Kitahara Yoshiyuki | Corporate Manufacturing Engineering Center Toshiba Corporation
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概要
関連著者
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Kitahara Yoshiyuki
Corporate Manufacturing Engineering Center Toshiba Corporation
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Kubo Momoji
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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KUROKAWA Hitoshi
Department of Materials Chemistry, Graduate School of Engineering, Tohoku University
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Sano Nobuyuki
Institute Of Applied `jusocs University Of Tsukuba
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Miyamoto Akira
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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Takami Seiichi
Department Of Chemical System Engineering Faculty Of Engineering The University Of Tokyo
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Kanoh Masaaki
Corporate Manufacturing Engineering Center Toshiba Corporation
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Sasata Katsumi
Department Of Applied Chemistry Graduate School Of Engineering Tohoku University
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Sano Nobuyuki
Institute Of Applied Physics The University Of Tsukuba
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Toriyama Shuichi
Institute Of Applied `jusocs University Of Tsukuba
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Imamura Akira
Department Of Electronic Engineering Graduate School Of Engineering The University Of Tokyo
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Yokosuka Toshiyuki
Department Of Materials Chemistry Graduate School Of Engineering Tohoku University
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Kitahara Yoshiyuki
Corporate Manufacturing Engineering Center, Toshiba Corporation, 33 Shin-Isogo-cho, Isogo-ku, Yokohama 235-0017, Japan
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Kubo Momoji
Department of Materials Chemistry, Graduate School of Engineering, Tohoku University, Aoba-yama 07, Sendai 980-8579, Japan
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Kanoh Masaaki
Corporate Manufacturing Engineering Center, Toshiba Corporation, 33 Shin-Isogo-cho, Isogo-ku, Yokohama 235-0017, Japan
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Imamura Akira
Department of Chemistry, Faculty of Science, Hiroshima University
著作論文
- A New Grain Boundary Model for Drift-Diffusion Device Simulations in Polycrystalline Silicon Thin-Film Transistors
- A Theoretical Study on the Realistic Low Concentration Doping in Silicon Semiconductors by Accelerated Quantum Chemical Molecular Dynamics Method