OHUE Michio | Hitachi Research Laboratory, Hitachi Ltd.
スポンサーリンク
概要
関連著者
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Suzuki Kenji
Institute For Materials Research Laboratory Tohoku University
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OHUE Michio
Hitachi Research Laboratory, Hitachi Ltd.
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Ohue Michio
Hitachi Research Laboratory Hitachi Ltd.
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Suzuki K
横浜国大 大学院工学研究院
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鈴木 和夫
横浜大
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SAITO Katsuaki
Hitachi Research Laboratory, Hitachi Ltd.
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Fukuda Takuya
Hitachi Research Laboratory Hitachi Ltd.
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MOMMA Naohiro
Hitachi Research Laboratory, Hitachi Ltd.
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Momma Naohiro
Hitachi Research Laboratory Hitachi Ltd.
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SUZUKI Kazuo
Hitachi Works, Hitachi, Ltd.
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Saito K
Department Of Materials Technology Chiba University
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Suzuki K
Ntt Transmission Systems Lab. Ibaraki Jpn
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Mochizuki Yasuhiro
Hitachi Research Laboratory Hitachi Ltd.
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Mochizuki Yasuhiro
Hitachi Research Labolatory Hitachi Ltd.
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FUKUDA Takuya
Semiconducter Development Center, Hitachi Ltd.
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SHIMA Kenzou
Hitachi Works, Hitachi Ltd.
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Chiba Natsuyo
Research Laboratory For Advanced Technology Seiko Instruments Inc.
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Shima Kenzou
Hitachi Works Hitachi Ltd.
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SONOBE Tadashi
Hitachi Works, Hitachi, Ltd.,
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Sonobe Tadashi
Hitachi Ltd. Hitachi Works.
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CHIBA Natsuyo
Production Engineering Research Laboratory, Hitachi, Ltd.
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TAKAHASHI Shigeru
Hitachi Research Labolatory, hitachi Ltd.
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Choi J
Hitachi Research Laboratory Hitachi Ltd.
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CHOI Jai-Ho
Hitachi Research Laboratory, Hitachi Ltd.
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Sonobe Tadashi
Hitachi Works
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Takahashi Shigeru
Hitachi Research Labolatory Hitachi Ltd.
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Choi Jai-ho
Hitachi Research Laboratory Hitachi Ltd.
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Suzuki Katsurmi
Tamachi Laboratory Superconductivity Research Laboratory Istec
著作論文
- High-Quality, High-Rate SiO_2 and SiN Films Formed by 400 kHz Bias Electron Cyclotron Resonance-Chemical Vapor Deposition
- Effects of Excited Species in Electron Cyclotron Resonance Plasma on SiN Film Resistivity
- Effects of Applied Magnetic Fields on Silicon Oxide Films Formed by Microwave Plasma CVD : Nuclear Science, Plasmas and Electric Discharges
- Reactive Ion Etching of Sputtered PbZr_Ti_xO_3 Thin Films