Sano Nobuyuki | Institute Of Applied Physics The University Of Tsukuba
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概要
関連著者
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Sano Nobuyuki
Institute Of Applied Physics The University Of Tsukuba
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SANO Nobuyuki
Institute of Applied Physics, University of Tsukuba
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Natori Kenji
Institute Of Applied Physics University Of Tsukuba
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NATORI Kenji
Institute of Applied Physics, University of Tsukuba
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佐野 伸行
筑波大学物理工学系
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MATSUZAWA Kazuya
Semiconductor Technology Academic Research Center(STARC)
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Matsuzawa Kazuya
Semiconductor Technology Academic Research Center (starc)
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Matsuzawa Kazuya
Advanced Lsi Technology Laboratory Research & Development Center Toshiba Corporation
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Matsuzawa Kazuya
Semiconductor Technology Academic Research Center
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Matsuzawa K
Toshiba Corp. Yokohama‐shi Jpn
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佐野 伸行
筑波大 物理工学系
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MUKAI Mikio
Semiconductor Technology Academic Research Center(STARC)
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Sano Nobuyuki
Institute Of Applied Physics University Of Tsukuba
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Mukai Mikio
Health-care Center Kinki Central Hospital
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NAKAYAMA Noriaki
Semiconductor Technology Academic Research Center(STARC)
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Shimizu Tomo
Institute Of Applied Physics University Of Tsukuba
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Natori K
Univ. Tsukuba Ibaraki Jpn
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Nakayama Noriaki
Semiconductor Technology Academic Research Center
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Nakayama Noriaki
Fujitsu Laboratories Ltd.
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Nakayama Noriaki
Semiconductor Technology Academic Research Center (starc)
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Nakayama Noriaki
Department Of Advanced Materials Science And Engineering Faculty Of Engineering
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Sano N
Univ. Tsukuba Ibaraki Jpn
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Fukui Takayuki
Institute Of Applied Physics University Of Tsukuba
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Eimori Takahisa
Semiconductor Leading Edge Technologies Inc.
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Kusaka Hiroyuki
Institute Of Applied Physics University Of Tsukuba
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TOMIZAWA Masaaki
NTT LSI Laboratories
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Horii Sadayoshi
Hitachi Kokusai Electric Inc.
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HIROKI Akira
Semiconductor Technology Academic Research Center (STARC)
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Sano Nobuyuki
Institute Of Applied `jusocs University Of Tsukuba
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Ohji Yuzuru
Semiconductor & Integrated Circuits Division Hitachi Ltd.
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Yamabe Kikuo
Institute Of Applied Physics University Of Tsukuba
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Uehara Tsuyoshi
Institute Of Applied Physics University Of Tsukuba
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TORIYAMA Shuichi
Advanced LSI Technology Laboratory, Toshiba Corporation
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Ootsuka Fumio
Semiconductor Leading Edge Technologies (selete) Aist
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Nara Yasuo
Semiconductor Leading Edge Technologies Inc.
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Uechi Tadayoshi
Institute of Applied Physics, University of Tsukuba, 1-1-1 Tennohdai, Tsukuba, Ibaraki 305-8573, Jap
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Uechi Tadayoshi
Institute Of Applied Physics University Of Tsukuba
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Toriyama Shuichi
Advanced Lsi Technology Laboratory Toshiba Corporation
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Toriyama Shuichi
Institute Of Applied `jusocs University Of Tsukuba
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Kitahara Yoshiyuki
Corporate Manufacturing Engineering Center Toshiba Corporation
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Ishihara Takamitsu
Advanced Lsi Technology Laboratory Corporate Research & Development Center
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Shirai Kiyoshi
Semiconductor Leading Edge Technologies Inc. (selete)
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Tomizawa Masaaki
Ntt Lifestyle And Environmental Technology Labs
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Nakata Hiroyuki
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Eimori Takahisa
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Katakami Akira
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Shimura Kazuhiro
Hitachi Kukusai Electric Inc., 2-1 Yasuuchi, Yatsuo-machi, Toyama 939-2393, Japan
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Ikeda Hiroyuki
Development Division, Sony Mobile Display Corporation, 50 Kamifunaki, Ogawa, Higashiura, Aichi 470-2102, Japan
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Natori Kenji
Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
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Shirai Kiyoshi
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Ishihara Takamitsu
Advanced LSI Technology Laboratory, Corporate Research & Development Center, Toshiba Corporation, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Ootsuka Fumio
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Sano Nobuyuki
Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
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Sano Nobuyuki
Institute of Applied Physics, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Ibaraki 305-8573, Japan
著作論文
- Influence of Thermal Noise on Drain Current in Very Small Si-MOSFETs
- Influence of Intrinsic Current Fluctuation in Very Small Si-MOSFETs
- Current Fluctuation Characteristic of Sub-0.1 Micron Device Structures:A Monte Carlo Study
- Minimum Value of the Specific Contact Resistance of Si-Metal Contacts : The Origin and the Magnitude
- Probability Distribution of Threshold Voltage Fluctuations in Metal-OXide-Semiconductor Field-Effect-Transistors : Semiconductors
- A Monte Carlo Study of Current-Voltage Characteristics of the Scaled-Down single-Electron Transistor with a Silicon Rectangular Parallelepiped Quantum Dot
- Detailed Balance in Quasi-Ballistic Electron Transport under Nanoscale Device Structures
- Schottky Barrier MOSFETs as Resonant Tunneling Devices
- The Resonant Tunneling Mode of a Single Electron Transistor
- Statistical Threshold Fluctuations in Si-MOSFETs : Jellium vs. Atomistic Dopant Variations
- Analysis of Photon-Induced Drain Current in Polycrystalline-Silicon Thin-Film Transistors
- Three-Dimensional Monte Carlo Simulation of Electron Transport in Si Including Full Coulomb Interaction
- A New Grain Boundary Model for Drift-Diffusion Device Simulations in Polycrystalline Silicon Thin-Film Transistors
- Hole Mobility Enhancement Caused by Gate-Induced Vertical Strain in Gate-First Full-Metal High-$k$ P-Channel Field Effect Transistors Using Ion-Beam W
- Transport Characteristics of the Cross Junction of Atomic Chains
- Coulomb and Phonon Scattering Processes in Metal–Oxide–Semiconductor Inversion Layers: Beyond Matthiessen's Rule