Radiation Damage in SiO_2/Si Induced by VUV Photons : Etching and Deposition Technology

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1989-12-30

著者

• SUZUKI Keizo

  Central Research Laboratory, Hitachi, Ltd.

• Yunogami Takashi

  Central Research Laboratory Hitachi Ltd

• MIZUYANI Tatsumi

  Central Research Laboratory, Hitachi Ltd

• NISHIMSTSU Shigeru

  Central Research Laboratory, Hitachi Ltd

• Nishimstsu Shigeru

  Central Research Laboratory Hitachi Ltd

• Suzuki Keizo

  Central Research Laboratory Hitachi Ltd

• Suzuki Keizo

  Central Research Laboratory Hitachi Limited

• Mizuyani Tatsumi

  Central Research Laboratory Hitachi Ltd

関連論文

• X-Ray Photoelectron Spectroscopy Using A Focused 300 μm-Diameter X-Ray Beam
• X-Ray Photoelectron Spectroscopy of Micrometer-Size Surface Area Using Synchrotron Radiation
• Microscopic X-ray Photoelectron Spectroscopy Using a Wolter Type X-ray Mirror
• Mechanism of Radiation Damage in SiO_2/Si Induced by vuv Photons : Beam-Induced Physics and Chemistry
• Mechanism of Radiation Damage in SiO_2/Si Induced by vuv Photons
• Neutral-Beam-Assisted Etching of SiO_2 : A Charge-Free Etching Process
• Positive Charges and E' Centers Formed by Vacuum Ultraviolet Radiation in SiO_2 Grown on Si : Beam-Induced Physics and Chemistry
• Positive Charges and E' Centers Formed by Vacuum Ultraviolet Radiation in SiO_2 Grown on Si
• Si Etching with a Hot SF_6 Beam and the Etching Mechanism
• Analytical Investigation of Plasma and Electrode Potentials in a Diode Type RF Discharge
• Si Etching with a Hot SF_6 Beam
• Titration Method for Measuring Fluorine Atom Concentration in Microwave Plasma Etching
• Microwave Plasma Etching
• Radiation Damage in SiO_2/Si Induced by Low-Energy Electrons via Plasmon Excitation : Beam Induced Physics and Chemistry
• Neutral-Beam-Assisted Etching of SiO_2 : A Charge-Free Etching Process : Etching and Deposition Technology
• Radiation Damage in SiO_2/Si Induced by VUV Photons : Etching and Deposition Technology
• Decrease in Ozone Density of Atmospheric Surface-Discharge Plasma Source
• Fabrication of an Axisymmetric Wolter Type I Mirror with a Gold Deposited Reflecting Surface
• Radiation Damage in SiO2/Si Induced by VUV Photons
• Vibrational and Rotational Energy Distributions in a Hot Cl2 Molecular Beam

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