A Design Method of Distributed Telecommunication System Based on the ODP Viewpoint Approach (Special Issue on Distributed Architecture for Next Generation Communication Networks)
スポンサーリンク
概要
- 論文の詳細を見る
Along with the improvement of micro processors and local area networks, a distributed system becomes useful to realize a telecommunication system. It has potential advantage to achieve both high performance and high reliability. However, the design of a distributed system tends to be more complicated compared to a conventional centralized system. For the purpose of the standardization of distributed processing, ISO and ITU-T study the Open Distributed Processing (ODP) and are currently standardizing the Basic Reference Model of ODP (RM-ODP). To avoid dealing with the complexity of distributed systems, RM-ODP defines five viewpoints. The viewpoint approach of RM-ODP is proposed as a framework for the design of a distributed system. Although some previous works give the design methods of distributed systems based on the ODP viewpoint approach, the detailed design method has not been fully specified or all of the five viewpoints are not taken into account. In this paper, we describe a detailed design method for a distributed telecommunication system based on the ODP viewpoint approach. The method applies the five viewpoints to the three phases of design of a distributed system, that is, requirement analysis, functional design and detailed design phase. It clarifies what specifications for the target system should be made from the individual viewpoints and how the specifications are related each other. It also takes account of the platform which provides the distribution support, and gives the design method for both the platform and the application specific functions on the platform. The design method is examined by applying it to the design of a distributed MHS system supporting X.400 series protocols. In this example, the remote procedure call based on the client-server model is selected as the base of the platform. The result shows that our method is useful to simplify the complexity of the design for a distributed telecommunication system.
- 社団法人電子情報通信学会の論文
- 1994-11-25
著者
-
Suzuki Kenji
Kdd R & D Laboratories
-
Suzuki Kenji
The Research Institute For Iron Steel And Other Metals
-
Suzuki Kenji
Institute For Materials Research Laboratory Tohoku University
-
Suzuki K
Assoc. Super‐advanced Electronics Technol. Kanagawa Jpn
-
Kato T
Kddi R&d Laboratories Inc.
-
Fujinaga Masahiko
Kdd R & D Laboratories
-
Suzuki K
Department Of Information And Communication Technology Tokai University
-
Suzuki K
東京大学大学院農学生命科学研究科獣医病理学研究室
-
Fujinaga Masahiko
the Research and Development Laboratories, Kokusai Denshin Denwa Co., Ltd.
-
Kato Toshihiko
the Research and Development Laboratories, Kokusai Denshin Denwa Co., Ltd.
関連論文
- EXAFS Studies of Amorphous Nickel-Zirconium Alloys : Condensed Matter
- Free Surface Potential Flow around Multi-Hulls in Shallow Water Using a Potential Based Panel Method
- (4)3次元WIGに関する数値解析的研究 : 平成5年秋季講演論文概要
- Flat and Lateral High-T_c Superconducting Junctions Applied to Millimeter-Wave Mixer (Special Issue on Toward Digital and Analog Applications of Superconductors)
- Formation of Nanocrystalline Structures by Crystallization of Amorphous Fe-M-B (M=IVa to VIa Group Metal) Alloys
- Analysis of Non-Uniform Boron Penetration of Nitrided Oxide in PMOSFETs Considering Two-Dimensional Nitrogen Distribution
- Boron Penetration Enhanced by Gate Ion Implantation Damage in PMOSFETs
- Hydrogen-Enhanced Boron Penetration in PMOS Devices during SiO_2 Chemical Vapor Deposition
- Hydrogen-Enhancing Boron Penetration in P-MOS Devices during SiO_2 Chemical Vapor Deposition
- Boron Diffusion in Nitrided-Oxide Gate Dielectrics Leading to High Suppression of Boron Penetration in P-MOSFETs
- Boron Diffusion in Nitrided Oxide Gate Dielectrics Leading to High Suppression of Boron Penetration in P-MOSFETs
- Sb Multiple Ion Implanted Channel for Low V_, Deep Submicron SOI-pMOSFETs
- A Continuous Media Transfer Protocol with Congestion Control Using Two Level Rate Control (Special Issue on Distributed Processing for Controlling Telecommunications Systems)
