Sasaki Takaoki | Semiconductor Leading Edge Technologies Inc.
スポンサーリンク
概要
関連著者
-
Sasaki Takaoki
Semiconductor Leading Edge Technologies Inc.
-
OOTSUKA Fumio
Semiconductor Leading Edge Technologies Inc.
-
Sasaki Takaoki
Semiconductor Leading Edge Technologies (selete) Aist
-
HOSHI Takeshi
Semiconductor Leading Edge Technologies Inc.
-
YASUHIRA Mitsuo
Semiconductor Leading Edge Technologies Inc.
-
ARIKADO Tsunetoshi
Semiconductor Leading Edge Technologies Inc.
-
Ootsuka Fumio
Semiconductor Leading Edge Technologies (selete) Aist
-
AKASAKA Yasushi
Semiconductor Leading Edge Technologies Inc.
-
MIYAGAWA Kazuhiro
Semiconductor Leading Edge Technologies Inc.
-
WATANABE Yasuhiko
Semiconductor Leading Edge Technologies Inc.
-
Akasaka Yasushi
Semiconductor Leading Edge Technologies Inc. (selete)
-
岡田 健治
半導体MIRAI-ASET
-
Ota Hiroyuki
Mirai-advanced Semiconductor Research Center (mirai-asrc) National Institute Of Advanced Industrial
-
Okada K
Yamaguchi Univ. Yamaguchi Jpn
-
Muto Akiyoshi
Research Department 1 Semiconductor Leading Edge Technologies Inc. (selete)
-
Muto Akiyoshi
Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University
-
Toriumi Akira
Mirai-advanced Semiconductor Research Center (mirai-asrc) National Institute Of Advanced Industrial
-
Toriumi A
Univ. Tokyo Tokyo Jpn
-
Toriumi Akira
The Authors Are With Advanced Lsi Technology Laboratory Toshiba Corporation:presently With The Depar
-
岡田 健治
松下電器産業(株)
-
TORII Kazuyoshi
Semiconductor Leading Edge Technologies, Inc.
-
OZAKI Hiroji
Semiconductor Leading Edge Technologies Inc.
-
TOMIKAWA Mitsuhiro
Semiconductor Leading Edge Technologies Inc.
-
MAEDA Takeshi
Semiconductor Leading Edge Technologies, Inc.
-
ITO Hiroyuki
Semiconductor Leading Edge Technologies, Inc.
-
MITSUHASHI Riichiro
Semiconductor Leading Edge Technologies, Inc.
-
HORIUCHI Atsushi
Semiconductor Leading Edge Technologies, Inc.
-
KAWAHARA Takaaki
Semiconductor Leading Edge Technologies, Inc.
-
MUTO Akiyoshi
Semiconductor Leading Edge Technologies, Inc.
-
KITAJIMA Hiroshi
Semiconductor Leading Edge Technologies, Inc.
-
OKADA Kenji
MIRAI-ASET, AIST
-
HORIKAWA Tsuyoshi
MIRAI-ASRC, AIST
-
TAMURA Yasuyuki
Semiconductor Leading Edge Technologies (Selete), AIST
-
AOYAMA Tomonori
Semiconductor Leading Edge Technologies (Selete), AIST
-
Toriumi Akira
Mirai Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Scienc
-
Toriumi Akira
Advanced Lsi Technology Laboratory Research & Development Center Toshiba Co.
-
Hayashi T
Mirai-asrc-aist
-
Horikawa Tsuyoshi
Mirai Project Association Of Super-advanced Electronics Technology (aset)
-
Ota Hiroyuki
Mirai-advanced Semiconductor Research Center (mirai-asrc) National Institute Of Advanced Industrial
-
Tamura Yasuyuki
Semiconductor Leading Edge Technologies (selete) Aist
-
Aoyama Tomonori
Semiconductor Company Toshiba Corporation
-
Aoyama Tomonori
Semiconductor Leading Edge Technologies (selete) Aist
-
Toriumi Akira
Mirai-asrc Aist
-
Horikawa Tsuyoshi
Mirai-asrc Aist
-
Toriumi Akira
Mirai-advanced Semiconductor Research Center (mirai-asrc) National Institute Of Advanced Industrial
-
Ota Hiroyuki
MIRAI Project, Nanoelectronics Research Institute (NeRI), National Institute of Advanced Industrial Sciences and Technology (AIST), Tsukuba West, Tsukuba, Ibaraki 305-8569, Japan
著作論文
- Effect of Fluorine on Interface Characteristics in Low-Temperature CMIS Process with HfO_2 Metal Gate Stacks
- Effect of Fluorine on Interface Characteristics in Low-temperature CMIS Process with HfO_2 Metal Gate Stacks
- Effect of Boron and Fluorine Incorporation in SiON Gate Insulator with Optimized Nitrogen Profile
- Selective Dry Etching of HfO_2 in CF_4 and Cl_2/HBr-Based Chemistries
- Importance of Leakage Current Noise Analysis for Accurate Lifetime Prediction of High-k Gate Dielectrics