FUJIWARA Yukio | National Institute of Advanced Industrial Science and Technology (AIST)
スポンサーリンク
概要
関連著者
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FUJIWARA Yukio
National Institute of Advanced Industrial Science and Technology (AIST)
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NONAKA Hidehiko
National Institute of Advanced Industrial Science and Technology (AIST)
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FUJIMOTO Toshiyuki
National Institute of Advanced Industrial Science and Technology (AIST)
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KUROKAWA Akira
National Institute of Advanced Industrial Science and Technology (AIST)
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Ichimura Shingo
National Inst. Of Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
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Saito Naoaki
National Institute Of Advanced Industrial Science And Technology
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KONDOU Kouji
National Institute of Advanced Industrial Science and Technology (AIST)
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Tomita Mitsuhiro
Corporate Research And Development Center Toshiba Corporation
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Watanabe Kouji
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Itoh Hiroshi
National Inst. Of Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
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Nakanaga Taisuke
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Fujimoto Toshiyuki
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Nakanaga Taisuke
National Chemical Laboratory for Industry, Tsukuba Research Center
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Fujiwara Yukio
Research Institute Of Instrumentation Frontier (riif) National Institute Of Advanced Industrial Scie
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TERANISHI Yoshikazu
National Institute of Advanced Industrial Science and Technology (AIST)
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ICHIMURA Shingo
National Institute of Advanced Industrial Science and Technology (AIST)
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Ichimura Shingo
Research Institute Of Instrumentation Frontier (riif) National Institute Of Advanced Industrial Scie
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Nonaka Hidehiko
Research Institute Of Instrumentation Frontier (riif) National Institute Of Advanced Industrial Scie
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Kondou Kouji
Research Institute Of Instrumentation Frontier (riif) National Institute Of Advanced Industrial Scie
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Teranishi Yoshikazu
Research Institute Of Instrumentation Frontier (riif) National Institute Of Advanced Industrial Scie
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Fujimoto Toshiyuki
Research Institute Of Instrumentation Frontier (riif) National Institute Of Advanced Industrial Scie
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Saito Naoaki
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Kurokawa Akira
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Suzuki Atsushi
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Ichimura Shingo
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Nonaka Hidehiko
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Kondou Kouji
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Itoh Hiroshi
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Suzuki Atsushi
National Institute of Advanced Industrial Science and Technology (AIST), AIST Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
著作論文
- Production of Stable Ion Beam of Os_3(CO)_ with Compact Metal-Cluster-Complex Ion Source
- Mass Markers for Time-of-Flight Secondary Ion Mass Spectrometry Spectrum in a Large Mass Region Using Ir4(CO)12 Metal Cluster Complex Sample
- Ion Beam Generation from an Electrolyte Solution Containing Polyatomic Cations and Anions for Secondary Ion Mass Spectrometry
- Secondary Ion Mass Spectrometry of Organic Thin Films Using Metal-Cluster-Complex Ion Source
- Secondary-Ion-Mass-Spectrometry Depth Profiling of Ultra-shallow Boron Delta Layers in Silicon with Massive Molecular Ion Beam of Ir4(CO)7+
- Beam-induced Nanoscale Ripple Formation on Silicon with the Metal-Cluster-Complex Ion of Ir4(CO)7+