Matsuzawa Kazuya | Advanced Lsi Technology Laboratory Research & Development Center Toshiba Corporation
スポンサーリンク
概要
関連著者
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Matsuzawa Kazuya
Semiconductor Technology Academic Research Center (starc)
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Matsuzawa Kazuya
Advanced Lsi Technology Laboratory Research & Development Center Toshiba Corporation
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Matsuzawa K
Toshiba Corp. Yokohama‐shi Jpn
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Matsuzawa Kazuya
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiba Corporation
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佐野 伸行
筑波大学物理工学系
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SANO Nobuyuki
Institute of Applied Physics, University of Tsukuba
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MATSUZAWA Kazuya
Semiconductor Technology Academic Research Center(STARC)
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Matsuzawa Kazuya
Semiconductor Technology Academic Research Center
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Sano Nobuyuki
Institute Of Applied Physics The University Of Tsukuba
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佐野 伸行
筑波大 物理工学系
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MUKAI Mikio
Semiconductor Technology Academic Research Center(STARC)
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Mukai Mikio
Health-care Center Kinki Central Hospital
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UCHIDA Ken
Advanced LSI Technology Laboratory, Research & Development Center, Toshiba Corporation
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Takagi Shin-ichi
Advanced Lsi Technology Laboratory Research & Development Center Toshiba Corporation
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Uchida Ken
Advanced Lsi Technology Laboratory Toshiba Corporation
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Takagi Shin-ichi
Advanced Lsi Technology Laboratory Corporate Research & Development Center Toshiha Corporation
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Uchida Ken
Advanced LSI laboratory, Corporate R&D Center, Toshiba Corporation, 1 Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
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NAKAYAMA Noriaki
Semiconductor Technology Academic Research Center(STARC)
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NATORI Kenji
Institute of Applied Physics, University of Tsukuba
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Toriumi Akira
Mirai-advanced Semiconductor Research Center (mirai-asrc) National Institute Of Advanced Industrial
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Toriumi Akira
Advanced Lsi Technology Toshiba Corporation
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Natori Kenji
Institute Of Applied Physics University Of Tsukuba
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Natori K
Univ. Tsukuba Ibaraki Jpn
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Nakayama Noriaki
Semiconductor Technology Academic Research Center
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Nakayama Noriaki
Fujitsu Laboratories Ltd.
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Nakayama Noriaki
Semiconductor Technology Academic Research Center (starc)
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Nakayama Noriaki
Department Of Advanced Materials Science And Engineering Faculty Of Engineering
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Uchida K
Advanced Lsi Technology Laboratory Toshiba Corporation
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Toriumi Akira
Advanced Lsi Technology Laboratory Research & Development Center Toshiba Co.
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Toriumi Akira
Advanced Lsi Technology Laboratory Corporate R&d Center Toshiba Corporation
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Ishihara Takamitsu
Advanced Lsi Technology Laboratory Corporate Research & Development Center
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Ishihara T
Hyogo Prefectural Institute Of Industrial Research
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Toriumi Akira
Mirai-asrc Aist
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Takayanagi Mariko
System Lsi Research & Development Center Semiconductor Company Toshiba Corporation
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Uchida Ken
Corporate R&d Center Toshiba Corporation
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Toriumi Akira
Advanced Lsi Technology Laboratory Toshiba Corporation
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Takagi S
Process & Manufacturing Center Semiconductor Company Toshiba Corporation
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TAKAGI Shin-ichi
Advanced LSI Technology Laboratory, Toshiba Corporation
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KOGA Junji
Advanced LSI Technology Laboratory, Research and Development Center, Toshiba Corporation
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MATSUZAWA Kazuya
Advanced LSI Technology Laboratory, Toshiba Corporation
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OHBA Ryuji
Advanced LSI Technology Laboratory, Toshiba Corporation
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HIROKI Akira
Semiconductor Technology Academic Research Center (STARC)
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Nishiyama Akira
Advanced Lsi Technology Laboratory Corporate R & D Center Toshiba Corporation
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Ohba R
Advanced Lsi Technology Laboratory Toshiba Corporation
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Koga J
Advanced Lsi Technology Laboratory Research And Development Center Toshiba Corporation
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Koga Junji
Advanced Lsi Technology Laboratory Corporate R & D Center Toshiba Corporation
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TAKAYANAGI Mariko
Semiconductor Company, Toshiba Corporation
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TAKAYANAGI Mariko
Advanced CMOS Technology Dept., Center for Semiconductor Research & Development, Semiconductor Compa
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Nishiyama Akira
Advanced Lsi Technology Laboratory Toshiba Corporation
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Takayanagi Mariko
Advanced Cmos Technology Dept. Center For Semiconductor Research & Development Semiconductor Com
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Takayanagi Mariko
Semiconductor Company Toshiba Corporation
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Ohba Ryuji
Advanced LSI laboratory, Corporate R&D Center, Toshiba Corporation, 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
著作論文
- Influence of Thermal Noise on Drain Current in Very Small Si-MOSFETs
- Influence of Intrinsic Current Fluctuation in Very Small Si-MOSFETs
- Current Fluctuation Characteristic of Sub-0.1 Micron Device Structures:A Monte Carlo Study
- Analytical Single-Electron Transistor(SET)Model for Design and Analysis of Realistic SET Circuits
- Probability Distribution of Threshold Voltage Fluctuations in Metal-OXide-Semiconductor Field-Effect-Transistors : Semiconductors
- A New Design Scheme for Logic Circuits with Single Electron Transistors
- Monte Carlo Simulation of Sub-0.1μm Devices with Schottky Contact Model (Special lssue on SISPAD'99)
- Comprehensive Understanding of Electron and Hole Mobility Limited by Surface Roughness Scattering in Pure Oxides and Oxynitrides Based on Correlation Function of Surface Roughness
- Comprehensive Understanding of Electron and Hole Mobility Limited by Surface Roughness Scattering in Pure Oxides and Oxynitrides Based on Correlation Function of Surface Roughness