Horii Sadayoshi | Hitachi Kokusai Electric Inc.
スポンサーリンク
概要
関連著者
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Horii Sadayoshi
Hitachi Kokusai Electric Inc.
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畑山 智亮
Graduate School Of Materials Science Nara Institute Of Science And Technology
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堀田 将
北陸先端科学技術大学院大学材料科学研究科
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浦岡 行治
奈良先端科学技術大学院大
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Sameshima Toshiyuki
Tokyo University Of Agriculture And Technology
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YANO Hiroshi
Graduate School of Materials Science, Nara Institute of Science and Technology
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HATAYAMA Tomoaki
Graduate School of Materials Science, Nara Institute of Science and Technology
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URAOKA Yukiharu
Nara Institute of Science and Technology
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FUYUKI Takashi
Nara Institute of Science and Technology
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Eimori Takahisa
Semiconductor Leading Edge Technologies Inc.
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Yano H
Graduate School Of Materials Science Nara Institute Of Science And Technology
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YANO Hiroshi
Nara Institute of Science and Technology
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HATAYAMA Tomoaki
Nara Institute of Science and Technology
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PUNCHAIPETCH Prakaipetch
Graduate School of Materials Science, Nara Institute of Science and Technology
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Punchaipetch Prakaipetch
Nara Institute of Science and Technology
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Nakamura Hideki
Nara Institute of Science and Technology
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Sameshima Toshiyuki
Tokyo A&t University
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Ohji Yuzuru
Semiconductor & Integrated Circuits Division Hitachi Ltd.
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Yamabe Kikuo
Institute Of Applied Physics University Of Tsukuba
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Habuka Hitoshi
Department Of Chemical Engineering Science Yokohama National University
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Horii Sadayoshi
Semiconductor Equipment System Laboratory Hitachi Kokusai Electric Inc.
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Sano Nobuyuki
Institute Of Applied Physics The University Of Tsukuba
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Ootsuka Fumio
Semiconductor Leading Edge Technologies (selete) Aist
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Nara Yasuo
Semiconductor Leading Edge Technologies Inc.
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Shirai Kiyoshi
Semiconductor Leading Edge Technologies Inc. (selete)
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Punchaipetch Prakaipetch
Graduate School Of Materials Science Nara Institute Of Science And Technology
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Fuyuki Takashi
Nara Inst. Sci. And Technol. Nara Jpn
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Nakata Hiroyuki
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Eimori Takahisa
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Katakami Akira
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Shimura Kazuhiro
Hitachi Kukusai Electric Inc., 2-1 Yasuuchi, Yatsuo-machi, Toyama 939-2393, Japan
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Kobori Yoshitsugu
Department of Chemical and Energy Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya, Yokohama 240-8501, Japan
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Horii Sadayoshi
Hitachi Kokusai Electric Inc., 2-1 Yasuuchi, Yatsuo, Toyama 939-2393, Japan
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Yamaji Masahiko
Department of Chemical and Energy Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya, Yokohama 240-8501, Japan
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Kunii Yasuo
Hitachi Kokusai Electric Inc., 2-1 Yasuuchi, Yatsuo, Toyama 939-2393, Japan
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Shirai Kiyoshi
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Ootsuka Fumio
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Habuka Hitoshi
Department of Chemical and Energy Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya, Yokohama 240-8501, Japan
著作論文
- High pressure water vapor annealing for improving HfSiO dielectrics properties
- Hafnium Oxide Film Etching Using Hydrogen Chloride Gas
- Hole Mobility Enhancement Caused by Gate-Induced Vertical Strain in Gate-First Full-Metal High-$k$ P-Channel Field Effect Transistors Using Ion-Beam W