Titration Method for Measuring Fluorine Atom Concentration in Microwave Plasma Etching
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概要
- 論文の詳細を見る
A titration method has seen developed to measure the concentration of fluorine (F) atom in microwave plasma etching. A rapid reaction of F atoms with H_2 gas is used as a titration reaction to determine the absolute F atom concentration. Applying the present method to SF_6 microwave discharge, the F atom concentration is measured under various discharge conditions. The F atom concentration is 2.9-4.0×10^<11> cm^<-3> at a typical operating pressure of 6.7×10^<-2> Pa and a microwave power of 200 W. It is confirmed that relative changes in the concentration agree well with those obtained with the optical spectroscopic method.
- 社団法人応用物理学会の論文
- 1983-01-20
著者
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Suzuki K
Ntt Transmission Systems Laboratories Lightwave Communications Laboratory
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Suzuki K
Assoc. Super‐advanced Electronics Technol. Kanagawa Jpn
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Ninomiya Kunimoto
New Materials Research Center Sanyo Electric Co. Ltd.
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Ninomiya Kunimoto
Functional Materials Research Center Sanyo Electric Co. Ltd.
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Suzuki K
Department Of Information And Communication Technology Tokai University
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SUZUKI Keizo
Central Research Laboratory, Hitachi, Ltd.
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Ninomiya K
Central Research Laboratory
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Ninomiya Ken
Central Research Laboratory Hitachi Ltd.
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Nishimatsu Shigeru
Central Research Laboratory, Hitachi, Ltd.
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Nishimatsu S
Central Research Laboratory Hitachi Ltd.
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Nishimatsu Shigeru
Central Research Laboratory Hitachi Lid.
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Suzuki Keizo
Central Research Laboratory Hitachi Limited
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NINOMIYA Ken
Central Research Laboratory
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