Nanoparticle Synthesis by Ionizing Source Gas in Chemical Vapor Deposition
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概要
- 論文の詳細を見る
A new chemical vapor deposition (CVD) method called ionization CVD, in which reactant gases are ionized, was developed for the synthesis of nanoparticles. In such a CVD method, the particles formed are charged and the repulsive Coulombic force between them suppresses their coagulation, producing non-agglomerated particles that have a relatively high number concentration and small size. A tetraethylorthosilicate (TEOS)/O2 mixture was ionized by using a sonic-jet corona discharger. All particles formed by the ionization CVD had a negative charge and their sizes and number concentrations were 1/6–1/15 times smaller and 10–150 times higher, respectively, than those of particles formed by conventional CVD. The mean diameter of the smallest particles prepared with ionization was 8.9 nm.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 2003-01-15
著者
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Adachi Motoaki
Research Institute For Advanced Science And Techncology University Of Osaka Prefecture
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Okuyama Kikuo
Department Of Chemical Engineering Faculty Of Engineering Hiroshima University
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Tsukui Shigeki
Research Institute For Advanced Science And Technology Osaka Prefecture University
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Okuyama Kikuo
Department of Chemical Engineering, Hiroshima University, 1-4-1 Kagamiyama, Higashi-Hiroshima, Hiroshima 739-8527, Japan
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