- Implementation and Performance Evaluation of High Performance CMIP Software over ATM Network (Special Issue on Network Operations and Management)
- Design and Implementation of Management Information Base (MIB) Tester for TMN (Special Issue on New Paradigms in Network Management)
- X-Ray Mask Distortion Induced in Back-Etching Preceding Subtractive Fabrication: Resist and Absorber Stress Effect
- Ultrahigh-Vacuum Electron Cyclotron Resonance-Plasma Chemical-Vapor-Deposited SiN_x Films for X-Ray Lithography Mask Membrane : As-Deposited Properties and Radiation Stability
- Electron and Hole Proximity Effects in the InAs/AlSb/GaSb System
- Optically Detected Cyclotron Resonance by Multichannel Spectroscopy
- High-Quality, High-Rate SiO_2 and SiN Films Formed by 400 kHz Bias Electron Cyclotron Resonance-Chemical Vapor Deposition
- Electrical Properties of Regrowth ZnSe Homointerfaces Formed by Molecular Beam Epitaxy
- Electrical Properties of ZnSe/ZnSe Homointerfaces Formed by MBE Regrowth Process
- Characterization of Epitaxial ZnSe/GaAs(100) Interface Properties and Their Control by (HF+Se)-Pretreatment
- Characterization and Control of MBE-ZnSe/GaAs(100) Substrate Interface and Regrown ZnSe/ZnSe Homointerface
- Microoptical Two-Dimensional Devices for the Optical Memory Head of an Ultrahigh Data Transfer Rate and Density Sytem Using a Vertical Cavity Surface Emitting Laser (VCSEL) Array
- Mask Error Factor in Proximity X-Ray Lithography
- Determination of the Facet Index in Area Selective Epitaxy of GaAs
- Fabrication of Micro-Pyramidal Probe Array with Aperture for Near-Field Optical Memory Applications
- Optimum Phase Condition for Low-Contrast X-Ray Masks
- Selective Growth of GaAs on GaAs (111)B Substrates by Migration-Enhanced Epitaxy
- Determination of the Facet Index in Area Selective Epitaxy of GaAs
- Classification of Inhomogeneities in Hydrogenated Amorphous Silicon
- Medium-Range Order of Amorphous Silicon Germanium Alloys : Small-Angle X-Ray Scattering Study
- Chemical Vapor Deposition of a-Si:H Films Utilizing a Microwave Excited Ar Plasma Stream
- Growth and Stability of H_2-Phthalocyanine Thin Films on MoS_2 Surfaces Studied by Means of Low-Energy Electron Transmission Spectroscopy
- Growth of Pb-Phthalocyanine Thin Films on MoS_2 Surfaces Studied by Means of Low-Energy Electron Transmission Spectroscopy
- 1-4 Application of Micro-Genetic Algorithm (μGA) to the Optimal Design of Lifting Bodies
- Effect of Ar + O_2 Plasma Etching on Microwave Characteristics of YBa_2Cu_3O_ Based Resonators
- Microwave Properties of Y_1Ba_2Cu_3O_ Step-Edge Josephson Junction Series Arrays
- Characteristics of YBCO Josephson Junction Prepared by a Focused Ion Beam Technique
- X-Band Mixing Performance of Y_1Ba_2Cu_3O_ Step-Edge Junction
- I-V Characteristic of YBCO Step-Edge Josephson Junction (Special Section on Superconducting Devices)
- Effects of Excited Species in Electron Cyclotron Resonance Plasma on SiN Film Resistivity
- 非突出型船首バルブによる漁船船型の改良
- Fabrication of Epitaxial Diamond Thin Film on Iridium
- Epitaxial Growth of Diamond on Iridium
- Chemical Bonding in Zr-Ni and Zr-Ni-D Alloy Glasses Observed by Soft X-Ray Spectroscopy
- Age-related Change in Relationship between White Blood Cell Count and Some Features of the Metabolic Syndrome
- Association of Lifestyle with Serum Lipid Levels : a Study of Middle-Aged Japanese Men
- Body Mass Index as a Measure of Health Care for Japanese Male Office Workers
- The Incidence of Hyperuricemia and Correlated Factors in Middle-Ages Japanese Men
- Associations of Body Mass Index and Percentage Body Fat by Bioelectrical Impedance Analysis with Cardiovascular Risk Factors in Japanese Male Office Workers
- Relation of Body Weight Change to Changes in Atherogenic Traits, A Study of Middle-Aged Japanese Obese Male Office Workers
- Effects of Coffee Consumption against the Development of Liver Dysfunction:A4-Year Follow-Up Study of Middle-Aged Japanese Male Office Workers
- Lifestyle and the Development of Dyslipidemia : a 4-year Follow-up Study of Middle-aged Japanese Male Office Workers
