Effects of Applied Magnetic Fields on Silicon Oxide Films Formed by Microwave Plasma CVD : Nuclear Science, Plasmas and Electric Discharges
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1988-10-20
著者
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Suzuki Kenji
Institute For Materials Research Laboratory Tohoku University
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Mochizuki Yasuhiro
Hitachi Research Laboratory Hitachi Ltd.
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Mochizuki Yasuhiro
Hitachi Research Labolatory Hitachi Ltd.
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OHUE Michio
Hitachi Research Laboratory, Hitachi Ltd.
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MOMMA Naohiro
Hitachi Research Laboratory, Hitachi Ltd.
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Ohue Michio
Hitachi Research Laboratory Hitachi Ltd.
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Fukuda Takuya
Hitachi Research Laboratory Hitachi Ltd.
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Momma Naohiro
Hitachi Research Laboratory Hitachi Ltd.
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SONOBE Tadashi
Hitachi Works, Hitachi, Ltd.,
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SUZUKI Kazuo
Hitachi Works, Hitachi, Ltd.
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Sonobe Tadashi
Hitachi Ltd. Hitachi Works.
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Suzuki K
横浜国大 大学院工学研究院
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鈴木 和夫
横浜大
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TAKAHASHI Shigeru
Hitachi Research Labolatory, hitachi Ltd.
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Sonobe Tadashi
Hitachi Works
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Takahashi Shigeru
Hitachi Research Labolatory Hitachi Ltd.
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