Photochemical Reaction of Ozone and 1,1,1,3,3,3-Hexamethyldisilazane: Analysis of the Gas Reaction between Precursors in a Photochemical Vapor Deposition Process
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概要
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The photochemical reaction of 1,1,1,3,3,3-hexamethyldisilazane (HMDS) and ozone (O3) in the gas phase was analyzed as the side reaction in the photochemical vapor deposition (photo-CVD) process irradiated by ultraviolet light: the analysis was conducted by Fourier-transform infrared absorption spectroscopy (FT-IR) and mass spectrometry (MS). The final products of this photochemical reaction between HMDS and O3 are CO2, N2, and H2O, although this reaction is initiated at the Si–N–Si bond of HMDS with O3 and ultraviolet (UV) light, thus producing, as a reaction intermediate, a compound with carbonyl and/or carboxylic group followed by Si–N–Si scission.
- 2008-09-25
著者
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NONAKA Hidehiko
National Institute of Advanced Industrial Science and Technology (AIST)
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NAKAMURA Ken
National Institute of Advanced Industrial Science and Technology (AIST)
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Ichimura Shingo
National Inst. Of Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
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NISHIGUCHI Tetsuya
National Institute of Advanced Industrial Science and Technology (AIST)
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Kameda Naoto
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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NAKAMURA Ken
National Institute for Agro-Environmental Sciences
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