Fabrication of YMnO_3 Thin Films on Si Substrates by a Pulsed Laser Deposition Method
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1997-09-30
著者
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藤村 紀文
大阪府立大学大学院工学研究科電子・数物系専攻
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Aoki Nobuaki
Department Of Applied Materials Science College Of Engineering Osaka Prefecture University
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YOSHIMURA Takeshi
Department of Applied Materials Science, Graduate School of Engineering, Osaka Prefecture University
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FUJIMURA Norifumi
Department of Applied Materials Science, Graduate School of Engineering, Osaka Prefecture University
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ITO Taichiro
Department of Applied Materials Science, Graduate School of Engineering, Osaka Prefecture University
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Ito Taichiro
Department Of Applied Materials Science Graduate School Of Engineering Osaka Prefecture University
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TSUKUI Shigeki
Research Institute for Advanced Science and Technology, Osaka Prefecture University
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Tsukui Shigeki
Research Institute For Advanced Science And Technology Osaka Prefecture University
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Fujimura Norifumi
Department Of Applied Materials Science Graduate School Of Engineering Osaka Prefecture University
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HOKAYAMA Kouzo
Department of Applied Materials Science, College of Engineering, Osaka Prefecture University
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KAWABATA Keisuke
Research Institute for Advanced Science and Technology, Osaka Prefecture University
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Yoshimura T
Kyushu Univ. Fukuoka Jpn
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Hokayama Kouzo
Department Of Applied Materials Science College Of Engineering Osaka Prefecture University
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Yoshimura Takeshi
Department Of Applied Materials Science Graduate School Of Engineering Osaka Prefecture University
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Kawabata Keisuke
Research Institute For Advanced Science And Technology Osaka Prefecture University
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Yoshimura T
Department Of Applied Materials Science College Of Engineering Osaka Prefecture University
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