Ootsuka Fumio | Semiconductor Leading Edge Technologies (selete) Aist
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概要
関連著者
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Ootsuka Fumio
Semiconductor Leading Edge Technologies (selete) Aist
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Sasaki Takaoki
Semiconductor Leading Edge Technologies (selete) Aist
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Sasaki Takaoki
Semiconductor Leading Edge Technologies Inc.
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AKASAKA Yasushi
Semiconductor Leading Edge Technologies Inc.
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HOSHI Takeshi
Semiconductor Leading Edge Technologies Inc.
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OOTSUKA Fumio
Semiconductor Leading Edge Technologies Inc.
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YASUHIRA Mitsuo
Semiconductor Leading Edge Technologies Inc.
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ARIKADO Tsunetoshi
Semiconductor Leading Edge Technologies Inc.
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MIYAGAWA Kazuhiro
Semiconductor Leading Edge Technologies Inc.
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WATANABE Yasuhiko
Semiconductor Leading Edge Technologies Inc.
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Akasaka Yasushi
Semiconductor Leading Edge Technologies Inc. (selete)
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Nara Yasuo
Semiconductor Leading Edge Technologies Inc.
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岡田 健治
半導体MIRAI-ASET
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Ota Hiroyuki
Mirai-advanced Semiconductor Research Center (mirai-asrc) National Institute Of Advanced Industrial
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Okada K
Yamaguchi Univ. Yamaguchi Jpn
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Toriumi Akira
Mirai-advanced Semiconductor Research Center (mirai-asrc) National Institute Of Advanced Industrial
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Toriumi A
Univ. Tokyo Tokyo Jpn
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Toriumi Akira
The Authors Are With Advanced Lsi Technology Laboratory Toshiba Corporation:presently With The Depar
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岡田 健治
松下電器産業(株)
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Eimori Takahisa
Semiconductor Leading Edge Technologies Inc.
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OZAKI Hiroji
Semiconductor Leading Edge Technologies Inc.
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TOMIKAWA Mitsuhiro
Semiconductor Leading Edge Technologies Inc.
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OKADA Kenji
MIRAI-ASET, AIST
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HORIKAWA Tsuyoshi
MIRAI-ASRC, AIST
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TAMURA Yasuyuki
Semiconductor Leading Edge Technologies (Selete), AIST
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AOYAMA Tomonori
Semiconductor Leading Edge Technologies (Selete), AIST
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Horii Sadayoshi
Hitachi Kokusai Electric Inc.
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Toriumi Akira
Mirai Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Scienc
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OGAWA Osamu
Semiconductor Leading Edge Technologies, Inc. (Selete)
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AMIAKA Toshio
Semiconductor Leading Edge Technologies, Inc. (Selete)
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Kasuya Tooru
Semiconductor Leading Edge Technologies Inc. (selete)
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Umezawa Naoto
Advanced Electronic Materials Center National Institute For Materials Science
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Lee Myoungbum
Semiconductor Leading Edge Technologies Inc. (selete)
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Nakamura Genji
Semiconductor Leading Edge Technologies Inc. (selete)
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Chikyow Toyohiro
Advanced Electronic Materials Center National Institute For Materials Science (nims)
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Ohji Yuzuru
Semiconductor & Integrated Circuits Division Hitachi Ltd.
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Yamabe Kikuo
Institute Of Applied Physics University Of Tsukuba
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Toriumi Akira
Advanced Lsi Technology Laboratory Research & Development Center Toshiba Co.
