Total Photo-Yield Imaging of Stripe Patterns Using Soft X-Ray Microbeam Formed by Wolter-Type Mirror
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概要
- 論文の詳細を見る
One-dimensional imaging of stripe patterns was performed using the total yield of photoelectrons generated by the irradiation of a 150 eV soft X-ray microbeam formed by a Wolter-type mirror. The samples were aluminum stripes, which were patterned on a SiO_2 wafer with the same widths and spacing of either 2 or 4 μm. When the sagittal beam size of the microbeam was between 1.8 and 3.8 μm, the patterns were detected with a modulation between 0.06 and 0.11. The imaging indicates that the highest lateral resolution achieved is between 0.7 and 1.3 μm, when the resolution is defined as the 25%-75% width of the photoelectron count rate change at the pattern edge.
- 社団法人応用物理学会の論文
- 1994-04-01
著者
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Ninomiya Ken
Central Research Laboratory Hitachi Ltd.
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Hasegawa Masaki
Central Research Laboratory Hitachi Ltd.
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Hasegawa Masaki
Central Research Laboratory Hitachi Lid.
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NINOMIYA Ken
Central Research Laboratory
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