Ohue Michio | Hitachi Research Laboratory Hitachi Ltd.
スポンサーリンク
概要
関連著者
-
Ohue Michio
Hitachi Research Laboratory Hitachi Ltd.
-
Suzuki Kenji
Institute For Materials Research Laboratory Tohoku University
-
OHUE Michio
Hitachi Research Laboratory, Hitachi Ltd.
-
Fukuda Takuya
Hitachi Research Laboratory Hitachi Ltd.
-
Suzuki K
横浜国大 大学院工学研究院
-
鈴木 和夫
横浜大
-
SAITO Katsuaki
Hitachi Research Laboratory, Hitachi Ltd.
-
Momma Naohiro
Hitachi Research Laboratory Hitachi Ltd.
-
SUZUKI Kazuo
Hitachi Works, Hitachi, Ltd.
-
MOMMA Naohiro
Hitachi Research Laboratory, Hitachi Ltd.
-
Sonobe Tadashi
Hitachi Ltd. Hitachi Works.
-
Saito K
Department Of Materials Technology Chiba University
-
Suzuki K
Ntt Transmission Systems Lab. Ibaraki Jpn
-
Mochizuki Yasuhiro
Hitachi Research Laboratory Hitachi Ltd.
-
Mochizuki Yasuhiro
Hitachi Research Labolatory Hitachi Ltd.
-
FUKUDA Takuya
Semiconducter Development Center, Hitachi Ltd.
-
SHIMA Kenzou
Hitachi Works, Hitachi Ltd.
-
Chiba Natsuyo
Research Laboratory For Advanced Technology Seiko Instruments Inc.
-
Shima Kenzou
Hitachi Works Hitachi Ltd.
-
SONOBE Tadashi
Hitachi Works, Hitachi, Ltd.,
-
CHIBA Natsuyo
Production Engineering Research Laboratory, Hitachi, Ltd.
-
TAKAHASHI Shigeru
Hitachi Research Labolatory, hitachi Ltd.
-
Choi J
Hitachi Research Laboratory Hitachi Ltd.
-
CHOI Jai-Ho
Hitachi Research Laboratory, Hitachi Ltd.
-
Sonobe Tadashi
Hitachi Works
-
Takahashi Shigeru
Hitachi Research Labolatory Hitachi Ltd.
-
Choi Jai-ho
Hitachi Research Laboratory Hitachi Ltd.
-
Suzuki Katsurmi
Tamachi Laboratory Superconductivity Research Laboratory Istec
-
Fukuda Takuya
Hitachi Research Laboratory, Hitachi Ltd., 4026 Kuji-cho, Hitachi-shi, Ibaraki 319-12
-
Momma Naohiro
Hitachi Research Laboratory, Hitachi Ltd., 4026 Kuji-cho, Hitachi-shi, Ibaraki 319-12
著作論文
- High-Quality, High-Rate SiO_2 and SiN Films Formed by 400 kHz Bias Electron Cyclotron Resonance-Chemical Vapor Deposition
- Effects of Excited Species in Electron Cyclotron Resonance Plasma on SiN Film Resistivity
- Effects of Applied Magnetic Fields on Silicon Oxide Films Formed by Microwave Plasma CVD : Nuclear Science, Plasmas and Electric Discharges
- Reactive Ion Etching of Sputtered PbZr_Ti_xO_3 Thin Films
- Effects of Excited Plasma Species on Silicon Oxide Films Formed by Microwave Plasma CVD