- Serum Uric Acid : Correlation with Biological, Clinical and Behavioral Factors in Japanese Men
- Risk Factors for the Incidence of Aortic Stiffness by Serial Aortic Pulse Wave Velocity Measurement in Middle-aged Japanese men
- (2) 自由表面条件の非線形性を考慮したパネル法による非揚力体/揚力体解析 : 平成10年春季講演論文概要
- Chemical Bond of CVD-Si_3N_4 by Compton Scattering Measurement
- Electrical Resistivity Studies of Hydrogenated Pd-Zr Glasses
- Short-Range Structures of Amorphous and Liquid Iron and Pd_-Si_ Alloy
- Effects of Applied Magnetic Fields on Silicon Oxide Films Formed by Microwave Plasma CVD : Nuclear Science, Plasmas and Electric Discharges
- Validity of the Conventional Indirect Methods Including Friedewald Method for Determining Serum Low-Density Lipoprotein Cholesterol Level: Comparison with the Direct Homogeneous Enzymatic Analysis
- Reactive Ion Etching of Sputtered PbZr_Ti_xO_3 Thin Films
- Applying Reliable Data Transfer Protocol to Real Time Video Retrieval System (Special Issue on Network Interworking)
- Structure Characterization of Fe-B Amorphous Alloys by a Laboratory EXAFS Spectrometer
- An Experimental Derivation of Partial Structure Functions of Amorphous Pd_Si_ Alloy Using Combination of X-ray, Electron and Neutron Diffraction Experiments
- Preparation and Properties of Mn-Ga Amorphous Films by ICB Method
- A Geometrical Relaxation Model on Structure Change and Kinetics during Low-Temperature Annealing of Amorphous Metals
- Electronic Structures of Amorphous Co-P and Ni-P Alloys by γ-ray Compton Scattering
- The Short-Range Structure of La-Based Alloy Glasses by Pulsed-Neutron and X-Ray Diffraction
- Radial Distribution Functions of Pd-Si Alloy Glasses by Pulsed Neutron Total Scattering Measurements and Geometrical Structure Relaxation Simulations
- Ring-Chain Transition in Liquid Selenium by a Disordered Chain Model
- Small Angle X-Ray Scattering of Neutron- and Electro-Irradiated Pd_Si_ Amorphous Alloy
- Temperature Dependence of Knight Shift of ^In in Hg-In Liquid Alloys
- 非線形計画法による船型設計の基礎的研究-3-船型の平滑化を考慮した極小造波抵抗問題〔含 討論〕
- 非線形計画法による船型設計の基礎的研究-2-低速造波理論の応用および水槽試験による検証〔含 討論〕
- Application of Micro-Genetic Algorithm (μGA) to the Optimal Design of Lifting Bodies
- On the Density of Electronic States of Liquid Mercury
- Effects of Ambient Gases on Surface Profile and Related Properties of Amorphous Alloy Ribbons Fabricated by Melt-Spinning
- A Comment on Short-Range Structure of Vitreous As_2Se_3 Observed in High Momentum Transfer Region
- Partial Structure Factor of Amorphous Cu_Zr_ Alloy Determined by TOF Pulsed Neutron Diffraction
- Soft X-Ray Emission Study of Chemical Bonding in Fe-and Ni-Metalloid Alloy Glasses
- Anisotropic Compton Profiles for V and VD_ Single Crystals
- Temperature Variations in the Fermi Momentum of Aluminum Metal by Compton Scattering Technique
- γ-Ray Compton Profiles of Liquid and Crystalline Aluminum
- γ-Ray Compton Profiles of Lithium and Sodium in the Liquid and Solid State
- Experimental and Monte Calro Studies of Multiple Scattering Correction in the Compton Profile Aluminum
- Characteristics of Soft Core in Pair Potential and Static Structure in Liquid Metals
- X-ray Diffraction Study of Metastable Structure in Liquid Mercury near the Melting Point
- A High-Speed Remote Procedure Call Based on Adaptive Data Representation Conversion
- A Design Method of Distributed Telecommunication System Based on the ODP Viewpoint Approach (Special Issue on Distributed Architecture for Next Generation Communication Networks)
- On the Anomalous Physical Properties of Liquid Copper Alloys
- (4)浮体模型まわりの自由表面流に及ぼす表面張力の影響に関する研究 : 平成8年秋季講演論文概要
- (12)サーフェイスパネル法によるセーリングヨットに働く流体力の計算 : 平成7年秋季講演論文概要
- Concentration Fluctuation in Tl_2Te-Tl Liquid System by Time-of-Flight Quasielastic Neutron Scattering Measurement
- Electronic Behaviour of Dilute Liquid Te Alloys
- Electrical and Magnetic Properties Related to Defect Structure in the Nonstoichiometric TiO and VO Phases
- Experimental and Monte Calro Studies of Multiple Scattering Correction in the Compton Profile of Aluminum
- Amorphous Ni-Ti and Ni-Zr alloys for water electrolysis cathode materials.