YAMAUCHI Takeshi | Corporate Manufacturing Engineering Center, TOSHIBA Corporation
スポンサーリンク
概要
関連著者
-
YAMAUCHI Takeshi
Corporate Manufacturing Engineering Center, TOSHIBA Corporation
-
Yamauchi Takeshi
Corporate Manufacturing Engineering Center Toshiba Corporation
-
Sugai Hideo
Department of Electrical Engineering, Nagoya University
-
Sugai Hideo
Department O Electrical Engineering Nagoya University
-
HASEGAWA Isahiro
Procurement Division, Semiconductor Company, Toshiba Corporation
-
菅井 秀郎
中部大学工学部
-
菅井 秀郎
中部大学大学院工学研究科
-
Sugai Hideo
Department Of Electrical Engineering School Of Engineering Nagoya Univeristy
-
菅井 秀郎
名古屋大
-
Sugai Hideo
Department Of Electrical Engineering Nagoya University
-
Sugai Hideo
Department Of Electrical Engineering Graduate School Of Engineering Nagoya University
-
Sugai Hideo
Nagoya University
-
Aoki K
Texas Instruments Japan Ltd. Ibaraki Jpn
-
Yoshida Yuichi
Division Of Electrical Electronic And Information Engineering Graduate School Of Engineering Osaka U
-
UEKUSA Shin-ichiro
Department of Electronics and Communication, School of Science and Technology, Meiji University
-
菅井 秀郎
中部大学工学部電気システム工学科
-
ABDEL-FATTAH Essam
Department of Electrical Engineering, Graduate School of Engineering, Nagoya University
-
Katsumata Hiroshi
Corporate Manufacturing Engineering Center Toshiba Corporation
-
Katsumata Hiroshi
Electrotechnical Laboratory:meiji University
-
Katsumata Hiroshi
Corporate Manufacturing And Engineering Center Toshiba Corp.
-
Uekusa Shin-ichiro
Department Of Electrical Engineering School Of Science And Technology Meiji University
-
Uekusa Shin-ichiro
School Of Engineering Meiji University
-
Uekusa Shin-ichiro
Department Of Electrical And Electronic Engineering Meiji University
-
菅井 秀郎
中部大学
-
Aoki K
Toshiba Corp. Yokohama Jpn
-
Seki Satoru
Department Of Applied Physics Tokai University
-
Yamauchi T
Corporate Manufacturing Engineering Center Toshiba Corporation
-
SETA Shoji
Telecom System LSI DepartmentI Network & Telecom System LSI Division, Toshiba Corporation
-
SEKINE Makoto
Advanced ULSI Process Engineering Department, Process & Manufacturing Engineering Center, Toshiba Co
-
HAYASHI Hisataka
Advanced ULSI Process Engineering Department, Process & Manufacturing Engineering Center, Toshiba Co
-
YOSHIDA Yukimasa
Advanced ULSI Process Engineering Department, Process & Manufacturing Engineering Center, Toshiba Co
-
Uekusa S
Meiji Univ. Kawasaki Jpn
-
AOKI Katsuaki
Department of Electrical Engineering School of Science and Technology, Meiji University
-
Seta Shoji
Telecom System Lsi Departmenti Network & Telecom System Lsi Division Toshiba Corporation
-
Hayashi H
Advanced Ulsi Process Engineering Department Process & Manufacturing Engineering Center Toshiba
-
Sekine Makoto
Advanced Ulsi Process Engineering Department Process & Manufacturing Engineering Center Toshiba
-
Hasegawa Isahiro
Procurement Division Semiconductor Company Toshiba Corporation
-
Abdel-fattah Essam
Department Of Electrical Engineering Nagoya University
-
Hayashi Hisataka
Advanced Ulsi Process Engineering Department Process & Manufacturing Engineering Center Toshiba
-
Yoshida Yukimasa
Advanced Ulsi Process Engineering Department Process & Manufacturing Engineering Center Toshiba
-
Shim Gyu
Department of Electrical Engineering and Computer Science, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
-
SUGAI Hideo
Department of Electronics and Information Engineering, Chubu University
-
SHIM Gyu
Department of Electrical Engineering and Computer Science, Nagoya University
著作論文
- Dramatic Improvement of Surface Wave Plasma Performance Using a Corrugated Dielectric Plate : Nuclear Science, Plasmas, and Electric Discharges
- Microtrench Generation in SiO_2 Trench Etching for Damascene Interconnection Process
- Evaluation of Oxygen-Plasma Damage in GaAs Exposed to a Surface-Wave Plasma Source Developed for the Ashing Process : Nuclear Science, Plasmas, and Electric Discharges
- Mechanism of Oxidation of Si Surfaces Exposed to O_2/Ar Microwave-Excited Plasma
- Negative Ion Transfer Model of Low-Temperature Oxidation of Silicon Surface by High-Density Microwave Plasma
- Plasma Effects on Electrostatic Chuck Characteristics on Capacitive RF Discharge