Atomic-scale Characterization and Control of the HfO_2/Si(001) Interface
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概要
著者
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堀田 将
北陸先端科学技術大学院大学材料科学研究科
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Niwa M
Matsushita Electronics Corp. Kyoto Jpn
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Hayashi Shigenori
Semiconductor Equipment System Laboratory Hitachi Kokusai Electric Inc.
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堀井 將
北陸先端科学技術大学院大学 材料科学研究科
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Niwa M
Ulsi Process Technology Development Center Matsushita Electronics Corp.
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Niwa M
Department Of Materials Science And Engineering Tokyo Denki University
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HOSHINO Yasushi
Yokosuka Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
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