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Watanabe Heiji
Graduate School Of Engineering Osaka University
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Sano Nobuyuki
Institute Of Applied Physics The University Of Tsukuba
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Hayashi T
Mirai-asrc-aist
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Horikawa Tsuyoshi
Mirai Project Association Of Super-advanced Electronics Technology (aset)
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Ota Hiroyuki
Mirai-advanced Semiconductor Research Center (mirai-asrc) National Institute Of Advanced Industrial
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Tamura Yasuyuki
Semiconductor Leading Edge Technologies (selete) Aist
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Shirai Kiyoshi
Semiconductor Leading Edge Technologies Inc. (selete)
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Aoyama Tomonori
Semiconductor Company Toshiba Corporation
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Aoyama Tomonori
Semiconductor Leading Edge Technologies (selete) Aist
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Toriumi Akira
Mirai-asrc Aist
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Shiraishi Kenji
Graduate School Of Applied Physics Univ Of Tsukuba
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Horikawa Tsuyoshi
Mirai-asrc Aist
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Toriumi Akira
Mirai-advanced Semiconductor Research Center (mirai-asrc) National Institute Of Advanced Industrial
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Nakamura Kunio
Semiconductor Leading Edge Technologies Inc.
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Yamabe Kikuo
Graduate School of Pure and Applied Science, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
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Yamabe Kikuo
Graduate School of Pure and Applied Sciences, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
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Nakata Hiroyuki
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Eimori Takahisa
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Chikyow Toyohiro
Advanced Electric Materials Center, National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan
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Chikyow Toyohiro
Advanced Electronic Materials Center, National Institute for Materials Science, Tsukuba, Ibaraki 305-0047, Japan
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Katakami Akira
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Shimura Kazuhiro
Hitachi Kukusai Electric Inc., 2-1 Yasuuchi, Yatsuo-machi, Toyama 939-2393, Japan
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Lee Myoungbum
Semiconductor Leading Edge Technologies, Inc. (Selete), Tsukuba, Ibaraki 305-8569, Japan
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Nakamura Genji
Semiconductor Leading Edge Technologies, Inc. (Selete), Tsukuba, Ibaraki 305-8569, Japan
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Hoshi Takeshi
Semiconductor Leading Edge Technologies Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Arikado Tsunetoshi
Semiconductor Leading Edge Technologies Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Sasaki Takaoki
Semiconductor Leading Edge Technologies Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Kasuya Tooru
Semiconductor Leading Edge Technologies, Inc. (Selete), Tsukuba, Ibaraki 305-8569, Japan
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Amiaka Toshio
Semiconductor Leading Edge Technologies, Inc. (Selete), Tsukuba, Ibaraki 305-8569, Japan
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Tomikawa Mitsuhiro
Semiconductor Leading Edge Technologies Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Shirai Kiyoshi
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Yasuhira Mitsuo
Semiconductor Leading Edge Technologies Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Ootsuka Fumio
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Ootsuka Fumio
Semiconductor Leading Edge Technologies Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Ootsuka Fumio
Semiconductor Leading Edge Technologies, Inc. (Selete), Tsukuba, Ibaraki 305-8569, Japan
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Ota Hiroyuki
MIRAI Project, Nanoelectronics Research Institute (NeRI), National Institute of Advanced Industrial Sciences and Technology (AIST), Tsukuba West, Tsukuba, Ibaraki 305-8569, Japan
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Yamabe Kikuo
Graduate School of Pure and Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
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Ozaki Hiroji
Semiconductor Leading Edge Technologies Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Shiraishi Kenji
Graduate School of Pure and Applied Sciences, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
著作論文
- Effect of Fluorine on Interface Characteristics in Low-Temperature CMIS Process with HfO_2 Metal Gate Stacks
- Effect of Fluorine on Interface Characteristics in Low-temperature CMIS Process with HfO_2 Metal Gate Stacks
- Importance of Leakage Current Noise Analysis for Accurate Lifetime Prediction of High-k Gate Dielectrics
- Hole Mobility Enhancement Caused by Gate-Induced Vertical Strain in Gate-First Full-Metal High-$k$ P-Channel Field Effect Transistors Using Ion-Beam W
- Effect of Boron and Fluorine Incorporation in SiON Gate Insulator with Optimized Nitrogen Profile
- Modified Oxygen Vacancy Induced Fermi Level Pinning Model Extendable to P-Metal Pinning