty of Engineering, Toyama Prefectural University
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Itoh Yoshifumi
Department Of Cancer Cell Research The Institute Of Medical Science The University Of Tokyo
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Fujimoto T
Okayama Univ. Sci. Okayama Jpn
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Fujimoto Toshiyuki
Department Of Applied Chemistry Muroran Institute Of Technology
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ITOH Yoshifumi
Department of Agricultural Chemistry, Faculty of Agriculture, Tohoku University
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