Nondestructive Depth Profile Analysis by Changing Escape Depth of Photoelectrons

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1993-10-15

著者

• Ninomiya Kunimoto

  New Materials Research Center Sanyo Electric Co. Ltd.

• Ninomiya Kunimoto

  Functional Materials Research Center Sanyo Electric Co. Ltd.

• NINOMIYA Ken

  Central Research Laboratory, Hitachi, Ltd.

• Ninomiya K

  Central Research Laboratory

• Ninomiya Ken

  Central Research Laboratory Hitachi Ltd.

• Hasegawa M

  Division V Superconductivity Research Laboratory International Superconductivity Technology Center

• HASEGAWA Masaki

  Central Research Laboratory, Hitachi, Ltd.

• Hasegawa Masaki

  Central Research Laboratory Hitachi Lid.

• NINOMIYA Ken

  Central Research Laboratory

• Hasegawa Masaki

  Division V, Superconductivity Research Laboratory, International Superconductivity Technology Center

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• Spiral Growth of YBa_2Cu_3O_ Thin Films by Metalorganic Chemical Vapor Deposition Using Liquid-State Sources
• Nondestructive Depth Profile Analysis by Changing Escape Depth of Photoelectrons
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