Current Fluctuation Characteristic of Sub-0.1 Micron Device Structures:A Monte Carlo Study
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-05-01
著者
-
佐野 伸行
筑波大学物理工学系
-
佐野 伸行
筑波大 物理工学系
-
SANO Nobuyuki
Institute of Applied Physics, University of Tsukuba
-
MATSUZAWA Kazuya
Semiconductor Technology Academic Research Center(STARC)
-
MUKAI Mikio
Semiconductor Technology Academic Research Center(STARC)
-
NATORI Kenji
Institute of Applied Physics, University of Tsukuba
-
Mukai Mikio
Health-care Center Kinki Central Hospital
-
Natori Kenji
Institute Of Applied Physics University Of Tsukuba
-
Natori K
Univ. Tsukuba Ibaraki Jpn
-
Matsuzawa Kazuya
Semiconductor Technology Academic Research Center (starc)
-
Matsuzawa Kazuya
Advanced Lsi Technology Laboratory Research & Development Center Toshiba Corporation
-
Matsuzawa Kazuya
Semiconductor Technology Academic Research Center
-
Matsuzawa K
Toshiba Corp. Yokohama‐shi Jpn
-
Sano Nobuyuki
Institute Of Applied Physics The University Of Tsukuba
関連論文
- 不純物に起因するポテンシャル揺らぎの電子移動度への影響
- 統計的解析によるPoly-Si TFTの結晶粒界の影響の評価(プロセス・デバイス・回路シミュレーション及び一般)
- 統計的解析によるPoly-Si TFTの結晶粒界の影響の評価(プロセス・デバイス・回路シミュレーション及び一般)
- デバイス・シミュレーションとその物理
- 不純物に起因するポテンシャル揺らぎの電子移動度への影響
- Influence of Thermal Noise on Drain Current in Very Small Si-MOSFETs
- Influence of Intrinsic Current Fluctuation in Very Small Si-MOSFETs
- Current Fluctuation Characteristic of Sub-0.1 Micron Device Structures:A Monte Carlo Study
- 微細デバイスにおける電流ゆらぎシミュレーションのデバイス・サイズ依存性
- 微細デバイスにおける電流ゆらぎシミュレーションのデバイス・サイズ依存性
- 微細デバイスにおける電流ゆらぎシミュレーションのデバイス・サイズ依存性
- 微細デバイスにおける電流ゆらぎシミュレーションのデバイス・サイズ依存性
- 28p-G-2 極微細デバイス構造のもとでの電流ゆらぎのシミュレーション解析II
- Analytical Single-Electron Transistor(SET)Model for Design and Analysis of Realistic SET Circuits
- Non-Quasi-Static Carrier Dynamics of MOSFETs under Low-Voltage Operation
- Coulomb and Phonon Scattering Processes in Metal-Oxide-Semiconductor Inversion Layers : Beyond Matthiessen's Rule
- Minimum Value of the Specific Contact Resistance of Si-Metal Contacts : The Origin and the Magnitude
- Transport Characteristics of the Cross Junction of Atomic Chains
- Probability Distribution of Threshold Voltage Fluctuations in Metal-OXide-Semiconductor Field-Effect-Transistors : Semiconductors
- Mortality and Causes of Death among Japanese School Personnel between 1992 and 1996
- A Monte Carlo Study of Current-Voltage Characteristics of the Scaled-Down single-Electron Transistor with a Silicon Rectangular Parallelepiped Quantum Dot
- Multi-Subband Effects on Performance Limit of Nanoscale MOSFETs
- Detailed Balance in Quasi-Ballistic Electron Transport under Nanoscale Device Structures
- Schottky Barrier MOSFETs as Resonant Tunneling Devices
- The Resonant Tunneling Mode of a Single Electron Transistor
- Statistical Threshold Fluctuations in Si-MOSFETs : Jellium vs. Atomistic Dopant Variations
- Suppression of the rebound of hot-electrons from the drain region in ballistic transport due to device geometry : A Monte Carlo study
- Monte Carlo simulation of nanoscale n-i-n diode : Influence of the hot-electron in drain region on ballistic transport
- Nanoscale Quasi-Ballistic MOSFETs in Reflection-Transmission Model
- Analysis of Photon-Induced Drain Current in Polycrystalline-Silicon Thin-Film Transistors
- Three-Dimensional Monte Carlo Simulation of Electron Transport in Si Including Full Coulomb Interaction
- Current-Voltage Characteristics of Silicon on Insulator Metal Oxide Semiconductor Field Effect Transistors in Ballistic Mode
- A New Design Scheme for Logic Circuits with Single Electron Transistors
- A New Grain Boundary Model for Drift-Diffusion Device Simulations in Polycrystalline Silicon Thin-Film Transistors
- Monte Carlo Simulation of Sub-0.1μm Devices with Schottky Contact Model (Special lssue on SISPAD'99)
- The Capacitance of Nano-Structures
- Comprehensive Understanding of Electron and Hole Mobility Limited by Surface Roughness Scattering in Pure Oxides and Oxynitrides Based on Correlation Function of Surface Roughness
- Comprehensive Understanding of Electron and Hole Mobility Limited by Surface Roughness Scattering in Pure Oxides and Oxynitrides Based on Correlation Function of Surface Roughness
- Hole Mobility Enhancement Caused by Gate-Induced Vertical Strain in Gate-First Full-Metal High-$k$ P-Channel Field Effect Transistors Using Ion-Beam W
- Unified Reaction--Diffusion Model for Accurate Prediction of Negative Bias Temperature Instability Effect
- New Monte Carlo Simulation Technique for Quasi-Ballistic Transport in Ultrasmall Metal Oxide Semiconductor Field-Effect Transistors
- New Magnetic Flash Memory with FePt Magnetic Floating Gate
- Multi-Subband Effects on Performance Limit of Nanoscale MOSFETs
- Capacitance of Nanostructures
- Transport Characteristics of the Cross Junction of Atomic Chains
- New Solution to High-Field Transport in Semiconductors: I. Elastic Scattering without Energy Relaxation
- Coulomb and Phonon Scattering Processes in Metal–Oxide–Semiconductor Inversion Layers: Beyond Matthiessen's Rule
- New Solution to High-Field Transport in Semiconductors: II. Velocity Saturation and Ballistic Transmission
- Capacitance of Nanostructures