Numerical Evaluation of Silicon-Thin Film Growth from SiHCl_3-H_2 Gas Mixture in a Horizontal Chemical Vapor Deposition Reactor
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-04-15
著者
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OKUYAMA KIKUO
Department of Chemical Engineering, Graduate School of Engineering, Hiroshima University
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SHIMADA Manabu
Department of Chemical Engineering, Hiroshima University
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Shimada Manabu
Department Of Chemical Engineering Faculty Of Engineering Hiroshima University
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Okuyama Kikuo
Department Of Chemical Engineering Faculty Of Engineering Hiroshima University
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Habuka H
Department Of Chemical Engineering Science Yokohama National University
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Katayama Masatake
R & D Center Shin-etsu Handotai Co. Ltd.
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HABUKA Hitoshi
R & D Center, Shin-Etsu Handotai Co., Ltd.
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KATAYAMA Masatake
R & D Center, Shin-Etsu Handotai Co., Ltd.
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